Resist composition and method of forming resist pattern

ABSTRACT

A resist composition including: a base component (A) that exhibits changed solubility in a developing solution by the action of acid; a photoreactive quencher (C); and an acid generator component (B) that generates acid upon exposure, wherein the photoreactive quencher (C) contains a compound (C) represented by general formula (c1) shown below. In the formula, X represents a cyclic group of 3 to 30 carbon atoms which may have a substituent; R 1  represents a divalent linking group; R 2  represents an arylene group which may have a substituent, and each of R 3  and R 4  independently represents an aryl group which may have a substituent; R 3  and R 4  may be mutually bonded with the sulfur atom to form a ring; R 5  represents a hydroxy group, a halogen atom, an alkyl group of 1 to 5 carbon atoms, an alkoxy group or a fluorinated alkyl group; p represents an integer of 0 to 2; and q represents an integer of 0 to 3.

TECHNICAL FIELD

The present invention relates to a resist composition and a method of forming a resist pattern using the resist composition.

Priority is claimed on Japanese Patent Application No. 2012-037920, filed Feb. 23, 2012, and Japanese Patent Application No. 2013-003930, filed Jan. 11, 2013, the contents of which are incorporated herein by reference.

BACKGROUND ART

In lithography techniques, for example, a resist film composed of a resist material is formed on a substrate, and the resist film is subjected to selective exposure, followed by development, thereby forming a resist pattern having a predetermined shape on the resist film. A resist material in which the exposed portions of the resist film become soluble in a developing solution is called a positive-type, and a resist material in which the exposed portions of the resist film become insoluble in a developing solution is called a negative-type.

In recent years, in the production of semiconductor elements and liquid crystal display elements, advances in lithography techniques have lead to rapid progress in the field of pattern miniaturization. Typically, these miniaturization techniques involve shortening the wavelength (increasing the energy) of the exposure light source. Conventionally, ultraviolet radiation typified by g-line and i-line radiation has been used, but nowadays KrF excimer lasers and ArF excimer lasers are starting to be introduced in mass production of semiconductor elements. Furthermore, research is also being conducted into lithography techniques that use an exposure light source having a wavelength shorter (energy higher) than these excimer lasers, such as electron beam (EB), extreme ultraviolet radiation (EUV), and X ray.

Resist materials for use with these types of exposure light sources require lithography properties such as a high resolution capable of reproducing patterns of minute dimensions, and a high level of sensitivity to these types of exposure light sources. As a resist material that satisfies these conditions, a chemically amplified composition is used, which includes a base material component that exhibits changed solubility in a developing solution under the action of acid and an acid generator component that generates acid upon exposure.

On the other hand, as acid generators usable in a chemically amplified resist composition, various types have been proposed including, for example, onium salt acid generators; oxime sulfonate acid generators; diazomethane acid generators; nitrobenzylsulfonate acid generators; iminosulfonate acid generators; and disulfone acid generators.

Conventionally, a resin (base resin) is typically used as the base component of a chemically amplified resist composition.

For example, in the case of alkali developing process in which an alkali developing solution is used as a developing solution, a chemically amplified positive resist composition for forming a positive resist pattern, which contains an acid generator component and a resin component that exhibits increased solubility in an alkali developing solution by the action of acid is typically used. If the resist film formed using the resist composition is selectively exposed during formation of a resist pattern, then within the exposed portions, acid is generated from the acid generator component, and the action of this acid causes an increase in the solubility of the resin component in an alkali developing solution, making the exposed portions soluble in the alkali developing solution. Thus, by conducting an alkali development solution, the unexposed portions remain to form a positive resist pattern.

A resin that exhibits increased polarity by the action of acid is generally used as a resin component. When the polarity of a resin is increased, the solubility in an alkali developing solution is increased. On the other hand, when the polarity of a resin is increased, the solubility in an organic solvent is decreased. Therefore, when such a base resin is applied to a solvent developing process using a developing solution containing an organic solvent (organic developing solution) instead of an alkali developing process, the solubility of the exposed portions in an organic developing solution is decreased. As a result, in the solvent developing process, the unexposed portions of the resist film are dissolved and removed by the organic developing solution, and a negative resist pattern in which the exposed portions are remaining is formed. The solvent developing process by which a negative resist pattern can be formed is frequently referred to as “negative-tone developing process” (for example, see Patent Document 1).

Currently, resins that contain structural units derived from (meth)acrylate esters within the main chain (acrylic resins) are now widely used as base resins for chemically amplified resist compositions that is used in ArF excimer laser lithography, as they exhibit excellent transparency in the vicinity of 193 nm (for example, see Patent Document 2). Here, the term “(meth)acrylate ester” is a generic term that includes either or both of the acrylate ester having a hydrogen atom bonded to the α-position and the methacrylate ester having a methyl group bonded to the α-position. The term “(meth)acrylate” is a generic term that includes either or both of the acrylate having a hydrogen atom bonded to the α-position and the methacrylate having a methyl group bonded to the α-position. The term “(meth)acrylic acid” is a generic term that includes either or both of acrylic acid having a hydrogen atom bonded to the α-position and methacrylic acid having a methyl group bonded to the α-position.

The base resin contains a plurality of structural units for improving lithography properties and the like. For example, in the case of a resin component which exhibits increased polarity by the action of acid, a base resin containing a structural unit having an acid decomposable group which is decomposed by the action of an acid generated from an acid generator component to increase the polarity, a structural unit having a polar group such as a hydroxy group and a structural unit having a lactone structure is typically used.

Recently, there have been proposed a photoreactive quencher (photo-degradative base) added to a chemically amplified resist composition (for example, see Patent Document 3). The photoreactive quencher is a salt of anion moiety with cation moiety. Before exposure, it exhibits quenching effect to trap an acid generated from an acid generator or the like by ion exchange reaction. After exposure, it is decomposed, and then loses the quenching effect. Therefore, when a resist film formed using a chemically amplified resist composition containing a photoreactive quencher is subjected to exposure, the level of basicity of the photoreactive quencher to trap acid generated from an acid generator or the like is decreased at exposed portions. On the other hand, at unexposed portions, the photoreactive quencher traps acid. As a result, the diffusion of acid from exposed portions to unexposed portions can be suppressed, thereby improving lithography properties.

DOCUMENTS OF RELATED ART Patent Document

-   [Patent Document 1] Japanese Unexamined Patent Application, First     Publication No. 2008-292975 -   [Patent Document 2] Japanese Unexamined Patent Application, First     Publication No. 2003-241385     -   [Patent Document 3] Japanese Unexamined Patent Application,         First Publication No. 2010-66492

SUMMARY OF THE INVENTION

As miniaturization of resist patterns progress, improvement will be demanded for resist materials with respect to excellent lithography properties.

A chemically amplified resist composition containing a conventional photoreactive quencher is slightly superior to a composition not containing a photoreactive quencher in terms of lithography properties, but there is a demand for improvement in lithography properties. A chemically amplified resist composition containing a conventional photoreactive quencher is inferior in storage stability. Thus, there is a problem that resist properties such as lithography properties is deteriorated during storage.

The present invention takes the above circumstances into consideration, with an object of providing a resist composition which exhibits excellent lithography properties and has an excellent storage stability, and a method of forming a resist pattern using the resist composition.

As a result of further studies of the present inventors, it has been found that stability of the resist composition is dramatically improved by adding a photoreactive quencher which contains an anion moiety having a specific structure. The present invention has been completed based on this finding.

A first aspect of the present invention is a resist composition including a base component (A) which exhibits changed solubility in a developing solution by the action of acid, a photoreactive quencher (C) and an acid generator component (B) which generates acid upon exposure, wherein the photoreactive quencher (C) includes a compound (C1) represented by general formula (c1) shown below.

In the formula, X represents a cyclic group of 3 to 30 carbon atoms which may have a substituent; R¹ represents a divalent linking group; and R² represents an arylene group which may have a substituent, and each of R³ and R⁴ independently represents an aryl group which may have a substituent; R³ and R⁴ may be mutually bonded with the sulfur atom to form a ring; R⁵ represents a hydroxy group, a halogen atom, an alkyl group of 1 to 5 carbon atoms, an alkoxy group or a fluorinated alkyl group; p represents an integer of 0 to 2; and q represents an integer of 0 to 3.

A second aspect of the present invention is a method of forming a resist pattern, including: forming a resist film on a substrate using a resist composition of the first aspect; conducting exposure of the resist film; and developing the resist film to form a resist pattern.

In the present description and claims, the term “exposure” is used as a general concept that includes irradiation with any form of radiation.

The term “structural unit” refers to a monomer unit that contributes to the formation of a polymeric compound (resin, polymer, copolymer).

The term “aliphatic” is a relative concept used in relation to the term “aromatic”, and defines a group or compound that has no aromaticity.

The term “alkyl group” includes linear, branched or cyclic, monovalent saturated hydrocarbon, unless otherwise specified. The same applies for the alkyl group within an alkoxy group.

The term “alkylene group” includes linear, branched or cyclic, divalent saturated hydrocarbon, unless otherwise specified.

A “halogenated alkyl group” is a group in which part or all of the hydrogen atoms of an alkyl group is substituted with a halogen atom, and a “halogenated alkylene group” is a group in which part or all of the hydrogen atoms of an alkylene group is substituted with a halogen atom. Examples of the halogen atom include a fluorine atom, a chlorine atom, a bromine atom and an iodine atom.

A “fluorinated alkyl group” is a group in which part or all of the hydrogen atoms of an alkyl group is substituted with a fluorine atom, and a “fluorinated alkylene group” is a group in which part or all of the hydrogen atoms of an alkylene group is substituted with a fluorine atom.

A “hydroxyalkyl group” is a group in which part or all of the hydrogen atoms within an alkyl group have been substituted with a hydroxyl group.

According to the present invention, there are provided a resist composition which exhibits excellent lithography properties and has an excellent storage stability, and a method of forming a resist pattern using the resist composition.

DETAILED DESCRIPTION OF THE INVENTION <<Resist Composition>>

The resist composition according to the present invention includes a base component (A) that exhibits changed solubility in a developing solution by the action of acid (hereafter, referred to as “component (A)”), a photoreactive quencher (C) (hereafter, referred to as “component (C)”) and an acid generator component (B) which generates acid upon exposure (hereafter, referred to as “component (B)”).

With respect to a resist film formed using the resist composition, when a selective exposure is conducted during formation of a resist pattern, acid is generated from the component (B), and the generated acid acts on the component (A) to change the solubility of the component (A) in a developing solution. As a result, the solubility of the exposed portions in a developing solution is changed, whereas the solubility of the unexposed portions in a developing solution remains unchanged. Therefore, the exposed portions are dissolved and removed by developing in the case of a positive pattern, whereas the unexposed portions are dissolved and removed in the case of a negative pattern, and hence, a resist pattern can be formed.

In the present specification, a resist composition which forms a positive pattern by dissolving and removing the exposed portions is called a positive resist composition, and a resist composition which forms a negative pattern by dissolving and removing the unexposed portions is called a negative resist composition.

The resist composition of the present invention may be either a negative resist composition or a positive resist composition.

Further, in the formation of a resist pattern, the resist composition of the present invention can be applied to either an alkali developing process using an alkali developing solution in the developing treatment, or a solvent developing process using a developing solution containing an organic solvent (organic developing solution) in the developing treatment.

<Component (A)>

The component (A) is a base component which exhibits changed solubility in a developing solution by the action of acid.

As the component (A), an organic compound typically used as a base component for a chemically amplified resist composition can be used alone, or two or more of such organic compounds can be mixed together.

The term “base component” refers to an organic compound capable of forming a film, and is preferably an organic compound having a molecular weight of 500 or more. When the organic compound has a molecular weight of 500 or more, the film-forming ability is improved, and a resist pattern of nano level can be easily formed.

The “organic compound having a molecular weight of 500 or more” which can be used as a base component is broadly classified into non-polymers and polymers.

In general, as a non-polymer, any of those which have a molecular weight in the range of 500 to less than 4,000 is used. Hereafter, a non-polymer having a molecular weight in the range of 500 to less than 4,000 is referred to as a low molecular weight compound.

As a polymer, any of those which have a molecular weight of 1,000 or more is generally used. Hereafter, a polymer having a molecular weight of 1,000 or more is referred to as a polymeric compound. With respect to a polymeric compound, the “molecular weight” is the weight average molecular weight in terms of the polystyrene equivalent value determined by gel permeation chromatography (GPC). Hereafter, a polymeric compound is frequently referred to simply as a “resin”.

As the component (A), a resin component which exhibits changed solubility in a developing solution by the action of acid may be used. Alternatively, as the component (A), a low molecular weight material which exhibits changed solubility in a developing solution by the action of acid may be used, and a combination of these components may be used.

When the resist composition of the present invention is a resist composition which forms a negative pattern in an alkali developing process, for example, as the component (A), a base component that exhibits solubility in an alkali developing solution is used, and a cross-linking agent is blended in the negative resist composition.

The base component which exhibits solubility in an alkali developing solution contains alkali soluble groups such as a hydroxy group, a carboxy group and a sulfoneamide group. The cross-linking agent is a compound containing reactive groups capable of reacting with these alkali soluble groups. In the resist composition, when acid is generated from the component (B) upon exposure, the generated acid causes cross-linking between the base component and, the cross-linking agent, and hence, the cross-linked portion becomes insoluble in an alkali developing solution. Therefore, in the formation of a resist pattern, by conducting selective exposure to a resist film formed by applying the resist composition onto a substrate, the exposed portions become insoluble in an alkali developing solution, whereas the unexposed portions remain soluble in an alkali developing solution, and hence, a resist pattern can be formed by alkali developing.

Generally, as the base component that exhibits solubility in an alkali developing solution, a resin that exhibits solubility in an alkali developing solution (hereafter, referred to as “alkali soluble resin”) is used. Examples of the alkali soluble resin include a resin having a structural unit derived from at least one of α-(hydroxyalkyl)acrylic acid and an alkyl ester of α-(hydroxyalkyl)acrylic acid (preferably an alkyl ester having 1 to 5 carbon atoms), as disclosed in Japanese Unexamined Patent Application, First Publication No. 2000-206694; an acrylic resin which has a sulfonamide group and may have a carbon atom of the α-position having an atom other than a hydrogen atom or a substituent bonded thereto or a polycycloolefin resin having a sulfoneamide group, as disclosed in U.S. Pat. No. 6,949,325; an acrylic resin which may have the carbon atom of the α-position having an atom other than a hydrogen atom or a substituent bonded thereto and which has a fluorinated alcohol, as disclosed in U.S. Pat. No. 6,949,325, Japanese Unexamined Patent Application, First Publication No. 2005-336452 or Japanese Unexamined Patent Application, First Publication No. 2006-317803; and a polycyclolefin resin having a fluorinated alcohol, as disclosed in Japanese Unexamined Patent Application, First Publication No. 2006-259582. These resins are preferable in that a resist pattern can be formed with minimal swelling.

Here, the term “α-(hydroxyalkyl)acrylic acid” refers to one or both of acrylic acid which may has the carbon atom on the α-position having an atom other than a hydrogen atom or a substituent bonded thereto and which has a hydrogen atom bonded to a carbon atom on the α-position having the carboxyl group bonded thereto, and α-hydroxyalkylacrylic acid in which a hydroxyalkyl group (preferably a hydroxyalkyl group of 1 to 5 carbon atoms) is bonded to the carbon atom on the α-position.

As the cross-linking agent, typically, an amino-based cross-linking agent such as a glycoluril having a methylol group or an alkoxymethyl group, or a melamine-based cross-linking agent is preferable, as it enables formation of a resist pattern with minimal swelling. The amount of the cross-linking agent added is preferably within a range from 1 to 50 parts by weight, relative to 100 parts by weight of the alkali soluble resin.

In the case where the resist composition of the present invention is a resist composition which forms a positive pattern in an alkali developing process and a negative pattern in a solvent developing process, it is preferable to use a base component (A0) (hereafter, referred to as “component (A0)”) which exhibits increased polarity by the action of acid. By using the component (A0), since the polarity of the base component changes prior to and after exposure, an excellent development contrast can be obtained not only in an alkali developing process, but also in a solvent developing process.

More specifically, in the case of applying an alkali developing process, the component (A0) is substantially insoluble in an alkali developing solution prior to exposure, but when acid is generated from the component (B) upon exposure, the acid causes an increase in the polarity of the base component, thereby increasing the solubility of the component (A0) in an alkali developing solution. Therefore, in the formation of a resist pattern, by conducting selective exposure to a resist film formed by applying the resist composition to a substrate, the exposed portions change from an insoluble state to a soluble state in an alkali developing solution, whereas the unexposed portions remain insoluble in an alkali developing solution, and hence, a contrast can be made between the exposed portions and unexposed portions, and a positive resist pattern can be formed by developing using an alkali developing solution.

On the other hand, in the case of a solvent developing process, the component (A0) exhibits high solubility in an organic developing solution prior to exposure, and when acid is generated from the component (B) upon exposure, the polarity of the component (A0) is increased by the action of the generated acid, thereby decreasing the solubility of the component (A0) in an organic developing solution. Therefore, in the formation of a resist pattern, by conducting selective exposure to a resist film formed by applying the resist composition to a substrate, the exposed portions changes from an soluble state to an insoluble state in an organic developing solution, whereas the unexposed portions remain soluble in an organic developing solution. As a result, by conducting development using an organic developing solution, a contrast can be made between the exposed portions and unexposed portions, thereby enabling the formation of a negative resist pattern by developing using an organic developing solution.

In the resist composition of the present invention, the component (A) is preferably a base component which exhibits increased polarity by the action of acid (i.e., a component (A0)). That is, the resist composition of the present invention is preferably a resist composition which becomes a positive type in the case of an alkali developing process, and a negative type in the case of a solvent developing process.

The component (A0) may be a resin component (A1) that exhibits increased polarity under the action of acid (hereafter, frequently referred to as “component (A1)”), a low molecular weight material (A2) that exhibits increased polarity under the action of acid (hereafter, frequently referred to as “component (A2)”), or a mixture thereof.

{Component (A1)}

As the component (A1), a resin component (base resin) typically used as a base component for a chemically amplified resist composition can be used alone, or two or more of such resin components can be mixed together.

The component (A1) preferably has a structural unit (a1) containing an acid decomposable group that exhibits increased polarity by the action of acid.

The component (A1) preferably further includes a structural unit (a2) containing an —SO₂— containing cyclic group or a lactone-containing cyclic group, as well as the structural unit (a1).

The component (A1) preferably further includes a structural unit (a3) containing a polar group, as well as the structural unit (a1), or the structural unit (a1) and the structural unit (a2).

[Structural unit (a1)]

The structural unit (a1) is a structural unit containing an acid decomposable group which exhibits increased polarity by the action of acid.

The term “acid decomposable group” refers to a group in which at least a part of the bond within the structure thereof is cleaved by the action of an acid.

Examples of acid decomposable groups which exhibit increased polarity by the action of an acid include groups which are decomposed by the action of acid to form a polar group.

Examples of the polar group include a carboxy group, a hydroxy group, an amino group and a sulfo group (—SO₃H). Among these, a polar group containing —OH in the structure thereof (hereafter, frequently referred to as “OH-containing polar group”) is preferable, a carboxy group or a hydroxy group is more preferable, and a carboxy group is particularly desirable.

Specific examples of an acid decomposable group include a group in which the aforementioned polar group has been protected with an acid dissociable group (such as a group in which the hydrogen atom of the OH-containing polar group has been protected with an acid dissociable group) can be given.

An “acid dissociable group” is a group in which exhibits acid dissociable properties that at least a bond between an acid dissociable group and an atom adjacent to the acid dissociable group is cleaved by the action of acid. It is necessary that the acid dissociable group that constitutes the acid decomposable group is a group which exhibits a lower polarity than the polar group generated by the dissociation of the acid dissociable group. Thus, when the acid dissociable group is dissociated by the action of acid, a polar group exhibiting a higher polarity than that of the acid dissociable group is generated, thereby increasing the polarity. As a result, the polarity of the entire component (A1) is increased. When the polarity of the component (A1) is increased, the solubility in a developing solution is changed relatively. For example, when the developing solution is an alkali developing solution, the solubility of the component (A1) in the developing solution is increased. On the other hand, when the developing solution is an organic developing solution, the solubility of the component (A1) in the developing solution is decreased.

The acid dissociable group is not particularly limited, and any of the groups that have been conventionally proposed as acid dissociable groups for the base resins of chemically amplified resists can be used. Generally, groups that form either a cyclic or chain-like tertiary alkyl ester with the carboxyl group of the (meth)acrylic acid, and acetal-type acid dissociable groups such as alkoxyalkyl groups are widely known.

Here, a “tertiary alkyl ester” describes a structure in which an ester is formed by substituting the hydrogen atom of a carboxyl group with a chain-like or cyclic tertiary alkyl group, and a tertiary carbon atom within the chain-like or cyclic tertiary alkyl group is bonded to the oxygen atom at the terminal of the carbonyloxy group (—C(═O)—O—). In this tertiary alkyl ester, the action of acid causes cleavage of the bond between the oxygen atom and the tertiary carbon atom, thereby forming a carboxy group.

The chain-like or cyclic alkyl group may have a substituent.

Hereafter, for the sake of simplicity, groups that exhibit acid dissociability as a result of the formation of a tertiary alkyl ester with a carboxyl group are referred to as “tertiary alkyl ester-type acid dissociable groups”.

Examples of tertiary alkyl ester-type acid dissociable groups include aliphatic branched, acid dissociable groups and aliphatic cyclic group-containing acid dissociable groups.

The term “aliphatic branched” refers to a branched structure having no aromaticity. The “aliphatic branched, acid dissociable group” is not limited to be constituted of only carbon atoms and hydrogen atoms (not limited to hydrocarbon groups), but is preferably a hydrocarbon group. Further, the “hydrocarbon group” may be either saturated or unsaturated, but is preferably saturated.

As an example of the aliphatic branched, acid dissociable group, for example, a group represented by the formula —C(R⁷¹)(R⁷²)(R⁷³) can be given. In the formula, each of R⁷¹ to R⁷³ independently represents a linear alkyl group of 1 to 5 carbon atoms. The group represented by the formula —C(R⁷¹)(R⁷²)(R⁷³) preferably has 4 to 8 carbon atoms, and specific examples include a tert-butyl group, a 2-methyl-2-butyl group, a 2-methyl-2-pentyl group and a 3-methyl-3-pentyl group. Among these, a tert-butyl group is particularly desirable.

The term “aliphatic cyclic group” refers to a monocyclic group or polycyclic group that has no aromaticity.

In the “aliphatic cyclic group-containing acid dissociable group”, the “aliphatic cyclic group” may or may not have a substituent. Examples of the substituent include an alkyl group of 1 to 5 carbon atoms, an alkoxy group of 1 to 5 carbon atoms, a fluorine atom, a fluorinated alkyl group of 1 to 5 carbon atoms, and an oxygen atom (═O).

The basic ring of the “aliphatic cyclic group” exclusive of substituents is not limited to a structure consisting of a carbon atom and a hydrogen atom (not limited to hydrocarbon groups), but is preferably a hydrocarbon group. Further, the “hydrocarbon group” may be either saturated or unsaturated, but is preferably saturated.

The aliphatic cyclic group may be either a monocyclic group or a polycyclic group.

As such aliphatic cyclic groups, groups in which one or more hydrogen atoms have been removed from a monocycloalkane or a polycycloalkane such as a bicycloalkane, tricycloalkane or tetracycloalkane which may or may not be substituted with an alkyl group of 1 to 5 carbon atoms, a fluorine atom or a fluorinated alkyl group, may be used. Specific examples of aliphatic cyclic hydrocarbon groups include groups in which one or more hydrogen atoms have been removed from a monocycloalkane such as cyclopentane or cyclohexane; and groups in which one or more hydrogen atoms have been removed from a polycycloalkane such as adamantane, norbornane, isobornane, tricyclodecane or tetracyclododecane. In these aliphatic cyclic hydrocarbon groups, part of the carbon atoms constituting the ring may be replaced with an ethereal oxygen atom (—O—).

Examples of aliphatic cyclic group-containing acid dissociable groups include

(i) a monovalent aliphatic cyclic group in which a substituent (a group or an atom other than hydrogen) is bonded to the carbon atom on the ring skeleton to which an atom adjacent to the acid dissociable group (e.g., “—O—” within “—C(═O)—O— group”) is bonded to form a tertiary carbon atom; and

(ii) a group which has a branched alkylene group containing a tertiary carbon atom, and a monovalent aliphatic cyclic group to which the tertiary carbon atom is bonded.

In the group (i), as the substituent bonded to the carbon atom to which an atom adjacent to the acid dissociable group on the ring skeleton of the aliphatic cyclic group is bonded, an alkyl group can be mentioned. Examples of the alkyl group include the same groups as those represented by R¹⁴ in formulas (1-1) to (1-9) described later.

Specific examples of the group (i) include groups represented by general formulas (1-1) to (1-9) shown below.

Specific examples of the group (ii) include groups represented by general formulas (2-1) to (2-6) shown below.

In the formulas above, R¹⁴ represents an alkyl group; and g represents an integer of 0 to 8.

In the formulas above, each of R¹⁵ and R¹⁶ independently represents an alkyl group.

In formulas (1-1) to (1-9), the alkyl group for R^(N) may be linear, branched or cyclic, and is preferably linear or branched.

The linear alkyl group preferably has 1 to 5 carbon atoms, more preferably 1 to 4, and still more preferably 1 or 2. Specific examples include a methyl group, an ethyl group, an n-propyl group, an n-butyl group and an n-pentyl group. Among these, a methyl group, an ethyl group or an n-butyl group is preferable, and a methyl group or an ethyl group is more preferable.

The branched alkyl group preferably has 3 to 10 carbon atoms, and more preferably 3 to 5. Specific examples of such branched alkyl groups include an isopropyl group, an isobutyl group, a tert-butyl group, an isopentyl group and a neopentyl group, and an isopropyl group is most desirable.

In general formula (1-2), g is preferably an integer of 0 to 4, more preferably an integer of 1 to 4, and most preferably 1 or 2.

In formulas (2-1) to (2-6), as the alkyl group for R¹⁵ and R¹⁶, the same alkyl groups as those for R¹⁴ can be used.

In formulas (1-1) to (1-9) and (2-1) to (2-6), part of the carbon atoms constituting the ring may be replaced with an ethereal oxygen atom (—O—).

Further, in formulas (1-1) to (1-9) and (2-1) to (2-6), one or more of the hydrogen atoms bonded to the carbon atoms constituting the ring may be substituted with a substituent. Examples of the substituent include an alkyl group of 1 to 5 carbon atoms, a fluorine atom and a fluorinated alkyl group.

An “acetal-type acid dissociable group” generally substitutes a hydrogen atom at the terminal of an OH-containing polar group such as a carboxy group or hydroxy group, so as to be bonded with an oxygen atom. The acid acts to break the bond between the acetal-type acid dissociable group and the oxygen atom to which the acetal-type, acid dissociable group is bonded, thereby forming an OH-containing polar group such as a carboxy group or a hydroxy group.

Examples of acetal-type acid dissociable groups include groups represented by general formula (p1) shown below.

In the formula, R¹′ and R²′ each independently represent a hydrogen atom or an alkyl group of 1 to 5 carbon atoms; n represents an integer of 0 to 3; and Y represents an alkyl group of 1 to 5 carbon atoms or an aliphatic cyclic group.

In general formula (p1), n is preferably an integer of 0 to 2, more preferably 0 or 1, and most preferably 0.

Specific examples of the alkyl groups of 1 to 5 carbon atoms for R¹′ and R²′ include linear or branched alkyl groups such as a methyl group, an ethyl group, a propyl group, an isopropyl group, an n-butyl group, an isobutyl group, a tert-butyl group, a pentyl group, an isopentyl group and a neopentyl group. Among these examples, a methyl group or an ethyl group is preferable, and a methyl group is most desirable.

As the alkyl group of 1 to 5 carbon atoms for Y, the same alkyl groups of 1 to 5 carbon atoms as those above for R¹′ and R²′ can be used.

As the aliphatic cyclic group for Y, any of the aliphatic monocyclic/polycyclic groups which have been proposed for conventional ArF resists and the like can be appropriately selected for use. For example, the same aliphatic cyclic groups described above in connection with the “aliphatic cyclic group-containing acid dissociable group” can be used.

As the groups represented by the general formula (p1), it is preferable that at least one of R¹′ and R²′ be a hydrogen atom. That is, a group represented by general formula (p1-1) shown below is preferable.

In the formula, R^(h), n and Y are the same as defined above.

Further, as the acetal-type, acid dissociable group, groups represented by general formula (p2) shown below can also be used.

In the formula, R¹⁷ and R¹⁸ each independently represent a linear or branched alkyl group or a hydrogen atom; and R¹⁹ represents a linear, branched or cyclic alkyl group; or R¹⁷ and R¹⁹ each independently represents a linear or branched alkylene group, and the terminal of R¹⁷ may be bonded to the terminal of R¹⁹ to form a ring.

In the formula (p2), the alkyl group for R¹⁷ and R¹⁸ may be linear or branched. The number of carbon atoms within the alkyl group is preferably from 1 to 15. As the alkyl group for R¹⁷ and R¹⁸, an ethyl group or a methyl group is preferable, and a methyl group is most preferable.

It is preferable that at least one of R¹⁷ and R¹⁸ be a hydrogen atom, and it is particularly preferable that one of R¹⁷ and R¹⁸ be a hydrogen atom, and the other be a methyl group.

The alkyl group for R¹⁹ may be any of linear, branched or cyclic. The number of carbon atoms within the alkyl group is preferably from 1 to 15.

When R¹⁹ represents a linear or branched alkyl group, it is preferably an alkyl group of 1 to 5 carbon atoms, more preferably an ethyl group or methyl group, and most preferably an ethyl group.

When R¹⁹ represents a cycloalkyl group, it preferably has 4 to 15 carbon atoms, more preferably 4 to 12 carbon atoms, and most preferably 5 to 10 carbon atoms. As examples of the cycloalkyl group, groups in which one or more hydrogen atoms have been removed from a monocycloalkane or a polycycloalkane such as a bicycloalkane, tricycloalkane or tetracycloalkane, which may or may not be substituted with a fluorine atom or a fluorinated alkyl group, may be used. Specific examples include groups in which one or more hydrogen atoms have been removed from a monocycloalkane such as cyclopentane and cyclohexane; and groups in which one or more hydrogen atoms have been removed from a polycycloalkane such as adamantane, norbornane, isobornane, tricyclodecane or tetracyclododecane. Among these, a group in which one or more hydrogen atoms have been removed from adamantane is preferable.

In general formula (p2) above, R¹⁷ and R¹⁹ may each independently represent a linear or branched alkylene group (preferably an alkylene group of 1 to 5 carbon atoms), and the terminal of R¹⁹ may be bonded to the terminal of R¹⁷.

In such a case, a cyclic group is formed by R¹⁷, R¹⁹, the oxygen atom having R¹⁹ bonded thereto, and the carbon atom having the oxygen atom and R¹⁷ bonded thereto. Such a cyclic group is preferably a 4 to 7-membered ring, and more preferably a 4 to 6-membered ring. Specific examples of the cyclic group include tetrahydropyranyl group and tetrahydrofuranyl group.

The structural unit (a1)) is not particularly limited as long as it has an acid decomposable group, and a structural unit which is derived from a compound containing an ethylenic double bond, and which has an acid decomposable group is preferred.

Here, the “structural unit derived from a compound containing an ethylenic double bond” refers to a structural unit in which the ethylenic double bond of the compound containing an ethylenic double bond is cleaved to form a single bond.

Examples of the compound containing an ethylenic double bond include an acrylic acid or ester thereof which may have the hydrogen atom bonded to the carbon atom on the α-position substituted with a substituent, an acrylamide or derivative thereof which may have the hydrogen atom bonded to the carbon atom on the α-position substituted with a substituent, a vinyl aromatic compound which may have the hydrogen atom bonded to the carbon atom on the α-position substituted with a substituent, a cycloolefine or derivative thereof, and a vinyl sulfonate ester and the like. Among these, an acrylic acid or ester thereof which may have the hydrogen atom bonded to the carbon atom on the α-position substituted with a substituent, an acrylamide or derivative thereof which may have the hydrogen atom bonded to the carbon atom on the α-position substituted with a substituent, and a vinyl aromatic compound which may have the hydrogen atom bonded to the carbon atom on the α-position substituted with a substituent are preferable.

An “acrylate ester” refers to a compound in which the terminal hydrogen atom of the carboxy group of acrylic acid (CH₂═CH—COOH) has been substituted with an organic group.

In the present specification, an acrylic acid and acrylate ester in which the hydrogen atom bonded to the carbon atom on the a position has been substituted with a substituent are referred to as an “α-substituted acrylic acid” and an “α-substituted acrylate ester”, respectively. Further, acrylic acid and α-substituted acrylic acid are collectively referred to as “(α-substituted) acrylic acid”, and acrylate esters and α-substituted acrylate esters are collectively referred to as “(α-substituted) acrylate ester”.

Examples of the substituent bonded to the carbon atom on the α-position of the α-substituted acrylic acid or ester thereof include a halogen atom, an alkyl group of 1 to 5 carbon atoms, a halogenated alkyl group of 1 to 5 carbon atoms and a hydroxyalkyl group. With respect to the structural unit derived from an acrylate ester, the α-position (the carbon atom on the α-position) refers to the carbon atom having the carbonyl group bonded thereto, unless specified otherwise.

Examples of the halogen atom as a substituent on the α-position include a fluorine atom, a chlorine atom, a bromine atom and an iodine atom.

Specific examples of the alkyl group of 1 to 5 carbon atoms as a substituent on the α-position include linear or branched alkyl groups such as a methyl group, an ethyl group, a propyl group, an isopropyl group, an n-butyl group, an isobutyl group, a tert-butyl group, a pentyl group, an isopentyl group, and a neopentyl group.

Specific examples of the halogenated alkyl group of 1 to 5 carbon atoms as a substituent on the α-position include groups in which part or all of the hydrogen atoms of the aforementioned alkyl group of 1 to 5 carbon atoms are substituted with halogen atoms. Examples of the halogen atom include a fluorine atom, a chlorine atom, a bromine atom and an iodine atom, and a fluorine atom is particularly preferred.

As the hydroxyalkyl group as a substituent on the α-position, a hydroxyalkyl group of 1 to 5 carbon atoms is preferred. Specific examples include groups in which part or all of the hydrogen atoms of the aforementioned alkyl group of 1 to 5 carbon atoms are substituted with a hydroxy group.

In the present invention, it is preferable that a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms is bonded to the α-position of the (α-substituted) acrylic acid of ester thereof, a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a fluorinated alkyl group of 1 to 5 carbon atoms is more preferable, and in terms of industrial availability, a hydrogen atom or a methyl group is the most preferred.

The “organic group” refers to a group containing a carbon atom, and may include atoms other than carbon atoms (e.g., a hydrogen atom, an oxygen atom, a nitrogen atom, a sulfur atom, a halogen atom (such as a fluorine atom and a chlorine atom) and the like).

The organic group in (α-substituted) acrylate ester is not particularly limited. Examples thereof include the aforementioned aromatic group, a characteristic group such as a polarity conversion group and an acid decomposable group described later and a characteristic group-containing group which contain the characteristic group in the structure thereof. Examples of the characteristic group-containing group include a group in which a divalent linking group is bonded to the characteristic group. Examples of the divalent linking group include the same divalent linking groups as those described later for Y² in the general formula (a1-3).

Examples of the “acrylamide and derivative thereof” include an acryl amide which may have the hydrogen atom bonded to the carbon atom on the α-position substituted with a substituent (hereafter, frequently referred to as (α-substituted) acrylamide) and a compound in which one or both of hydrogen atoms at the terminal of the amino group within the (α-substituted) acrylamide have been substituted with a substituent.

As the substituent which may be bonded to the carbon atom on the α-position of an acrylamide or derivatives thereof, the same substituents as those described above for the substituent to be bonded to the carbon atom on the α-position of an α-substituted acrylate ester can be mentioned.

As the substituent with which one or both of hydrogen atoms at the terminal of the amino group within (α-substituted) acrylamide are substituted, an organic group is preferable. The organic group is not particularly limited, and examples thereof include the same groups as described for the organic groups within (α-substituted) acrylate ester.

Examples of the compound in which one or both of hydrogen atom at the terminal of amino group within the (α-substituted) acrylamide have been substituted with a substituent include a compound in which —C(═O)—O— bonded to carbon atom on the α-position of the (α-substituted) acrylate ester is replaced by —C(═O)—N(R^(b))— [in the formula, R^(b) represents a hydrogen atom or an alkyl group of 1 to 5 carbon atoms].

In the formula, the alkyl group for R^(b) is preferably a linear or branched alkyl group.

The “vinyl aromatic compound” is a compound having an aromatic ring and one vinyl group bonded to the aromatic ring, and as the examples thereof, a styrene or derivative thereof and a vinylnaphthalene and derivative thereof can be mentioned.

As the substituent which may be bonded to the carbon atom (that is, the carbon atom of the vinyl group, which is bonded to the aromatic ring) on the α-position of a vinyl aromatic compound, the same substituents as those described above for the substituent to be bonded to the carbon atom on the α-position of an α-substituted acrylate ester can be mentioned.

Hereafter, a vinyl aromatic compound in which the hydrogen atom bonded to the carbon atom on the α-position has been substituted with a substituent is frequently referred to as an (α-substituted) vinyl aromatic compound.

Examples of the “styrene and derivative thereof” include a styrene which may have the hydrogen atom bonded to the carbon atom on the α-position substituted with a substituent and may have the hydrogen atom bonded to the benzene ring substituted with a substituent other than the hydroxy group (hereafter, frequently referred to as (α-substituted)styrene), a hydroxystyrene which may have the hydrogen atom bonded to the carbon atom on the α-position substituted with a substituent and may have a hydrogen atom bonded to the benzene ring substituted with a substituent other than a hydroxy group (hereafter, frequently referred to as (α-substituted)hydroxystyrene), a compound in which a hydrogen atom of hydroxy group of (α-substituted)hydroxystyrene is substituted with an organic group, a vinylbenzoic acid which may have the hydrogen atom bonded to the carbon atom on the α-position substituted with a substituent and may have a hydrogen atom bonded to the benzene ring substituted with a substituent other than a hydroxy group or carboxy group (hereafter, frequently referred to as (α-substituted)vinylbenzoic acid), and a compound in which a hydrogen atom of carboxy group of (α-substituted)vinylbenzoic acid is substituted with an organic group.

A hydroxystyrene is a compound which has one vinyl group and at least one hydroxy group bonded to a benzene ring. The number of hydroxy groups bonded to the benzene ring is preferably 1 to 3, and particularly preferably 1. The bonding position of the hydroxy group on the benzene ring is not particularly limited. When the number of the hydroxy group is 1, para (4th) position against the bonding position of the vinyl group is preferable. When the number of the hydroxy groups is an integer of 2 or more, an arbitrary combination of the bonding positions can be adopted.

The vinylbenzoic acid is a compound in which one vinyl group is bonded to the benzene ring within the benzoic acid. The bonding position of the vinyl group on the benzene ring is not particularly limited.

The substituent other than a hydroxy group or a carboxy group which may be bonded to the benzene ring of an styrene or derivative thereof is not particularly limited, and examples thereof include a halogen atom, an alkyl group of 1 to 5 carbon atoms and a halogenated alkyl group of 1 to 5 carbon atoms. Examples of the halogen atom include a fluorine atom, a chlorine atom, a bromine atom and an iodine atom, and a fluorine atom is particularly preferred.

The organic group within a compound in which the hydrogen atom of the hydroxy group within the (α-substituted) hydroxystyrene is substituted with an organic group is not particularly limited, and examples thereof include the same groups as described for the organic groups within (α-substituted) acrylate ester.

The organic group within a compound in which the hydrogen atom of the carboxy group within the (α-substituted) vinylbenzoic acid is substituted with an organic group is not particularly limited, and examples thereof include the same organic groups as those described for the organic group within (α-substituted) acrylate ester.

Examples of the “vinylnaphthalene and derivative thereof” include a vinylnaphthalene which may have the hydrogen atom bonded to the carbon atom on the α-position substituted with a substituent and may have the hydrogen atom bonded to the naphthalene ring substituted with a substituent other than the hydroxy group (hereafter, frequently referred to as (α-substituted) vinyl naphthalene), a vinyl (hydroxynaphthalene) which may have the hydrogen atom bonded to the carbon atom on the α-position substituted with a substituent and may have a hydrogen atom bonded to the naphthalene ring substituted with a substituent other than a hydroxy group (hereafter, frequently referred to as (α-substituted) vinyl(hydroxynaphthalene)) and a compound in which a hydrogen atom of hydroxy group within (α-substituted) vinyl(hydroxynaphthalene) is substituted with a substituent.

A vinyl(hydroxynaphthalene) is a compound which has one vinyl group and at least one hydroxy group bonded to a naphthalene ring. The vinyl group may be bonded to the 1st or 2nd position of the naphthalene ring. The number of hydroxy groups bonded to the naphthalene ring is preferably 1 to 3, and particularly preferably 1. The bonding position of the hydroxy group on the naphthalene ring is not particularly limited. When the vinyl group is bonded to the 1st or 2nd position of the naphthalene ring, the hydroxy group is preferably bonded to either one of the 5th to 8th position of the naphthalene ring. In particular, when the number of hydroxy group is 1, the hydroxy group is preferably bonded to either one of the 5th to 7th position of the naphthalene ring, and more preferably the 5th or 6th position. When the number of the hydroxy groups is an integer of 2 or more, an arbitrary combination of the bonding positions can be adopted.

As the substituent which may be bonded to the naphthanlene ring of the vinylnaphthalene or derivative thereof, the same substituents as those described above for the substituent which may be bonded to the benzene ring of the (α-substituted) styrene can be mentioned.

The organic group within a compound in which the hydrogen atom of the hydroxy group within the (α-substituted) vinyl(hydroxynaphthalene) is substituted with an organic group is not particularly limited, and examples thereof include the same organic groups as those described for the organic group within (α-substituted) acrylate ester.

Examples of the structural unit (a1) include: a structural unit (all) derived from an acrylate ester which may have the hydrogen atom bonded to the carbon atom on the α-position substituted with a substituent and contains an acid decomposable group; a structural unit (a12) derived from a hydroxystyrene which may have the hydrogen atom bonded to the carbon atom on the α-position substituted with a substituent and may have the hydrogen atom bonded to the benzene ring substituted with a substituent other than a hydroxy group, and which has the hydrogen atom of the hydroxy group substituted with an acid dissociable group or a substituent containing an acid dissociable group; and a structural unit (a13) derived from a vinyl(hydroxynaphthalene) which may have the hydrogen atom bonded to the carbon atom on the α-position substituted with a substituent and may have the hydrogen atom bonded to the naphthalene ring substituted with a substituent other than a hydroxy group, and which has the hydrogen atom of the hydroxy group substituted with an acid dissociable group or a substituent containing an acid dissociable group.

[Structural unit (a11)]

The structural unit (a11) is a structural unit derived from an acrylate ester which may have the hydrogen atom bonded to the carbon atom on the α-position substituted with a substituent and contains an acid decomposable group.

Examples of the structural unit (a11) include a structural unit represented by general formula (a1-0-1) shown below and a structural unit represented by general formula (a1-0-2) shown below.

In the formulas, R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms; X¹ represents an acid dissociable group; Y² represents a divalent linking group; and X² represents an acid dissociable group.

In general formula (a1-0-1), the alkyl group and the halogenated alkyl group for R are respectively the same alkyl group of 1 to 5 carbon atoms and the halogenated alkyl group of 1 to 5 carbon atoms as defined above for a substituent which may be bonded to the carbon atom on the α-position of the aforementioned α-substituted acrylic acid or ester thereof.

R is preferably a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a fluorinated alkyl group of 1 to 5 carbon atoms, and most preferably a hydrogen atom or a methyl group.

X¹ is not particularly limited as long as it is an acid dissociable group. Examples thereof include the aforementioned tertiary alkyl ester-type acid dissociable groups and acetal-type acid dissociable groups, and tertiary alkyl ester-type acid dissociable groups are preferable.

In general formula (a1-0-2), R is the same as defined for R in general formula (a1-0-1).

X² is the same as defined above for X¹ in general formula (a1-0-1).

The divalent linking group for Y² is not particularly limited, and preferable examples thereof include a divalent hydrocarbon group which may have a substituent and a divalent linking group containing a hetero atom.

(Divalent Hydrocarbon Group which May have a Substituent)

The hydrocarbon group as the divalent linking group may be either an aliphatic hydrocarbon group or an aromatic hydrocarbon group.

An “aliphatic hydrocarbon group” refers to a hydrocarbon group that has no aromaticity. The aliphatic hydrocarbon group may be saturated or unsaturated. In general, the aliphatic hydrocarbon group is preferably saturated.

As specific examples of the aliphatic hydrocarbon group, a linear or branched aliphatic hydrocarbon group, and an aliphatic hydrocarbon group containing a ring in the structure thereof can be given.

The linear or branched aliphatic hydrocarbon group preferably has 1 to 10 carbon atoms, more preferably 1 to 8, and still more preferably 1 to 5.

As the linear aliphatic hydrocarbon group, a linear alkylene group is preferable, and specific examples include a methylene group [—CH₂—], an ethylene group [—(CH₂)₂—], a trimethylene group [—(CH₂)₃—], a tetramethylene group [—(CH₂)₄—] and a pentamethylene group [—(CH₂)₅—].

As the branched aliphatic hydrocarbon group, a branched alkylene group is preferable, and specific examples include alkylalkylene groups, e.g., alkylmethylene groups such as —CH(CH₃)—, —CH(CH₂CH₃)—, —C(CH₃)₂—, —C(CH₃)(CH₂CH₃)—, —C(CH₃)(CH₂CH₂CH₃)—, and —C(CH₂CH₃)₂—; alkylethylene groups such as —CH(CH₃)CH₂—, —CH(CH₃)CH(CH₃)—, —C(CH₃)₂CH₂—, —CH(CH₂CH₃)CH₂—, and —C(CH₂CH₃)₂—CH₂—; alkyltrimethylene groups such as —CH(CH₃)CH₂CH₂—, and —CH₂CH(CH₃)CH₂—; and alkyltetramethylene groups such as —CH(CH₃)CH₂CH₂CH₂—, and —CH₂CH(CH₃)CH₂CH₂—. As the alkyl group within the alkylalkylene group, a linear alkyl group of 1 to 5 carbon atoms is preferable.

The linear or branched aliphatic hydrocarbon group may or may not have a substituent (that is, a group or an atom other than hydrogen atom) which substitutes a hydrogen atom in the linear or branched aliphatic hydrocarbon group. Examples of the substituent include a fluorine atom, a fluorinated alkyl group of 1 to 5 carbon atoms, and an oxo group (═O).

As examples of the aliphatic hydrocarbon group containing a ring in the structure thereof, a cyclic aliphatic hydrocarbon group which may have a substituent containing a hetero atom in the ring structure thereof (a group in which two hydrogen atoms have been removed from an aliphatic hydrocarbon ring) and a group in which the cyclic aliphatic hydrocarbon group has been bonded to the terminal of the linear or branched aliphatic hydrocarbon group or interposed within the aforementioned linear or branched aliphatic hydrocarbon group, can be given. Examples of the linear or branched aliphatic hydrocarbon group include the same groups as described above.

The cyclic aliphatic hydrocarbon group preferably has 3 to 20 carbon atoms, and more preferably 3 to 12 carbon atoms.

The cyclic aliphatic hydrocarbon group may be either a polycyclic group or a monocyclic group. As the monocyclic aliphatic hydrocarbon group, a group in which 2 hydrogen atoms have been removed from a monocycloalkane is preferable. The monocycloalkane preferably has 3 to 6 carbon atoms, and specific examples thereof include cyclopentane and cyclohexane. As the polycyclic aliphatic hydrocarbon group, a group in which two hydrogen atoms have been removed from a polycycloalkane is preferable, and the polycycloalkane preferably has 7 to 12 carbon atoms. Examples of the polycycloalkane include adamantane, norbornane, isobornane, tricyclodecane and tetracyclododecane.

The cyclic aliphatic hydrocarbon group may or may not have a substituent (that is, a group or an atom other than hydrogen atom) which substitutes a hydrogen atom in the cyclic aliphatic hydrocarbon group. Examples of substituents include an alkyl group, an alkoxy group, a halogen atom, a halogenated alkyl group, a hydroxyl group and an oxo group (═O).

The alkyl group as a substituent is preferably an alkyl group of 1 to 5 carbon atoms, and a methyl group, an ethyl group, a propyl group, an n-butyl group or a tert-butyl group is most desirable.

The alkoxy group as a substituent is preferably an alkoxy group having 1 to 5 carbon atoms, more preferably a methoxy group, an ethoxy group, an n-propoxy group, an iso-propoxy group, an n-butoxy group or a tert-butoxy group, and most preferably a methoxy group or an ethoxy group.

Examples of the halogen atom as a substituent include a fluorine atom, a chlorine atom, a bromine atom and an iodine atom, and a fluorine atom is preferable.

Examples of the halogenated alkyl group as a substituent include groups in which part or all of the hydrogen atoms within the aforementioned alkyl groups has been substituted with the aforementioned halogen atoms.

Further, part of the carbon atoms constituting the cyclic structure of the cyclic aliphatic hydrocarbon group may be substituted with a hetero atom-containing substituent group. The hetero atom-containing substituent group is preferably —O—, —C(═O)—O—, —S—, —S(═O)₂— or —S(═O)₂—O—.

The aromatic hydrocarbon group as a divalent hydrocarbon group is a divalent hydrocarbon group having at least one aromatic ring, and may have a substituent. The aromatic ring is not particularly limited as long as it is a cyclic conjugation ring having 4n+2 of π electrons, and may be a monocyclic or a polycyclic. The aromatic ring preferably has 5 to 30 carbon atoms, more preferably 5 to 20, still more preferably 6 to 15, and particularly preferably 6 to 12. Here, the number of carbon atoms within a substituent(s) is not included in the number of carbon atoms of the aromatic ring. Examples of the aromatic ring include aromatic hydrocarbon rings such as benzene, naphthalene, anthracene and phenanthrene and aromatic heterocycles in which part of the carbon atoms of the aromatic hydrocarbon ring have been substituted with a hetero atom. Examples of hetero atoms within the aromatic heterocycle include an oxygen atom, a nitrogen atom, and a sulfur atom. Specific examples of aromatic heterocycles include a pyridine ring and a thiophene ring.

Specific examples of the aromatic hydrocarbon group include a group in which two hydrogen atoms have been removed from the aromatic hydrocarbon ring or aromatic heterocycle (arylene group or heteroarylene group); a group in which two hydrogen atoms have been removed from an aromatic compound having two or more aromatic rings (for example, biphenyl or fluorene); a group in which one hydrogen atom has been removed from the aromatic hydrocarbon group or aromatic heterocycle (aryl group or heteroaryl group) and another one hydrogen atom has been substituted with an alkylene group (for example, a group in which one hydrogen atom has been removed from an aryl group of an arylalkyl group such as a benzyl group, a phenethyl group, a 1-naphthylmethyl group, a 2-naphthylmethyl group, a 1-naphthylethyl group, or a 2-naphthylethyl group).

The alkylene group bonded to the aryl group or heteroaryl group preferably has 1 to 4 carbon atom, more preferably 1 or 2, and particularly preferably 1.

In the aromatic hydrocarbon group, one or more of the hydrogen atoms in the aromatic hydrocarbon group may be substituted with a substituent. For example, the hydrogen atom bonded to the aromatic ring in the aromatic hydrocarbon group may be substituted with a substituent. Examples of substituents include an alkyl group, an alkoxy group, a halogen atom, a halogenated alkyl group, a hydroxyl group and an oxo group (═O).

The alkyl group as a substituent is preferably an alkyl group of 1 to 5 carbon atoms, and a methyl group, an ethyl group, a propyl group, an n-butyl group or a tert-butyl group is most desirable.

The alkoxy group as a substituent is preferably an alkoxy group having 1 to 5 carbon atoms, more preferably a methoxy group, an ethoxy group, an n-propoxy group, an iso-propoxy group, an n-butoxy group or a tert-butoxy group, and most preferably a methoxy group or an ethoxy group.

Examples of the halogen atom as a substituent include a fluorine atom, a chlorine atom, a bromine atom and an iodine atom, and a fluorine atom is preferable.

Examples of the halogenated alkyl group as a substituent include groups in which part or all of the hydrogen atoms within the aforementioned alkyl groups has been substituted with the aforementioned halogen atoms.

(Divalent Linking Group Containing a Hetero Atom)

With respect to a divalent linking group containing a hetero atom, a hetero atom is an atom other than carbon and hydrogen, and examples thereof include an oxygen atom, a nitrogen atom, a sulfur atom and a halogen atom.

Specific examples of the divalent linking group containing a hetero atom include non-hydrocarbon linking groups such as —O—, —C(═O)—, —C(═O)—O—, —O—C(═O)—O—, —S—, —S(═O)₂—, —S(═O)₂—O—, —NH—, —NH—C(═O)—, —NH—C(═NH)— and ═N—; and a combination of any one of these non-hydrocarbon linking groups with a divalent hydrocarbon group. As the divalent hydrocarbon group, the same groups as those described above for the divalent hydrocarbon group which may have a substituent can be given, and a linear or branched aliphatic hydrocarbon group is preferable.

The hydrogen atom included in —NH— within —C(═O)—NH—, —NH— or —NH— within —NH—C(═NH)— may be substituted with a substituent such as an alkyl group or an acyl group. The substituent preferably has 1 to 10 carbon atoms, more preferably 1 to 8 carbon atoms, and particularly preferably 1 to 5 carbon atoms.

As Y², a linear or branched alkylene group, a cyclic aliphatic hydrocarbon group or a divalent linking group containing a hetero atom is particularly preferable.

When Y² represents a linear or branched alkylene group, it preferably has 1 to 10 carbon atoms, more preferably 1 to 6, particularly preferably 1 to 4, and most preferably 1 to 3. Specific examples include the same linear alkylene groups and branched alkylene groups as those described above for the linear or branched aliphatic hydrocarbon group in the explanation of the “divalent hydrocarbon group which may have a substituent” as a divalent linking group.

When Y² represents a cyclic aliphatic hydrocarbon group, as the cyclic aliphatic hydrocarbon group, the same cyclic aliphatic hydrocarbon group as those described above for the “aliphatic hydrocarbon group containing a ring in the structure thereof” explained above in relation to the “divalent hydrocarbon group which may have a substituent” as a divalent linking group.

As the cyclic aliphatic hydrocarbon group, a group in which two or more hydrogen atoms have been removed from cyclopentane, cyclohexane, norbornane, isobornane, adamantane, tricyclodecane or tetracyclododecane is particularly desirable.

When Y² represents a divalent linking group containing a hetero atom, preferably examples of the divalent linking group containing a hetero atom include —O—, —C(═O)—O—, —C(═O)—, —C(═O)—NH—, —NH— (wherein H may be substituted with a substituent such as an alkyl group and an acyl group), —S—, —S(═O)₂—, —S(═O)₂—O—, a group represented by general formulas —Y²¹—O—Y²²—, —Y²¹—O—, —Y²¹—C(—C)—O—, —[Y²¹—C(═O)—O]_(m′)—Y²²— or —Y²¹—O—C(═O)—Y²²— [in the formulas, each of Y²¹ and Y²² independently represents a divalent hydrocarbon group which may have a substituent; 0 represents an oxygen atom; and m′ represents an integer of 0 to 3.]

When Y² represents —NH—, H in —NH— may be substituted with a substituent such as an alkyl group, an acyl group or the like. The substituent (an alkyl group, an acyl group or the like) preferably has 1 to 10 carbon atoms, more preferably 1 to 8, and particularly preferably 1 to 5.

In the formula —Y²¹—O—Y²²—, —Y²¹—O—, —Y²¹—C(═O)—O—, —[Y²¹—C(═O)—O]_(m′)—Y²²— or —Y²¹—O—C(═O)—Y²²—, Y²¹ and Y²² each independently represents a divalent hydrocarbon group which may have a substituent. Examples of the divalent hydrocarbon group include the same divalent hydrocarbon group which may have a substituent as described above in the explanation of the divalent linking group.

As Y²¹, a linear aliphatic hydrocarbon group is preferable, more preferably a linear alkylene group, still more preferably a linear alkylene group of 1 to 5 carbon atoms, and a methylene group or an ethylene group is particularly desirable.

As Y²², a linear or branched aliphatic hydrocarbon group is preferable, and a methylene group, an ethylene group or an alkylmethylene group is more preferable. The alkyl group within the alkylmethylene group is preferably a linear alkyl group of 1 to 5 carbon atoms, more preferably a linear alkyl group of 1 to 3 carbon atoms, and most preferably a methyl group.

In the group represented by the formula —[Y²¹—C(═)—O]_(m′)—Y²²—, m′ represents an integer of 0 to 3, preferably an integer of 0 to 2, more preferably 0 or 1, and particularly preferably 1. Namely, it is particularly desirable that the group represented by the formula —[Y²¹—C(═O)—O]_(m′)—Y²²— is a group represented by the formula —Y²¹—C(═O)—O—Y²²—. Among these, a group represented by the formula —(CH₂)_(a′)—C(═O)—O—(CH₂)_(b′)— is preferable. In the formula, a′ is an integer of 1 to 10, preferably an integer of 1 to 8, more preferably an integer of 1 to 5, still more preferably 1 or 2, and most preferably 1. b′ is an integer of 1 to 10, preferably an integer of 1 to 8, more preferably an integer of 1 to 5, still more preferably 1 or 2, and most preferably 1.

As the divalent linking group containing a hetero atom for Y², an organic group which consists of a combination of at least one of non-hydrocarbon groups and a divalent hydrocarbon group can be mentioned. In particular, as the divalent linking group containing a hetero atom, a linear group containing an oxygen atom as the hetero atom e.g., a group containing an ether bond or an ester bond is preferable, and a group represented by the aforementioned formula —Y²¹—O—Y²²—, —Y²¹—O—, —Y²¹—C(═O)—O—, —[Y²¹—C(═O)—O]_(m′)—Y²²— or —Y²¹—O—C(═O)—Y²²— is more preferable, and a group represented by the aforementioned formula —[Y²¹—C(═O)—O]_(m′)—Y²²— or —Y²¹—O—C(═O)—Y²²— is still more preferable.

Among these, as for Y², a linear or branched alkylene group or a divalent linking group containing a hetero atom is preferable, and a linear or branched alkylene group, a group represented by the formula —Y²¹—O—Y²²—, a group represented by the formula —[Y²¹—C(═O)—O]_(m′)—Y²²—, or a group represented by the formula —Y²¹—O—C(═O)—Y²²— is more preferable.

Specific examples of the structural unit (a11) include structural units represented by general formulas (a1-1) to (a1-4) shown below.

In the formulas, R, R¹′, R²′, n, Y and Y² are the same as defined above; and X′ represents a tertiary alkyl ester-type acid dissociable group.

In the formulas, R is the same as defined above for R in the formula (a1-0-1).

The tertiary alkyl ester-type acid dissociable group for X′ include the same tertiary alkyl ester-type acid dissociable groups as those described above.

As R¹′, R²′, n and Y are respectively the same as defined for R¹′, R²′, n and Y in the general formula (p1) described above in connection with the “acetal-type acid dissociable group”.

Y² is the same as defined for Y² in the aforementioned general formula (a1-0-2).

Specific examples of structural units represented by general formulas (a1-1) to (a1-4) are shown below.

In the formulas shown below, R^(α) represents a hydrogen atom, a methyl group or a trifluoromethyl group.

As the structural unit (a11), at least one structural unit selected from the group consisting of a structural unit represented by general formula (a1-0-11) shown below, a structural unit represented by general formula (a1-0-12) shown below, a structural unit represented by general formula (a1-0-13) shown below, a structural unit represented by general formula (a1-0-14) shown below, a structural unit represented by general formula (a1-0-15) shown below and a structural unit represented by general formula (a1-0-2) shown below is preferable.

In the formulas, R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms; R²¹ represents an alkyl group; R²² represents a group which forms an aliphatic monocyclic group with the carbon atom having R²² bonded thereto; R²³ represents a branched alkyl group; R²⁴ represents a group which forms an aliphatic polycyclic group with the carbon atom having R²⁴ bonded thereto; R²⁵ represents a linear alkyl group of 1 to 5 carbon atoms; each of R¹⁵ and R¹⁶ independently represents an alkyl group; Y² represents a divalent linking group; and X² represents an acid dissociable group.

In the formulas, R, Y² and X² are the same as defined above.

In general formula (a1-0-11), as the alkyl group for R²¹, the same alkyl groups as those described above for R¹⁴ in formulas (1-1) to (1-9) can be used, and a methyl group, an ethyl group or an isopropyl group can be preferably used.

As the aliphatic monocyclic group formed by R²² and the carbon atoms having R²² bonded thereto, the same aliphatic cyclic groups as those described above in relation to the aforementioned tertiary alkyl ester-type acid dissociable group and which are monocyclic can be used. Specific examples include groups in which one or more hydrogen atoms have been removed from a monocycloalkane. The monocycloalkane is preferably a 3- to 11-membered ring, more preferably a 3- to 8-membered ring, still more preferably a 4- to 6-membered ring, and particularly preferably a 5- or 6-membered ring.

The monocycloalkane may or may not have part of the carbon atoms constituting the ring replaced with an ether bond (—O—).

As an examples of R²² constituting such an aliphatic monocyclic group, a linear alkylene group which may have an ether bond (—O—) interposed between the carbon atoms can be given.

Further, the aliphatic monocyclic group may have a substituent such as an alkyl group of 1 to 5 carbon atoms, a fluorine atom or a fluorinated alkyl group of 1 to 5 carbon atoms.

Specific examples of structural units represented by general formula (a1-0-11) include structural units represented by the aforementioned formulas (a1-0-18) to (a1-1-31). Among these, a structural unit represented by general formula (a1-0-02) shown below which includes the structural units represented by the aforementioned formulas (a1-0-18) to (a1-1-29) is preferable. Further, a structural unit represented by general formula (a1-0-02′) shown below is also preferable.

In the formulas, h represents an integer of 1 to 4, and is preferably 1 or 2.

In the formulas, R and R²¹ are the same as defined above; and h represents an integer of 1 to 4.

In general formula (a1-0-12), as the branched alkyl group for R²³, the same alkyl groups as those described above for R¹⁴ which are branched in the formulas (1-1) to (1-9) can be used, and an isopropyl group is most desirable.

As the aliphatic polycyclic group formed by R²⁴ and the carbon atoms having R²⁴ bonded thereto, the same aliphatic cyclic groups as those described above in relation to the aforementioned tertiary alkyl ester-type acid dissociable group and which are polycyclic can be used.

Specific examples of structural units represented by general formula (a1-0-12) include structural units represented by the aforementioned formulas (a1-0-4), (a1-1-5), (a1-1-8), (a1-1-12) and (a1-1-16) which were described above as specific examples of the structural unit represented by the general formula (a1-1).

As the structural unit (a1-0-12), a structural unit in which the aliphatic polycyclic group formed by R²⁴ and the carbon atom having R²⁴ bonded thereto is a 2-adamantyl group is preferable, and a structural unit represented by the aforementioned formula (a1-1-4) is particularly desirable.

In general formula (a1-0-13), R²⁴ is the same as defined above.

As the linear alkyl group for R²⁵, the same linear alkyl groups as those described above for R¹⁴ in the aforementioned formulas (1-1) to (1-9) can be mentioned, and a methyl group or an ethyl group is most desirable.

Specific examples of structural units represented by general formula (a1-0-13) include structural units represented by the aforementioned formulas (a1-0-1) to (a1-1-3), (a1-1-6), (a1-1-7), (a1-1-9) to (a1-1-11), (a1-1-13) to (a1-1-15) and (a-1-1-17) which were described above as specific examples of the structural unit represented by the general formula (a1-1).

As the structural unit (a1-0-13), a structural unit in which the aliphatic polycyclic group formed by R²⁴ and the carbon atom having R²⁴ bonded thereto is a 2-adamantyl group is preferable, and a structural unit represented by the aforementioned formula (a1-1-1) or (a1-1-2) is particularly desirable.

In general formula (a1-0-14), R²² is the same as defined above.

R¹⁵ and R¹⁶ are the same as defined for R¹⁵ and R¹⁶ in the general formulas (2-1) to (2-6).

Specific examples of structural units represented by general formula (a1-0-14) include a structural unit represented by the aforementioned formula (a1-0-36) exemplified as specific examples of the structural unit represented by the general formula (a1-1).

In general formula (a1-0-15), R²⁴ is the same as defined above.

R¹⁵ and R¹⁶ are the same as defined for R¹⁵ and R¹⁶ in the general formulas (2-1) to (2-6).

Specific examples of structural units represented by general formula (a1-0-15) include structural units represented by the aforementioned formulas (a1-0-32) to (a1-1-35) exemplified as specific examples of the structural unit represented by the general formula (a1-1).

Examples of structural units represented by general formula (a1-0-2) include structural units represented by the aforementioned formulas (a1-3) and (a1-4), and the structural unit represented by the formula (a1-3) is particularly preferable.

As the structural unit represented by general formula (a1-0-2), a structural unit in which Y² is a group represented by the aforementioned formula —Y²¹—O—Y²²— or —Y²¹—C(═O)—Y²²— is particularly desirable.

Preferable examples of such structural units include a structural unit represented by general formula (a1-0-01) shown below, a structural unit represented by general formula (a1-0-02) shown below, and a structural unit represented by general formula (a1-3-03) shown below.

In the formulas, R is the same as defined above; R¹³ represents a hydrogen atom or a methyl group; R¹⁴ represents an alkyl group; e represents an integer of 1 to 10; and n′ represents an integer of 0 to 4.

In the formula, R is as defined above; each of Y²′ and Y²″ independently represents a divalent linking group; X′ represents an acid dissociable group; and w represents an integer of 0 to 3.

In general formulas (a1-0-01) and (a1-3-02), R¹³ is preferably a hydrogen atom.

R¹⁴ is the same as defined for R¹⁴ in the aforementioned formulas (1-1) to (1-9).

e is preferably an integer of 1 to 8, more preferably 1 to 5, and most preferably 1 or 2.

n′ is preferably 1 or 2, and most preferably 2.

Specific examples of structural units represented by general formula (a1-0-01) include structural units represented by the aforementioned formulas (a1-0-25) and (a1-3-26).

Specific examples of structural units represented by general formula (a1-0-02) include structural units represented by the aforementioned formulas (a1-0-29) to (a1-3-31).

In general formula (a1-0-03), as the divalent linking group for Y²′ and Y²″, the same groups as those described above for Y² in the general formula (a1-3) can be used.

As Y²′, a divalent hydrocarbon group which may have a substituent is preferable, a linear aliphatic hydrocarbon group is more preferable, and a linear alkylene group is still more preferable. Among linear alkylene groups, a linear alkylene group of 1 to 5 carbon atoms is preferable, and a methylene group or an ethylene group is most desirable.

As Y²″, a divalent hydrocarbon group which may have a substituent is preferable, a linear aliphatic hydrocarbon group is more preferable, and a linear alkylene group is still more preferable. Among linear alkylene groups, a linear alkylene group of 1 to 5 carbon atoms is preferable, and a methylene group or an ethylene group is most desirable.

As the acid dissociable group for X′, the same groups as those described above can be used. X′ is preferably a tertiary alkyl ester-type acid dissociable group, more preferably the aforementioned group (i) in which a substituent is bonded to the carbon atom to which an atom adjacent to the acid dissociable group is bonded, on the ring skeleton of the monovalent aliphatic cyclic group to form a tertiary carbon atom. Among these, a group represented by the aforementioned general formula (1-1) is particularly desirable.

w represents an integer of 0 to 3, preferably an integer of 0 to 2, more preferably 0 or 1, and most preferably 1.

As the structural unit represented by general formula (a1-0-03), a structural unit represented by general formula (a1-3-03-1) or (a1-3-03-2) shown below is preferable, and a structural unit represented by general formula (a1-3-03-1) is particularly desirable.

In the formulas, R and R¹⁴ are the same as defined above; a′ represents an integer of 1 to 10; b′ represents an integer of 1 to 10; and t represents an integer of 0 to 4.

In the formulas (a1-3-03-1) and (a1-3-03-2), each of a′ and b′ represents the same groups as those described above for a′ and b′ in the group represented by the general formula —(CH₂)_(a′)—C(═O)—O—(CH₂)_(b′)— exemplified as a preferable example of the group represented by the formula —[Y²¹—C(═O)—O]_(m′)—Y²² in relation to the divalent linking group for Y².

a′ is preferably an integer of 1 to 8, more preferably 1 to 5, and still more preferably 1 or 2.

b′ is preferably an integer of 1 to 8, more preferably 1 to 5, and still more preferably 1 or 2.

t is preferably an integer of 1 to 4, and particularly preferably 1 or 2.

Specific examples of structural units represented by general formula (a1-0-03-1) or (a1-3-03-2) include structural units represented by the aforementioned formulas (a1-0-27), (a1-3-28) and (a1-3-32) to (a1-3-34).

[Structural Unit (a12)]

The structural unit (a12) is a structural unit derived from a hydroxystyrene which may have the hydrogen atom bonded to the carbon atom on the α-position substituted with a substituent and may have the hydrogen atom bonded to the benzene ring substituted with a substituent other than a hydroxy group, and which has the hydrogen atom of the hydroxy group substituted with an acid dissociable group or a substituent containing an acid dissociable group.

As the acid dissociable group for substituting the hydrogen atom of the hydroxy group, the aforementioned tertiary alkyl ester-type acid dissociable groups and acetal-type acid dissociable groups are preferable, and acetal-type acid dissociable groups are more preferable.

As the substituent containing an acid dissociable group, a group constituted of an acid dissociable group and a divalent linking group. As the divalent linking group, the same divalent linking group as those described for Y² in the formula (a1-3), and a group having a carbonyloxy group at the terminal of an acid dissociable group is particularly preferable. In this case, it is preferable that the acid dissociable group be bonded to the oxygen atom (—O—) in the carbonyloxy group.

As the substituent containing an acid dissociable group, a group represented by formula R¹¹′—O—C(═O)— and a group represented by formula R¹¹′—O—C(═O)—R¹²′—. In the formula, R¹¹′ represents an acid dissociable group, and R¹²′ represents a linear or branched alkylene group.

As the acid dissociable group for R¹¹′, the aforementioned tertiary alkyl ester-type acid dissociable groups and acetal-type acid dissociable groups are preferable, and tertiary alkyl ester-type acid dissociable groups are more preferable. Examples of the tertiary alkyl ester-type acid dissociable groups include aliphatic branched, acid dissociable groups represented by formula —C(R⁷¹)(R⁷²)(R⁷³) and groups represented by formula (1-1) to (1-9) and groups represented by formulas (2-1) to (2-6).

Examples of the alkylene group for R¹²′ include a methylene group, an ethylene group, a trimethylene group, a tetramethylene group and a 1,1-dimethylethylene group. As R¹²′, a linear alkylene group is preferable.

The “substituent other than a hydroxy group” which may be bonded to the benzene ring is not particularly limited, and examples thereof include a halogen atom, an alkyl group of 1 to 5 carbon atoms, a halogenated alkyl group of 1 to 5 carbon atoms and a carboxy group. Examples of the halogen atom include a fluorine atom, a chlorine atom, a bromine atom and an iodine atom, and a fluorine atom is particularly preferred.

Among these, as the structural unit (a12), a structural unit represented by general formula (a12-1) shown below is preferable.

In the formula, R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms; px represents an integer of 1 to 3, and qx represents an integer of 0 to 4, provided that px+qx=1 to 5; X^(c) each independently represents a hydrogen atom, an acid dissociable group or a substituent containing an acid dissociable group, and at least one of X^(c) represents an acid dissociable group or a substituent containing an acid dissociable group; and R^(c) each independently represents a halogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms.

In general formula (a12-1), R is the same as defined above.

As the acid dissociable group and the substituent containing an acid dissociable group for X^(c), the same groups as those described above can be given.

px represents 1 to 3, and particularly preferably 1.

When px is 2 or 3, the plurality of X^(c) group may be the same or different from each other. For example, one of X^(c) may be an acid dissociable group or a substituent containing an acid dissociable group, and the other one or two of X^(c) may be a hydrogen atom. When qx is 2 to 4, the plurality of R^(c) group may be the same or different from each other.

The bonding position of OX_(c) on the benzene ring is not particularly limited. When px is 1, para (4th) position against the position to which the carbon atom on the α-position (carbon atom having R bonded thereto) is bonded is preferable. When px is an integer of 2 or more, an arbitrary combination of the bonding positions can be adopted.

Examples of the halogen atom for R^(c) include a fluorine atom, a chlorine atom, a bromine atom and an iodine atom, and a fluorine atom is particularly preferred.

As the alkyl group and the halogenated alkyl group for R^(c), the same alkyl groups and halogenated alkyl groups as those described above for R can be mentioned.

[Structural Unit (a13)]

The structural unit (a13) is a structural unit derived from a vinyl(hydroxynaphthalene) which may have the hydrogen atom bonded to the carbon atom on the α-position substituted with a substituent and may have the hydrogen atom bonded to the naphthalene ring substituted with a substituent other than a hydroxy group, and which has the hydrogen atom of the hydroxy group substituted with an acid dissociable group or a substituent containing an acid dissociable group.

In the structural unit (a13), example of the acid dissociable group and substituent containing an acid dissociable group for substituting the hydrogen atom of the hydroxy group include the same groups as those described above in relation to the structural unit (a12).

The “substituent other than a hydroxy group” with which the hydrogen atom bonded to the naphthalene ring may be substituted is not particularly limited, and examples thereof include a halogen atom, an alkyl group of 1 to 5 carbon atoms, a halogenated alkyl group of 1 to 5 carbon atoms and a carboxy group. Examples of the halogen atom include a fluorine atom, a chlorine atom, a bromine atom and an iodine atom, and a fluorine atom is particularly preferred.

Among these, as the structural unit (a13), a structural unit represented by general formula (a13-1) shown below is preferable.

In the formula, R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms; x represents an integer of 1 to 3; y represents an integer of 0 to 3; and z represents an integer of 0 to 3, provided that x+y+z=1 to 7; X^(d) each independently represents a hydrogen atom, an acid dissociable group or a substituent containing an acid dissociable group, and at least one of X^(d) represents an acid dissociable group or a substituent containing an acid dissociable group; and R^(d) each independently represents a halogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms.

In general formula (a13-1), R is the same as defined above.

As the acid dissociable group or substituent containing an acid dissociable group for X^(d), the same groups as those described above can be given.

x represents 1 to 3, and particularly preferably 1.

When x is 2 or 3, the plurality of X^(d) group may be the same or different from each other. For example, one of X^(d) may be an acid dissociable group or a substituent containing an acid dissociable group, and the other one or two of X^(d) may be a hydrogen atom. When x+y=2 to 6, the plurality of R^(d) group may be the same or different from each other.

In the formula, the carbon atom of the α-position (carbon atom having R bonded thereto) may be bonded 1st or 2nd position of the naphthalene ring.

The bonding position of OX^(d) on the naphthalene ring is not particularly limited. When the carbon atom of the α-position is bonded to the 1st or 2nd position of the naphthalene ring, the carbon atom is preferably bonded to either one of the 5th to 8th position of the naphthalene ring. In particular, when the number of OX^(d) group is 1, OX^(d) is preferably bonded to either one of the 5th to 7th position of the naphthalene ring, and more preferably the 5th or 6th position. When the number of the OX^(d) groups is an integer of 2 or more, an arbitrary combination of the bonding positions can be adopted.

As the halogen atom, alkyl group and halogenated alkyl group for R^(c), the same halogen atom, alkyl groups and halogenated alkyl groups as those described above for R^(c) can be mentioned.

As the structural unit (a1) contained in the component (A1), 1 type of structural unit may be used, or 2 or more types of structural units may be used.

Among these, as the structural unit (a1), a structural unit (a11) is preferred.

In the component (A1), the amount of the structural unit (a1) based on the combined total of all structural units constituting the component (A1) is preferably 15 to 70 mol %, more preferably 15 to 60 mol %, and still more preferably 20 to 55 mol %.

When the amount of the structural unit (a1) is at least as large as the lower limit of the above-mentioned range, a pattern can be easily formed using a resist composition prepared from the component (A1), and various lithography properties such as sensitivity, resolution, pattern shape and the like are improved. On the other hand, when the amount of the structural unit (a1) is no more than the upper limit of the above-mentioned range, a good balance can be achieved with the other structural units.

[Structural Unit (a2)]

It is preferable that the component (A1) include a structural unit (a2) containing an —SO₂— containing cyclic group or a lactone-containing cyclic group, as well as the structural unit (a1).

When the component (A1) is used for forming a resist film, the —SO₂— containing cyclic group or the lactone-containing cyclic group in the structural unit (a2) is effective in improving the adhesion between the resist film and the substrate. Furthermore, in the case of alkali developing process, it is effective in increasing the compatibility with the developing solution containing water such as an alkali developing solution.

In the case where the structural unit (a1) contains an —SO₂— containing cyclic group or a lactone-containing cyclic group in the structure thereof, the structural unit also falls under the definition of the structural unit (a2). However, the structural unit is regarded as a structural unit (a1), and is not regarded as a structural unit (a2).

Here, an “—SO₂— containing cyclic group” refers to a cyclic group having a ring containing —SO₂— within the ring skeleton thereof, i.e., a cyclic group in which the sulfur atom (S) within —SO₂— forms part of the ring skeleton of the cyclic group. The ring containing —SO₂— within the ring skeleton thereof is counted as the first ring. A cyclic group in which the only ring structure is the ring that contains —SO₂— in the ring skeleton thereof is referred to as a monocyclic group, and a group containing other ring structures is described as a polycyclic group regardless of the structure of the other rings. The —SO₂-containing cyclic group may be either a monocyclic group or a polycyclic group.

As the —SO₂— containing cyclic group, a cyclic group containing —O—SO₂— within the ring skeleton thereof, i.e., a cyclic group containing a sultone ring in which —O—S— within the —O—SO₂— group forms part of the ring skeleton thereof is particularly desirable.

The —SO₂— containing cyclic group preferably has 3 to 30 carbon atoms, more preferably 4 to 20, still more preferably 4 to 15, and particularly preferably 4 to 12. Herein, the number of carbon atoms refers to the number of carbon atoms constituting the ring skeleton, excluding the number of carbon atoms within a substituent.

The —SO₂— containing cyclic group may be either an —SO₂— containing aliphatic cyclic group or an —SO₂— containing aromatic cyclic group. An —SO₂— containing aliphatic cyclic group is preferable.

Examples of the —SO₂— containing aliphatic cyclic group include aliphatic cyclic groups in which part of the carbon atoms constituting the ring skeleton has been substituted with an —SO₂— group or an —O—SO₂— group and has at least one hydrogen atom removed from the aliphatic hydrocarbon ring. Specific examples include an aliphatic hydrocarbon ring in which a —CH₂— group constituting the ring skeleton thereof has been substituted with an —SO₂— group and has at least one hydrogen atom removed therefrom; and an aliphatic hydrocarbon ring in which a —CH₂—CH₂— group constituting the ring skeleton has been substituted with an —O—SO₂— group and has at least one hydrogen atom removed therefrom.

The alicyclic hydrocarbon ring preferably has 3 to 20 carbon atoms, and more preferably 3 to 12 carbon atoms.

The alicyclic hydrocarbon ring may be either a monocyclic group or a polycyclic group. As the monocyclic group, a group in which two hydrogen atoms have been removed from a monocycloalkane of 3 to 6 carbon atoms is preferable. Examples of the monocycloalkane include cyclopentane and cyclohexane. As the polycyclic alicyclic hydrocarbon group, a group in which two hydrogen atoms have been removed from a polycycloalkane of 7 to 12 carbon atoms is preferable. Examples of the polycycloalkane include adamantane, norbornane, isobornane, tricyclodecane and tetracyclododecane.

The —SO₂— containing cyclic group may have a substituent. Examples of substituents include an alkyl group, an alkoxy group, a halogen atom, a halogenated alkyl group, a hydroxy group, an oxygen atom (═O), —COOR″, —OC(═O)R″, a hydroxyalkyl group and a cyano group.

The alkyl group as a substituent is preferably an alkyl group of 1 to 6 carbon atoms. Further, the alkyl group is preferably a linear alkyl group or a branched alkyl group. Specific examples include a methyl group, ethyl group, propyl group, isopropyl group, n-butyl group, isobutyl group, tert-butyl group, pentyl group, isopentyl group, neopentyl group and hexyl group. Among these examples, a methyl group or an ethyl group is preferable, and a methyl group is particularly desirable.

As the alkoxy group as a substituent, an alkoxy group of 1 to 6 carbon atoms is preferable. Further, the alkoxy group is preferably a linear alkoxy group or a branched alkoxy group. Specific examples of the alkoxy groups include the aforementioned alkyl groups for the substituent containing an oxygen atom (—O—) bonded thereto.

Examples of the halogen atom as a substituent include a fluorine atom, a chlorine atom, a bromine atom and an iodine atom, and a fluorine atom is preferable.

Examples of the halogenated alkyl group as a substituent include groups in which part or all of the hydrogen atoms within the aforementioned alkyl groups has been substituted with the aforementioned halogen atoms.

As examples of the halogenated alkyl group as a substituent, groups in which part or all of the hydrogen atoms of the aforementioned alkyl groups for the substituent have been substituted with the aforementioned halogen atoms can be given. As the halogenated alkyl group, a fluorinated alkyl group is preferable, and a perfluoroalkyl group is particularly desirable.

In the —COOR″ group and the —OC(═O)R″ group, R″ represents a hydrogen atom or a linear, branched or cyclic alkyl group of 1 to 15 carbon atoms.

When R″ represents a linear or branched alkyl group, it is preferably an alkyl group of 1 to 10 carbon atoms, more preferably an alkyl group of 1 to 5 carbon atoms, and particularly preferably a methyl group or an ethyl group.

When R″ is a cyclic alkyl group (cycloalkyl group), it preferably has 3 to 15 carbon atoms, more preferably 4 to 12 carbon atoms, and most preferably 5 to 10 carbon atoms. As examples of the cycloalkyl group, groups in which one or more hydrogen atoms have been removed from a monocycloalkane or a polycycloalkane such as a bicycloalkane, tricycloalkane or tetracycloalkane, which may or may not be substituted with a fluorine atom or a fluorinated alkyl group, may be used. Specific examples include groups in which one or more hydrogen atoms have been removed from a monocycloalkane such as cyclopentane and cyclohexane; and groups in which one or more hydrogen atoms have been removed from a polycycloalkane such as adamantane, norbornane, isobornane, tricyclodecane or tetracyclododecane.

The hydroxyalkyl group as a substituent preferably has 1 to 6 carbon atoms, and specific examples thereof include the aforementioned alkyl groups as a substituent in which at least one hydrogen atom has been substituted with a hydroxy group.

More specific examples of the —SO₂— containing cyclic group include groups represented by general formulas (3-1) to (3-4) shown below.

In the formulas, A′ represents an oxygen atom, a sulfur atom or an alkylene group of 1 to 5 carbon atoms which may contain an oxygen atom or a sulfur atom; z represents an integer of 0 to 2; and R²⁷ represents an alkyl group, an alkoxy group, a halogenated alkyl group, a hydroxyl group, —COOR″, —OC(═O)R″, a hydroxyalkyl group or a cyano group, wherein R″ represents a hydrogen atom or an alkyl group.

In general formulas (3-1) to (3-4) above, A′ represents an oxygen atom (—O—), a sulfur atom (—S—) or an alkylene group of 1 to 5 carbon atoms which may contain an oxygen atom or a sulfur atom.

As the alkylene group of 1 to 5 carbon atoms for A′, a linear or branched alkylene group is preferable, and examples thereof include a methylene group, an ethylene group, an n-propylene group and an isopropylene group.

Examples of alkylene groups that contain an oxygen atom or a sulfur atom include the aforementioned alkylene groups in which —O— or —S— is bonded to the terminal of the alkylene group or interposed within the alkylene group. Specific examples of such alkylene groups include —O—CH₂—, —CH₂—O—CH₂—, —S—CH₂— and —CH₂—S—CH₂—.

As A′, an alkylene group of 1 to 5 carbon atoms or —O— is preferable, more preferably an alkylene group of 1 to 5 carbon atoms, and most preferably a methylene group.

z represents an integer of 0 to 2, and is most preferably 0.

If there are two of the R²⁷ groups, as indicated by the value z, then the two of the R²⁷ groups may be the same or different from each other.

As the alkyl group, alkoxy group, halogenated alkyl group, —COOR″, —OC(═O)R″ and hydroxyalkyl group for R²⁷, the same alkyl groups, alkoxy groups, halogenated alkyl groups, —COOR″, —OC(═O)R″ and hydroxyalkyl groups as those described above as the substituent for the —SO₂— containing cyclic group can be mentioned.

Specific examples of the cyclic groups represented by general formulas (3-1) to (3-4) are shown below. In the formulas shown below, “Ac” represents an acetyl group.

As the —SO₂— containing cyclic group, a group represented by the aforementioned general formula (3-1) is preferable, at least one member selected from the group consisting of groups represented by the aforementioned chemical formulas (a1-0-1), (3-1-18), (3-3-1) and (3-4-1) is more preferable, and a group represented by the chemical formula (a1-0-1) is most preferable.

The term “lactone-containing cyclic group” refers to a cyclic group including a ring containing an —O—C(═O)— structure (lactone ring). The term “lactone ring” refers to a single ring containing an —O—C(═O)— structure, and this ring is counted as the first ring. A lactone-containing cyclic group in which the only ring structure is the lactone ring is referred to as a monocyclic group, and groups containing other ring structures are described as polycyclic groups regardless of the structure of the other rings. The lactone-containing cyclic group may be either a monocyclic group or a polycyclic group.

The lactone-containing cyclic group for the structural unit (a2) is not particularly limited, and an arbitrary structural unit may be used. Specific examples of lactone-containing monocyclic groups include a group in which one hydrogen atom has been removed from a 4- to 6-membered lactone ring, such as a group in which one hydrogen atom has been removed from β-propionolatone, a group in which one hydrogen atom has been removed from γ-butyrolactone, and a group in which one hydrogen atom has been removed from 6-valerolactone. Further, specific examples of lactone-containing polycyclic groups include groups in which one hydrogen atom has been removed from a lactone ring-containing bicycloalkane, tricycloalkane or tetracycloalkane.

With respect to the structural unit (a2), the partial structure other than the —SO₂-containing cyclic group or a lactone-containing cyclic group is not particularly limited as long as the structural unit (a2) having an —SO₂— containing cyclic group or a lactone-containing cyclic group. The structural unit (a2) is preferably at least one structural unit selected from the group consisting of a structural unit derived from an acrylate ester which may have the hydrogen atom bonded to the carbon atom on the α-position substituted with a substituent and contains an —SO₂— containing cyclic group (hereafter, referred to as “structural unit (a2s)”), and a structural unit derived from an acrylate ester which may have the hydrogen atom bonded to the carbon atom on the α-position substituted with a substituent and contains a lactone-containing cyclic group (hereafter, referred to as “structural unit (a2^(L))”).

—Structural Unit (a2^(S)):

More specific examples of the structural unit (a2^(S)) include structural units represented by general formula (a2-0) shown below.

In the formula, R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms; R²⁸ represents an —SO₂-containing cyclic group; and R²⁹ represents a single bond or a divalent linking group.

In general formula (a2-0), R is the same as defined above.

R²⁸ is the same as defined for the aforementioned —SO₂— containing group.

R²⁹ may be either a single bond or a divalent linking group. In terms of the effects of the present invention, a divalent linking group is preferable.

The divalent linking group for R²⁹ is not particularly limited, and examples thereof include the same divalent linking groups as those described above for Y² in the aforementioned formula (a1-3). Among these, an alkylene group or a divalent linking group containing an ester bond (—C(═O)—O—) is preferable.

As the alkylene group, a linear or branched alkylene group is preferable. Specific examples include the same linear alkylene groups and branched alkylene groups as those described above in relation to the aliphatic hydrocarbon group for Y².

As the divalent linking group containing an ester bond, a group represented by general formula: —R³⁰—C(═O)—O— (in the formula, R³⁰ represents a divalent linking group) is particularly desirable. That is, the structural unit (a2^(S)) is preferably a structural unit represented by general formula (a1-0-1) shown below.

In the formula, R and R²⁸ are the same as defined above; and R³⁰ represents a divalent linking group.

R³⁰ is not particularly limited, and examples thereof include the same divalent linking groups as those described above for Y² in the aforementioned formula (a1-3).

As the divalent linking group for R³⁰, a linear or branched alkylene group, an aliphatic hydrocarbon group containing a ring in the structure thereof or a divalent linking group containing a hetero atom is preferable, and a linear or branched alkylene group or a divalent linking group containing an oxygen atom as a hetero atom is more preferable.

As the linear alkylene group, a methylene group or an ethylene group is preferable, and a methylene group is particularly desirable.

As the branched alkylene group, an alkylmethylene group or an alkylethylene group is preferable, and —CH(CH₃)—, —C(CH₃)₂— or —C(CH₃)₂CH₂— is particularly desirable.

As the divalent linking group containing an oxygen atom, a divalent linking group containing an ether bond or an ester bond is preferable, and a group represented by the aforementioned formulas —Y²¹—O—Y²²—, —[Y²¹—C(═O)—O]_(m′)—Y²²— or —Y²¹—O—C(═O)—Y²²— is more preferable. Each of Y²¹ and Y²² independently represents a divalent hydrocarbon group which may have a substituent and m′ represents an integer of 0 to 3. Among these, a group represented by formula —Y²¹—O—C(═O)—Y²²— is preferable, and a group represented by formula —(CH₂)_(c)—O—C(═O)—(CH₂)_(d)— is particularly preferable. c represents an integer of 1 to 5, and preferably 1 or 2. d represents an integer of 1 to 5, and preferably 1 or 2.

In particular, as the structural unit (a2^(S)), a structural unit represented by general formula (a1-0-11) or (a2-O-12) shown below is preferable, and a structural unit represented by general formula (a1-0-12) shown below is more preferable.

In the formulas, R, A′, R²⁷, z and R³⁰ are the same as defined above.

In general formula (a1-0-11), A′ is preferably a methylene group, an oxygen atom (—O—) or a sulfur atom (—S—).

As R³⁰, a linear or branched alkylene group or a divalent linking group containing an oxygen atom is preferable. As the linear or branched alkylene group and the divalent linking group containing an oxygen atom for R³⁰, the same linear or branched alkylene groups and the divalent linking groups containing an oxygen atom as those described above can be mentioned.

As the structural unit represented by general formula (a1-0-12), a structural unit represented by general formula (a1-0-12a) or (a2-0-12b) shown below is particularly desirable.

In the formulas, R and A′ are the same as defined above; and each of c to e independently represents an integer of 1 to 3.

Structural Unit (a2^(L)):

Examples of the structural unit (a2^(L)) include structural units represented by the aforementioned general formula (a2-0) in which the R²⁸ group has been substituted with a lactone-containing cyclic group. Specific examples include structural units represented by general formulas (a2-1) to (a2-5) shown below.

In the formulas, R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms; each R′ independently represents a hydrogen atom, an alkyl group, an alkoxy group, a halogenated alkyl group, a hydroxy group, —COOR″, —OC(═O)R″, a hydroxyalkyl group, or a cyano group, wherein R″ represents a hydrogen atom or an alkyl group; R²⁹ represents a single bond or a divalent linking group; s″ represents an integer of 0 to 2; A″ represents an oxygen atom, a sulfur atom or an alkylene group of 1 to 5 carbon atoms which may contain an oxygen atom or a sulfur atom; and m represents 0 or 1.

In general formulas (a2-1) to (a2-5), R is the same as defined above.

As the alkyl group, alkoxy group, halogenated alkyl group, —COOR″, —OC(═O)R″ and hydroxyalkyl group for R′, the same alkyl groups, alkoxy groups, halogenated alkyl groups, —COOR″, —OC(═O)R″ and hydroxyalkyl groups as those described above as the substituent for the —SO₂— containing cyclic group can be mentioned.

In terms of industrial availability, R′ is preferably a hydrogen atom.

The alkyl group for R″ may be any of linear, branched or cyclic.

When R″ is a linear or branched alkyl group, it preferably has 1 to 10 carbon atoms, more preferably 1 to 5 carbon atoms.

When R″ is a cyclic alkyl group (cycloalkyl group), it preferably has 3 to 15 carbon atoms, more preferably 4 to 12 carbon atoms, and most preferably 5 to 10 carbon atoms. As examples of the cycloalkyl group, groups in which one or more hydrogen atoms have been removed from a monocycloalkane or a polycycloalkane such as a bicycloalkane, tricycloalkane or tetracycloalkane, which may or may not be substituted with a fluorine atom or a fluorinated alkyl group, may be used. Examples of such groups include groups in which one or more hydrogen atoms have been removed from a monocycloalkane such as cyclopentane or cyclohexane; and groups in which one or more hydrogen atoms have been removed from a polycycloalkane such as adamantane, norbornane, isobornane, tricyclodecane or tetracyclododecane.

As examples of A″, the same groups as those described above for A′ in general formula (3-1) can be given. A″ is preferably an alkylene group of 1 to 5 carbon atoms, an oxygen atom (—O—) or a sulfur atom (—S—), and more preferably an alkylene group of 1 to 5 carbon atoms or —O—. As the alkylene group of 1 to 5 carbon atoms, a methylene group or a dimethylethylene group is preferable, and a methylene group is most desirable.

R²⁹ is the same as defined for R²⁹ in the aforementioned general formula (a2-0).

In formula (a2-1), s″ is preferably 1 or 2.

Specific examples of structural units represented by general formulas (a2-1) to (a2-5) are shown below. In the formulas shown below, R^(α) represents a hydrogen atom, a methyl group or a trifluoromethyl group.

As the structural unit (a2^(L)), a base component preferably includes at least one structural unit selected from the group consisting of structural units represented by the aforementioned general formulas (a2-1) to (a2-5), more preferably at least one structural unit selected from the group consisting of structural units represented by the aforementioned general formulas (a2-1) to (a2-3), and particularly preferably at least one structural unit selected from the group consisting of structural units represented by the aforementioned general formulas (a2-1) and (a2-3).

Specifically, a base component preferably includes at least one structural unit selected from the group consisting of formulas (a1-0-1), (a2-1-2), (a2-2-1), (a2-2-7), (a2-2-12), (a2-2-14), (a2-3-1) and (a2-3-5).

Furthermore, as the structural unit (a2^(L)), structural units represented by general formulas (a2-6) and (a2-7) are also preferable.

In the formula, R and R²⁹ is the same as those defined above.

As the structural unit (a2) contained in the component (A1), 1 structural unit may be used, or 2 or more types of structural units may be used. For example, as the structural unit (a2), a structural unit (a2^(S)) may be used alone, or a structural unit (a2^(L)), or a combination of these structural units may be used. Further, as the structural unit (a2^(S)) or the structural unit (a2^(L)), either a single type of structural unit may be used, or two or more types of structural units may be used in combination.

In the component (A1), the amount of the structural unit (a2) based on the combined total of all structural units constituting the component (A1) is preferably 1 to 80 mol %, more preferably 10 to 70 mol %, still more preferably 10 to 65 mol %, and particularly preferably 10 to 60 mol %. When the amount of the structural unit (a2) is at least as large as the lower limit of the above-mentioned range, the effect of using the structural unit (a2) can be satisfactorily achieved. On the other hand, when the amount of the structural unit (a2) is no more than the upper limit of the above-mentioned range, a good balance can be achieved with the other structural units, and various lithography properties such as DOF and CDU and pattern shape can be improved.

[Structural Unit (a3)]

The component (A1) may include a structural unit (a3) containing a polar group, as well as the structural unit (a1), or the structural units (a1) and (a2). When the component (A1) includes the structural unit (a3), the polarity of the component (A1) after exposure is enhanced. In the case of alkali development process, a high polarity contributes to improving resolution and the like.

Examples of the polar group include —OH, —COOH, —CN, —SO₂NH₂— and —CONH₂. As the structural unit containing —COOH, a structural unit derived from the (α-substituted) acrylic acid.

The structural unit (a3) is preferably a structural unit containing a hydrocarbon group in which part of the hydrogen atoms within the hydrocarbon group is substituted with the polar group. The hydrocarbon group may be either an aliphatic hydrocarbon group or an aromatic hydrocarbon group. Among these, the hydrocarbon group is preferably an aliphatic hydrocarbon group.

Examples of the aliphatic hydrocarbon group in the hydrocarbon group include linear or branched hydrocarbon groups (preferably alkylene groups) of 1 to 10 carbon atoms, and aliphatic cyclic groups (monocyclic groups and polycyclic groups).

These aliphatic cyclic groups (monocyclic groups and polycyclic groups) can be selected appropriately from the multitude of groups that have been proposed for the resins of resist compositions designed for use with ArF excimer lasers. The aliphatic cyclic group preferably has 3 to 30 carbon atoms, more preferably 5 to 30, still more preferably 5 to 20, particularly preferably 6 to 15, and most preferably 6 to 12. As the aliphatic cyclic group, a group in which two or more hydrogen atoms have been removed from a monocycloalkane or a polycycloalkane such as a bicycloalkane, tricycloalkane or tetracycloalkane can be used. Specific examples include groups in which two or more hydrogen atoms have been removed from a monocycloalkane such as cyclopentane or cyclohexane; and groups in which two or more hydrogen atoms have been removed from a polycycloalkane such as adamantane, norbornane, isobornane, tricyclodecane or tetracyclododecane. The aliphatic cyclic group may or may not have a substituent. Examples of the substituent include an alkyl group of 1 to 5 carbon atoms, a fluorine atom and a fluorinated alkyl group of 1 to 5 carbon atoms.

The aromatic hydrocarbon group in the hydrocarbon group is a hydrocarbon group having at least one aromatic ring.

The aromatic ring is not particularly limited as long as it is a cyclic conjugation ring having 4n+2 of π electrons, and may be a monocyclic or a polycyclic. The aromatic ring preferably has 5 to 30 carbon atoms, more preferably 5 to 20, still more preferably 6 to 15, and particularly preferably 6 to 12. Here, the number of carbon atoms within a substituent(s) is not included in the number of carbon atoms of the aromatic ring. Examples of the aromatic ring include aromatic hydrocarbon rings such as benzene, naphthalene, anthracene and phenanthrene and aromatic heterocycles in which part of the carbon atoms of the aromatic hydrocarbon ring have been substituted with a hetero atom. Examples of hetero atoms within the aromatic heterocycle include an oxygen atom, a nitrogen atom, and a sulfur atom. Specific examples of aromatic heterocycles include a pyridine ring and a thiophene ring.

Specific examples of the aromatic hydrocarbon group as a divalent hydrocarbon group include a group in which two hydrogen atoms have been removed from the aromatic hydrocarbon ring or aromatic heterocycle (arylene group or heteroarylene group); a group in which two hydrogen atoms have been removed from an aromatic compound having two or more aromatic rings (for example, biphenyl or fluorene); and a group in which one hydrogen atom has been removed from the aromatic ring within an aryl alkyl group or a heteroaryl alkyl group in which one hydrogen atom of the aromatic ring has been substituted with an alkylene group (for example, a benzyl group, a phenethyl group, a 1-naphthylmethyl group, a 2-naphthylmethyl group, a 1-naphthylethyl group, or a 2-naphthylethyl group). The alkylene group with which a hydrogen atom of the aromatic hydrocarbon ring or aromatic heterocycles has been substituted, preferably has 1 to 4 carbon atom, more preferably 1 or 2, and particularly preferably 1.

The aromatic hydrocarbon group may have a substituent. For example, the hydrogen atom bonded to the aromatic ring within the aromatic hydrocarbon group may be substituted with a substituent. Examples of substituents include an alkyl group, an alkoxy group, a halogen atom, a halogenated alkyl group, a hydroxy group and an oxygen atom (═O).

The alkyl group as a substituent is preferably an alkyl group of 1 to 5 carbon atoms, and a methyl group, an ethyl group, a propyl group, an n-butyl group or a tert-butyl group is most desirable.

Examples of the halogen atom as a substituent for the aromatic hydrocarbon group include a fluorine atom, a chlorine atom, a bromine atom and an iodine atom, and a fluorine atom is preferable.

Examples of the halogenated alkyl group as a substituent include groups in which part or all of the hydrogen atoms within the aforementioned alkyl groups has been substituted with the aforementioned halogen atoms.

Among these, as the structural unit (a3), a structural unit represented by general formula (a3-1) shown below is preferable.

In the formula, R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms; L⁰ represents —C(═O)—O—, —C(═O)—NR^(n)— (wherein R^(n) represents a hydrogen atom or an alkyl group of 1 to 5 carbon atoms) or a single bond; and R⁰ represents —COOH, or a hydrocarbon group containing at least one group selected from the group consisting of —OH, —COOH, —CN, —SO₂NH₂ and —CONH₂, and may contain an oxygen atom or a sulfur atom at an arbitrary position.

In formula (a3-1), R is the same as defined above.

In the formula (a3-1), L⁰ represents —C(═O)—O—, —C(═O)—NR^(n)— (wherein R^(n) represents a hydrogen atom or an alkyl group of 1 to 5 carbon atoms) or a single bond. As the alkyl group for R^(n), the same alkyl groups as those described above for R can be used.

In the formula (a3-1), R⁰ is a hydrocarbon group having at least one of the group consisting of —OH, —COOH, —CN, —SO₂NH₂ and —CONH₂ as a substituent, and may have an oxygen atom or a sulfur atom at an arbitrary position.

A “hydrocarbon group which have a substituent” means a group in which part or all of the hydrogen atoms within the hydrocarbon group is substituted with a substituent.

The hydrocarbon group for R⁰ may be either an aliphatic hydrocarbon group, or an aromatic hydrocarbon group.

Examples of the aliphatic hydrocarbon group for R⁰ include linear or branched hydrocarbon groups (preferably alkylene groups) of 1 to 10 carbon atoms, and aliphatic cyclic groups (monocyclic groups and polycyclic groups), and these definitions are the same as those described above.

The aromatic hydrocarbon group for R⁰ is a hydrocarbon group having an aromatic ring, and these definitions are the same as those described above.

R⁰ may include an oxygen atom or a sulfur atom at an arbitrary position. The group “may includes an oxygen atom or a sulfur atom at an arbitrary position” means a group in which part of the carbon atom constituting the hydrocarbon group or hydrocarbon group having a substituent (including the carbon atom of the substituent) may be substituted with an oxygen atom or a sulfur atom, or a group in which a hydrogen atom bonded to the hydrocarbon group may be substituted with an oxygen atom or a sulfur atom.

Examples of R⁰ containing an oxygen atom at an arbitrary position are shown below.

In the formulas, W⁰⁰ represents a hydrocarbon group; and R_(m) represents an alkylene group of 1 to 5 carbon atoms.

In the formula, W⁰⁰ represents a hydrocarbon group, and the same hydrocarbon group as those described for R⁰ in the formula (a3-1). W⁰⁰ is preferably an aliphatic hydrocarbon group, more preferably an aliphatic cyclic group (monocyclic group and polycyclic group).

R^(m) is preferably a linear or branched group, preferably an alkylene group of 1 to 3 carbon atoms, and more preferably a methylene group or an ethylene group.

Specific examples of the structural unit (a3) include structural units derived from (α-substituted) acrylic acid and structural units represented by general formulas (a3-11) to (a3-13) shown below.

Specific examples of the structural unit derived from the (α-substituted) acrylic acid include a structural unit represented by the general formula (a3-1) in which L⁰ is a single bond and R⁰ is —COOH.

In the formulas, R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms; W⁰¹ is an aromatic hydrocarbon group containing at least one group selected from the group consisting of —OH, —COOH, —CN, —SO₂NH₂ and —CONH₂ as a substituent; each of P⁰² and P⁰³ represents —C(═O)—O— or —C(═O)—NR^(n)— (wherein R^(n) represents a hydrogen atom or an alkyl group of 1 to 5 carbon atoms); W⁰² is a cyclic hydrocarbon group containing at least one group selected from the group consisting of —OH, —COOH, —CN, —SO₂NH₂ and —CONH₂ as a substituent and which may have an oxygen atom or a sulfur atom at an arbitrary position; and W⁰³ is a linear hydrocarbon group containing at least one group selected from the group consisting of —OH, —COOH, —CN, —SO₂NH₂ and —CONH₂ as a substituent.

[Structural Unit Represented by General Formula (a3-11)]

In general formula (a3-11), R is the same as defined for R in general formula (a3-1).

The aromatic hydrocarbon group for W⁰¹ is the same as defined for the aromatic hydrocarbon group for R⁰ in general formula (a3-1).

The aromatic hydrocarbon group for W⁰¹ may have a substituent other than at least one group selected from the group consisting of —OH, —COOH, —CN, —SO₂NH₂ and —CONH₂. Examples of the substituent include a halogen atom, an alkyl group of 1 to 5 carbon atoms and a halogenated alkyl group of 1 to 5 carbon atoms. Among these, a halogen atom is preferable, and a fluorine atom is particularly desirable.

Specific examples of structural units represented by general formula (a3-11) are shown below. In the formulas shown below, R″ represents a hydrogen atom, a methyl group or a trifluoromethyl group.

[Structural Unit Represented by General Formula (a3-12)]

In general formula (a3-12), R is the same as defined for R in general formula (a3-1).

P⁰² represents —C(═O)—O— or —C(═O)—NR^(n)— (wherein R^(n) represents a hydrogen atom or an alkyl group of 1 to 5 carbon atoms), and preferably —C(═O)—O—. The alkyl group for R^(n) is the same alkyl group as described above for R.

The cyclic hydrocarbon group for W^(O2) is the same groups as those described above for the aliphatic cyclic group (monocyclic group and polycyclic group) and the aromatic hydrocarbon group for R⁰ in general formula (a3-1).

W⁰² may include an oxygen atom or a sulfur atom at an arbitrary position, and the definition is the same as defined for R⁰ in the formula (a3-1).

Specific examples of structural units represented by general formula (a3-12) are shown below. In the formulas shown below, R^(α) represents a hydrogen atom, a methyl group or a trifluoromethyl group.

[Structural Unit Represented by General Formula (a3-13)]

In general formula (a3-13), R is the same as defined for R in general formula (a3-1).

P⁰³ represents —C(═O)—O— or —C(═O)—NR^(n)— (wherein R″ represents a hydrogen atom or an alkyl group of 1 to 5 carbon atoms), and preferably —C(═O)—O—. The alkyl group for R^(n) is the same alkyl group as described above for R.

The linear hydrocarbon group for W⁰³ preferably has 1 to 10 carbon atoms, more preferably 1 to 5 carbon atoms, and still more preferably 1 or 3 carbon atoms.

The linear hydrocarbon group for W⁰³ may have a substituent (a) other than —OH, —COOH, —CN, —SO₂NH₂ and —CONH₂. Examples of the substituent (a) include an alkyl group of 1 to 5 carbon atoms, an aliphatic cyclic group (monocyclic group and polycyclic group), a fluorine atom and a fluorinated alkyl group of 1 to 5 carbon atoms. The aliphatic cyclic group (monocyclic group and polycyclic group) for the substituent (a) preferably has 3 to 30 carbon atoms, more preferably 5 to 30, still more preferably 5 to 20, particularly preferably 6 to 15, and most preferably 6 to 12. As the aliphatic cyclic group, a group in which one or more hydrogen atoms have been removed from a monocycloalkane, or a group in which one or more hydrogen atoms have been removed from a polycycloalkane such as a bicycloalkane, tricycloalkane or tetracycloalkane can be used. Specific examples include groups in which one or more hydrogen atoms have been removed from a monocycloalkane such as cyclopentane or cyclohexane; and groups in which one or more hydrogen atoms have been removed from a polycycloalkane such as adamantane, norbornane, isobornane, tricyclodecane or tetracyclododecane.

In addition, the linear hydrocarbon group for W⁰³ may have a plurality of substituents (a), and the plurality of substituents (a) may be mutually bonded to form a ring, as in the case with the structural unit represented by the general formula (a3-13-a) shown below.

In the formula, R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms; each of R^(a1) and R^(a2) independently represents an alkyl group of 1 to 5 carbon atom, an aliphatic cyclic group (monocyclic group and polycyclic group), a fluorine atom or a fluorinated alkyl group of 1 to 5 carbon atoms, provided that R^(a1) and R^(a2) may be mutually bonded to form a ring; and q⁰ represents an integer of 1 to 4.

In general formula (a3-13-a), R is the same as defined for R in general formula (a3-1).

The aliphatic cyclic group (monocyclic group and polycyclic group) for R^(al) and R^(a2) is the same aliphatic cyclic group (monocyclic group and polycyclic group) for substituent (a) as described above.

R^(a1) and R^(a2) may be mutually bonded to form a ring. In such a case, a cyclic group is formed by R^(a1), R^(a2) and the carbon atom having R^(a1) and R^(a2) bonded thereto. The cyclic group may be either a monocyclic group or a polycyclic group. Specific examples include groups in which one or more hydrogen atoms have been removed from a monocycloalkane or polycycloalkane which is exemplified in the explanation of the aliphatic cyclic group (monocyclic group and polycyclic group) for the substituent (a).

q⁰ is preferably 1 or 2, and more preferably 1.

Specific examples of structural units represented by general formula (a3-13) are shown below. In the formulas shown below, R^(α) represents a hydrogen atom, a methyl group or a trifluoromethyl group.

As the structural unit (a3) contained in the component (A1), one type of structural unit may be used, or two or more types of structural units may be used.

In the component (A1), the amount of the structural unit (a3) based on the combined total of all structural units constituting the component (A1) is preferably 0 to 85 mol %, and more preferably 0 to 80 mol %. When the amount of the structural unit (a3) is at least as large as the lower limit of the above-mentioned range, the effect of using the structural unit (a3) (such as improvement effect in resolution, lithography properties and pattern shape) can be satisfactorily achieved. On the other hand, when the amount of the structural unit (a3) is no more than the upper limit of the above-mentioned range, a good balance can be achieved with the other structural units.

[Structural Unit (a4)]

The component (A1) may further include a structural unit (a4) containing an acid non-dissociable cyclic group as necessary. When the component (A1) includes the structural unit (a4), the dry etching resistance of the resist pattern to be formed can be improved. The hydrophobicity of the component (A1) is enhanced. In particular, in the case of conducting the development using a developing solution containing an organic solvent, improvement in hydrophobicity of the polymer contributes to improve resolution, resist pattern shape, and the like.

In the structural unit (a4), an “acid non-dissociable cyclic group” refers to a cyclic group which is not dissociated by the action of the acid generated from the component (B) upon exposure, and remains in the structural unit.

Specific examples of the structural unit (a4) include a structural unit in which an acid dissociable group in the structural unit (a1) has been substituted with an acid non-dissociable cyclic group. Among these, a structural unit (a41) derived from an acrylate ester which may have the hydrogen atom bonded to the carbon atom on the α-position substituted with a substituent and contains a non-acid-dissociable aliphatic cyclic group, a structural unit (a42) derived from a styrene which may have the hydrogen atom bonded to the carbon atom on the α-position substituted with a substituent, and a structural unit (a43) derived from a vinylnaphthalene which may have the hydrogen atom bonded to the carbon atom on the α-position substituted with a substituent are preferable.

In the structural unit (a41), specific examples of the acid non-dissociable aliphatic cyclic group include monovalent aliphatic cyclic groups in which the carbon atom having an atom adjacent to the aliphatic cyclic group (e.g., —O— within —C(═O)—O—) bonded thereto has no substituent (a group or an atom other than hydrogen) and groups in which one hydrogen atom of a primary or secondary alkyl group has been substituted with a monovalent aliphatic cyclic group.

The monovalent aliphatic cyclic group is not particularly limited as long as it is acid non-dissociable, and any of the multitude of conventional polycyclic groups used within the resin component of resist compositions for ArF excimer lasers or KrF excimer lasers (and particularly for ArF excimer lasers) can be used. The aliphatic cyclic group may be either saturated or unsaturated, preferably saturated.

The aliphatic cyclic group may or may not have a substituent. Examples of the substituent include an alkyl group of 1 to 5 carbon atoms, an alkoxyl group of 1 to 5 carbon atoms, a fluorine atom, a fluorinated alkyl group of 1 to 5 carbon atoms, and an oxygen atom (═O).

The basic ring of the “aliphatic cyclic group” exclusive of substituents is not limited to a structure consisting of a carbon atom and a hydrogen atom (not limited to hydrocarbon groups), but is preferably a hydrocarbon group. Further, the “hydrocarbon group” may be either saturated or unsaturated, but is preferably saturated.

The aliphatic cyclic group preferably has 3 to 30 carbon atoms, more preferably 5 to 30, still more preferably 5 to 20, particularly preferably 6 to 15, and most preferably 6 to 12.

The aliphatic cyclic group may be either a monocyclic group or a polycyclic group. As the monocyclic aliphatic cyclic group, a group in which one or more hydrogen atoms have been removed from a monocycloalkane is preferable. The monocycloalkane preferably has 3 to 6 carbon atoms, and specific examples thereof include cyclobutane, cyclopentane and cyclohexane. As the polycyclic aliphatic cyclic group, a group in which one or more hydrogen atoms have been removed from a polycycloalkane is preferable, and the polycyclic group preferably has 7 to 12 carbon atoms. Examples of the polycycloalkane include adamantane, norbornane, isobornane, tricyclodecane and tetracyclododecane. In these aliphatic cyclic groups, part of the carbon atoms constituting the ring may be replaced with an ethereal oxygen atom (—O—).

In terms of the aforementioned effects, as the aliphatic cyclic group, a polycyclic group is preferable. In particular, a bi-, tri- or tetracyclic group is preferable. In consideration of industrial availability and the like, at least one polycyclic group selected from amongst a tricyclodecyl group, an adamantyl group, a tetracyclododecyl group, an isobornyl group and a norbornyl group is particularly desirable.

Specific examples of the monovalent aliphatic cyclic group as an acid non-dissociable aliphatic cyclic group include monovalent aliphatic cyclic groups in which the carbon atom having an atom adjacent to the aliphatic cyclic group (e.g., —O— within —C(═O)—O—) bonded thereto has no substituent (a group or an atom other than hydrogen). More specific examples include groups represented by general formulas (1-1) to (1-9) explained above in relation to the acid dissociable group, in which the R¹⁴ group has been substituted with a hydrogen atom; and a cycloalkane having a tertiary carbon atom constituting the ring skeleton and having one hydrogen atom removed therefrom.

As the groups in which one hydrogen atom of a primary or secondary alkyl group has been substituted with a monovalent aliphatic cyclic group, a group represented by the formulas (2-1) to (2-6) explained above in relation to the acid dissociable group, in which at least one of R¹⁵ and R¹⁶ represents a hydrogen atom, can be mentioned.

As the structural unit (a41), a structural unit in which the acid dissociable group in the structural unit (a11) has been replaced with an acid non-dissociable group can be mentioned, and a structural unit represented by the general formula (a1-0-1) in which X¹ is replaced with an acid non-dissociable, aliphatic polycyclic group, that is, a structural unit represented by general formula (a4-0) shown below is preferable, and structural units represented by general formulas (a4-1) and (a4-5) shown below are particularly preferable.

In the formula, R is the same as defined above; and R⁴⁰ represents an acid non-dissociable, aliphatic polycyclic group.

In the formulas, R is the same as defined above.

Specific examples of the structural unit (a42) includes structural units (a12) represented by the general formula (a12-1) in which px indicating the number of —OX^(c) bonded to the benzene ring is 0 and qx indicating the number of arbitrary substituent R^(c) is an integer of 0 to 5.

Specific examples of the structural unit (a43) includes a structural unit represented by the general formula (a13-1) in which x indicating the number of —OX^(d) bonded to the naphthalene ring is 0 and “y+z” indicating the number of arbitrary substituent R^(d) is an integer of 0 to 7.

As the structural unit (a4) contained in the component (A1), 1 type of structural unit may be used, or 2 or more types of structural units may be used.

When the component (A1) contains the structural unit (a4), the amount of the structural unit (a4) based on the combined total of all structural units constituting the component (A1) is preferably 1 to 30 mol %, more preferably 1 to 20 mol %, and still more preferably 5 to 20 mol %. When the amount of the structural unit (a4) is at least as large as the lower limit of the above-mentioned range, the effect of using the structural unit (a4) can be satisfactorily achieved. On the other hand, when the amount of the structural unit (a4) is no more than the upper limit of the above-mentioned range, a good balance can be achieved with the other structural units.

The component (A1) may also have a structural unit other than the above-mentioned structural units (a1) to (a4), as long as the effects of the present invention are not impaired.

As such a structural unit, any other structural unit which cannot be classified as one of the above structural units (a1) to (a4) can be used without any particular limitation, and any of the multitude of conventional structural units used within resist resins for ArF excimer lasers, KrF excimer lasers, EB or EUV can be used.

The component (A1) is preferably a polymer containing the structural units (a1), and more preferably a copolymer containing at least one structural unit selected from the structural units (a2) and (a3), as well as the structural unit (a1). Among these, a copolymer containing the structural unit (a1) and the structural unit (a2) is preferable, and a copolymer containing the structural unit (a1), the structural unit (a2) and the structural unit (a3) is particularly preferable.

Examples of the polymers or copolymers include a copolymer consisting of the structural units (a1) and (a2), a copolymer consisting of the structural units (a1) and (a3), a copolymer consisting of the structural units (a1), (a2) and (a3), and a copolymer consisting of the structural units (a1), (a2), (a3) and (a4).

As the structural unit (a1), structural unit (a2), structural unit (a3) and structural unit (a4) contained in the polymer or copolymer, 1 structural unit may be used, or 2 or more types of structural units may be used, respectively.

The weight average molecular weight (Mw) (the polystyrene equivalent value determined by gel permeation chromatography) of the component (A1) is not particularly limited, but is preferably 1,000 to 50,000, more preferably 1,500 to 30,000, and most preferably 2,000 to 20,000. When the weight average molecular weight of the component (A1) is no more than the upper limit of the above-mentioned range, the resist composition exhibits a satisfactory solubility in a resist solvent. On the other hand, when the weight average molecular weight is at least as large as the lower limit of the above-mentioned range, the dry etching resistance and the cross-sectional shape of the resist pattern becomes satisfactory.

Further, the dispersity (Mw/Mn) is not particularly limited, but is preferably 1.0 to 5.0, more preferably 1.0 to 3.0, and most preferably 1.0 to 2.5. Here, Mn is the number average molecular weight.

As the component (A1), one type of resin may be used, or two or more types of resins may be used in combination.

The component (A1) can be obtained, for example, by a conventional radical polymerization or the like of the monomers corresponding to each of the structural units, using a radical polymerization initiator such as azobisisobutyronitrile (AIBN).

Furthermore, in the component (A1), by using a chain transfer agent such as HS—CH₂—CH₂—CH₂—C(CF₃)₂—OH, a —C(CF₃)₂—OH group can be introduced at the terminals of the component (A1). Such a copolymer having introduced a hydroxyalkyl group in which some of the hydrogen atoms of the alkyl group are substituted with fluorine atoms is effective in reducing developing defects and LER (line edge roughness: unevenness of the side walls of a line pattern).

As the monomers for deriving the corresponding structural units, commercially available monomers may be used, or the monomers may be synthesized by a conventional method.

[Component (A2)]

As the component (A2), it is preferable to use a low molecular weight compound that has a molecular weight of at least 500 and less than 4,000, contains a hydrophilic group, and also contains an acid dissociable group described above in connection with the component (A1).

Specific examples include compounds containing a plurality of phenol skeletons in which a part of the hydrogen atoms within hydroxy groups have been substituted with the aforementioned acid dissociable groups.

Examples of the component (A2) include low molecular weight phenolic compounds in which a portion of the hydrogen atoms of the hydroxy group have been substituted with an aforementioned acid dissociable group, and these types of compounds are known, for example, as sensitizers or heat resistance improvers for use in non-chemically amplified g-line or i-line resists.

Examples of these low molecular weight phenol compounds include bis(4-hydroxyphenyl)methane, bis(2,3,4-trihydroxyphenyl)methane, 2-(4-hydroxyphenyl)-2-(4′-hydroxyphenyl)propane, 2-(2,3,4-trihydroxyphenyl)-2-(2′,3′,4′-trihydroxyphenyl)propane, tris(4-hydroxyphenyl)methane, bis(4-hydroxy-3,5-dimethylphenyl)-2-hydroxyphenylmethane, bis(4-hydroxy-2,5-dimethylphenyl)-2-hydroxyphenylmethane, bis(4-hydroxy-3,5-dimethylphenyl)-3,4-dihydroxyphenylmethane, bis(4-hydroxy-2,5-dimethylphenyl)-3,4-dihydroxyphenylmethane, bis(4-hydroxy-3-methylphenyl)-3,4-dihydroxyphenylmethane, bis(3-cyclohexyl-4-hydroxy-6-methylphenyl)-4-hydroxyphenylmethane, bis(3-cyclohexyl-4-hydroxy-6-methylphenyl)-3,4-dihydroxyphenylmethane, 1-[1-(4-hydroxyphenyl)isopropyl]-4-[1,1-bis(4-hydroxyphenyl)ethyl]benzene, and dimers, trimers, tetramers, pentamers and hexamers of formalin condensation products of phenols such as phenol, m-cresol, p-cresol and xylenol. Needless to say, the low molecular weight phenol compound is not limited to these examples.

In particular, as the low molecular weight phenol compound, a phenol compound having 2 to 6 triphenylmethane skeletons is preferable in terms of resolution and LWR.

The acid decomposable group is not particularly limited, and the same acid decomposable groups as those described above in relation to the component (A1) can be mentioned.

As the component (A2), one type of compound may be used, or two or more types of compounds may be used in combination.

In the resist composition of the present invention, as the component (A), one type may be used, or two or more types may be used in combination.

Of these, the component (A) preferably includes the component (A1).

In the component (A), the amount of the component (A1) based on the total weight of the component (A) is preferably 25% by weight or more, more preferably 50% by weight or more, still more preferably 75% by weight or more, and may be even 100% by weight. When the amount of the component (A1) is 25% by weight or more, various lithography properties such as mask error factor (MEF), circularity and reducing roughness are improved.

In the resist composition according to the present invention, the amount of the component (A) can be appropriately adjusted depending on the thickness of the resist film to be formed, and the like.

<Component (C)>

The component (C) is a photoreactive quencher.

The “quencher” is an acid diffusion control agent which traps acid generated from the component (B) or the like upon exposure.

The “photoreactive quencher” acts as an quencher prior to exposure (at exposed portions), and does not act as a quencher after exposure (after irradiation of radiation such as EB and EUV).

[Component (C1)]

The resist composition according to present invention includes at least one compound (C1) represented by general formula (c1) (hereafter, referred to as component (C1)) shown below as a component (C). Therefore, the resist composition containing the component (C1) is superior to the resist composition containing a conventional photoreactive quencher in terms of storage stability and lithography properties.

In the formula, X represents a cyclic group of 3 to 30 carbon atoms which may have a substituent; R¹ represents a divalent linking group; and R² represents an arylene group which may have a substituent, and each of R³ and R⁴ independently represents an aryl group which may have a substituent; R³ and R⁴ may be mutually bonded with the sulfur atom to form a ring; R⁵ represents a hydroxy group, a halogen atom, an alkyl group of 1 to 5 carbon atoms, an alkoxy group or a fluorinated alkyl group; p represents an integer of 0 to 2; and q represents an integer of 0 to 3.

Cation Moiety

In general formula (c1) above, X represents a cyclic group of 3 to 30 carbon atoms which may have a substituent.

A hydrocarbon group for X “may have a substituent” means that part of the carbon atoms constituting the hydrocarbon group may be substituted with a substituent group containing a hetero atom, or part or all of the hydrogen atoms constituting the hydrocarbon group may be substituted with a substituent group.

The cyclic group for X may be either an aromatic cyclic group or an aliphatic cyclic group.

The aromatic ring is not particularly limited as long as it is a cyclic conjugation ring having 4n+2 of x electrons, and may be a monocyclic or a polycyclic. The number of the atom constituting the ring skeleton of the aromatic ring is preferably 5 to 20 carbon atoms, more preferably 5 to 15, still more preferably 6 to 15, and particularly preferably 6 to 12. Examples of the aromatic ring include aromatic hydrocarbon rings such as benzene, naphthalene, anthracene and phenanthrene and aromatic heterocycles in which part of the carbon atoms of the aromatic hydrocarbon ring have been substituted with a hetero atom. Examples of hetero atoms within the aromatic heterocycle include an oxygen atom, a nitrogen atom, and a sulfur atom. Specific examples of aromatic heterocycles include a pyridine ring and a thiophene ring.

Specific examples of the aromatic hydrocarbon group for X include a group in which one hydrogen atoms have been removed from the aromatic hydrocarbon ring or aromatic heterocycle (aryl group or heteroaryl group); a group in which one hydrogen atom of the aromatic hydrocarbon ring or aromatic heterocycle has been substituted with an alkylene group (arylalkyl groups such as a benzyl group, a phenethyl group, a 1-naphthylmethyl group, a 2-naphthylmethyl group, a 1-naphthylethyl group and a 2-naphthylethyl group and heteroarylalkyl groups). The alkylene group with which a hydrogen atom of the aromatic hydrocarbon ring or aromatic heterocycles has been substituted, preferably has 1 to 4 carbon atom, more preferably 1 or 2, and particularly preferably 1.

The aromatic cyclic group for X has 5 to 30 carbon atoms, preferably 5 to 20 carbon atoms, more preferably 5 to 15, still more preferably 6 to 15, and particularly preferably 6 to 12. Herein, when the aromatic cyclic group has part or all of hydrogen atoms have been substituted with a substituent, the number of carbon atoms refers to the number of carbon atoms constituting the ring skeleton, excluding the number of carbon atoms within a substituent.

The aromatic cyclic group may have part or all of the hydrogen atoms constituting the aromatic cyclic group substituted with a substituent. For example, the hydrogen atom bonded to the ring in the aromatic cyclic group may be substituted with a substituent.

Specific examples thereof include an alkyl group, an alkoxy group, a halogen atom, a halogenated alkyl group, a hydroxy group, an oxo group (═O), a cyano group, an aryl group, an alkoxyalkyloxy group, an alkoxycarbonylalkyloxy group, a carboxy group, —C(═O)—O—R⁶′, —O—C(═O)—R⁷′ and —O—R⁸′. Each of R⁶′, R⁷′ and R⁸′ independently represents a linear or branched saturated hydrocarbon group of 1 to 25 atoms, a cyclic saturated hydrocarbon group of 3 to 20 carbon atoms or a linear or branched, aliphatic unsaturated hydrocarbon group of 2 to 5 carbon atoms.

The alkyl group as a substituent for the aromatic hydrocarbon group is preferably an alkyl group of 1 to 5 carbon atoms, and a methyl group, an ethyl group, a propyl group, an n-butyl group or a tert-butyl group is most desirable.

The alkoxy group as a substituent for the aromatic hydrocarbon group is preferably an alkoxy group having 1 to 5 carbon atoms, more preferably a methoxy group, an ethoxy group, an n-propoxy group, an iso-propoxy group, an n-butoxy group or a tert-butoxy group, and most preferably a methoxy group or an ethoxy group.

Examples of the halogen atom as a substituent for the aromatic hydrocarbon group include a fluorine atom, a chlorine atom, a bromine atom and an iodine atom, and a fluorine atom is preferable.

Example of the halogenated alkyl group as a substituent for the aromatic hydrocarbon group includes a group in which part or all of the hydrogen atoms within the aforementioned alkyl group have been substituted with the aforementioned halogen atoms.

As the aryl group as a substituent for the aromatic hydrocarbon group, a group in which one hydrogen atom has been removed from the aromatic hydrocarbon ring can be mentioned. Among these, an aryl group of 6 to 12 carbon atoms is preferable, and a phenyl group or a naphthyl group is more desirable.

Examples of the alkoxyalkyloxy group as a substituent for the aromatic hydrocarbon group includes:

—O—C(R⁴⁷)(R⁴⁸)—O—R⁴⁹  general formula

[In the formula, R⁴⁷ and R⁴⁸ each independently represents a hydrogen atom, or a linear or branched alkyl group; and R⁴⁹ represents an alkyl group].

The alkyl group for R⁴⁷ and R⁴⁸ preferably has 1 to 5 carbon atoms, and may be either linear or branched, and is preferably an ethyl group or a methyl group, and most preferably a methyl group.

It is preferable that at least one of R⁴⁷ and R⁴⁸ be a hydrogen atom. It is particularly desirable that at least one of R⁴⁷ and R⁴⁸ be a hydrogen atom, and the other be a hydrogen atom or a methyl group.

The alkyl group for R⁴⁹ preferably has 1 to 15 carbon atoms, and may be linear, branched or cyclic.

The linear or branched alkyl group for R⁴⁹ preferably has 1 to 5 carbon atoms. Examples thereof include a methyl group, an ethyl group, a propyl group, an n-butyl group and a tert-butyl group.

The cyclic alkyl group for R⁴⁹ preferably has 4 to 15 carbon atoms, more preferably 4 to 12, and most preferably 5 to 10. Specific examples thereof include groups in which one or more hydrogen atoms have been removed from a monocycloalkane or a polycycloalkane such as a bicycloalkane, tricycloalkane or tetracycloalkane, and which may or may not be substituted with an alkyl group of 1 to 5 carbon atoms, a fluorine atom or a fluorinated alkyl group. Examples of the monocycloalkane include cyclopentane and cyclohexane. Examples of polycycloalkanes include adamantane, norbornane, isobornane, tricyclodecane and tetracyclododecane. Among these, a group in which one or more hydrogen atoms have been removed from adamantane is preferable.

Examples of the alkoxycarbonylalkyloxy group as a substituent for the aromatic hydrocarbon group includes:

—O—R⁵⁰—C(═O)—O—R⁵⁶  general formula

[In the formula, R⁰⁰ represents a linear or branched alkylene group, and R¹⁶ represents a tertiary alkyl group.]

The linear or branched alkylene group for R⁵⁰ preferably has 1 to 5 carbon atoms, and examples thereof include a methylene group, an ethylene group, a trimethylene group, a tetramethylene group and a 1,1-dimethylethylene group.

The alkyl group for R⁵⁶ is a tertiary alkyl group, and examples thereof include a 2-methyl-2-adamantyl group, a 2-ethyl-2-adamantyl group, a 1-methyl-1-cyclopentyl group, a 1-ethyl-1-cyclopentyl group, a 1-methyl-1-cyclohexyl group, a 1-ethyl-1-cyclohexyl group, a 1-(1-adamantyl)-1-methylethyl group, a 1-(1-adamantyl)-1-methylpropyl group, a 1-(1-adamantyl)-1-methylbutyl group, a 1-(1-adamantyl)-1-methylpentyl group, a 1-(1-cyclopentyl)-1-methylethyl group, a 1-(1-cyclopentyl)-1-methylpropyl group, a 1-(1-cyclopentyl)-1-methylbutyl group, a 1-(1-cyclopentyl)-1-methylpentyl group, a 1-(1-cyclohexyl)-1-methylethyl group, a 1-(1-cyclohexyl)-1-methylpropyl group, a 1-(1-cyclohexyl)-1-methylbutyl group, a 1-(1-cyclohexyl)-1-methylpentyl group, a tert-butyl group, a tert-pentyl group and a tert-hexyl group.

Further, a group in which R⁵⁶ in the group represented by the aforementioned general formula: —O—R⁵⁰—C(═O)—O—R⁵⁶ has been substituted with R⁵⁶′ can also be mentioned. R⁵⁶′ represents a hydrogen atom, an alkyl group, a fluorinated alkyl group or an aliphatic cyclic group which may contain a hetero atom.

The alkyl group for R⁵⁶′ is the same as defined for the alkyl group for the aforementioned R⁴⁹.

Examples of the fluorinated alkyl group for R⁵⁶′ include groups in which part or all of the hydrogen atoms within the alkyl group for R⁴⁹ has been substituted with a fluorine atom.

Examples of the aliphatic cyclic group for R⁵⁶′ which may contain a hetero atom include an aliphatic cyclic group which does not contain a hetero atom, an aliphatic cyclic group containing a hetero atom in the ring structure, and an aliphatic cyclic group in which a hydrogen atom has been substituted with a hetero atom.

As an aliphatic cyclic group for R⁵⁶′ which does not contain a hetero atom, a group in which one or more hydrogen atoms have been removed from a monocycloalkane or a polycycloalkane such as a bicycloalkane, a tricycloalkane or a tetracycloalkane can be mentioned. Examples of the monocycloalkane include cyclopentane and cyclohexane. Examples of polycycloalkanes include adamantane, norbornane, isobornane, tricyclodecane and tetracyclododecane. Among these, a group in which one or more hydrogen atoms have been removed from adamantane is preferable.

Specific examples of the aliphatic cyclic group for R⁵⁶′ containing a hetero atom in the ring structure include groups represented by formulas (L1) to (L7) and (S1) to (S4) described later in the explanation of the aliphatic hydrocarbon group for R¹.

As the aliphatic cyclic group for R⁵⁶′ in which a hydrogen atom has been substituted with a hetero atom, an aliphatic cyclic group in which a hydrogen atom has been substituted with an oxygen atom (═O) can be mentioned.

In the groups —C(═O)—O—R⁶′, —O—C(═O)—R⁷′ and —O—R⁸′, each of R⁶′, R⁷′ and R⁸′ independently represents a linear or branched saturated hydrocarbon group of 1 to 25 atoms, a cyclic saturated hydrocarbon group of 3 to 20 carbon atoms or a linear or branched, aliphatic unsaturated hydrocarbon group of 2 to 5 carbon atoms.

The linear or branched, saturated hydrocarbon group preferably has 1 to 25 carbon atoms, more preferably 1 to 15, and still more preferably 4 to 10.

Examples of the linear, saturated hydrocarbon group include a methyl group, an ethyl group, a propyl group, a butyl group, a pentyl group, a hexyl group, a heptyl group, an octyl group, a nonyl group and a decyl group.

Examples of the branched, saturated hydrocarbon group include a 1-methylethyl group, a 1-methylpropyl group, a 2-methylpropyl group, a 1-methylbutyl group, a 2-methylbutyl group, a 3-methylbutyl group, a 1-ethylbutyl group, a 2-ethylbutyl group, a 1-methylpentyl group, a 2-methylpentyl group, a 3-methylpentyl group and a 4-methylpentyl group, but excluding tertiary alkyl groups.

The linear or branched, saturated hydrocarbon group may have a substituent. Examples of the substituent include an alkoxy group, a halogen atom, a halogenated alkyl group, a hydroxyl group, an oxygen atom (═O), a cyano group and a carboxy group.

The alkoxy group as a substituent for the linear or branched, saturated hydrocarbon group is preferably an alkoxy group having 1 to 5 carbon atoms, more preferably a methoxy group, an ethoxy group, an n-propoxy group, an iso-propoxy group, an n-butoxy group or a tert-butoxy group, and most preferably a methoxy group or an ethoxy group.

Examples of the halogen atom as a substituent for the linear or branched, saturated alkyl group include a fluorine atom, a chlorine atom, a bromine atom and an iodine atom, and a fluorine atom is preferable.

Example of the halogenated alkyl group as a substituent for the linear or branched, saturated hydrocarbon group includes a group in which part or all of the hydrogen atoms within the aforementioned linear or branched, saturated hydrocarbon group have been substituted with the aforementioned halogen atoms.

The cyclic saturated hydrocarbon group of 3 to 20 carbon atoms for R⁶′, R⁷′ and R⁸′ may be either a polycyclic group or a monocyclic group, and examples thereof include groups in which one hydrogen atom has been removed from a monocycloalkane, and groups in which one hydrogen atom has been removed from a polycycloalkane (e.g., a bicycloalkane, a tricycloalkane or a tetracycloalkane). More specific examples include groups in which one hydrogen atom has been removed from a monocycloalkane such as cyclopentane, cyclohexane, cycloheptane or cyclooctane; and groups in which one hydrogen atoms have been removed from a polycycloalkane such as adamantane, norbornane, isobornane, tricyclodecane or tetracyclododecane.

The cyclic, saturated hydrocarbon group may have a substituent. For example, part of the carbon atoms constituting the ring within the cyclic alkyl group may be substituted with a hetero atom, or a hydrogen atom bonded to the ring within the cyclic alkyl group may be substituted with a substituent.

In the former example, a heterocycloalkane in which part of the carbon atoms constituting the ring within the aforementioned monocycloalkane or polycycloalkane has been substituted with a hetero atom such as an oxygen atom, a sulfur atom or a nitrogen atom, and one or more hydrogen atoms have been removed therefrom, can be used. Further, the ring may contain an ester bond (—C(═O)—O—) in the ring structure thereof. More specific examples include a lactone-containing monocyclic group, such as a group in which one hydrogen atom has been removed from γ-butyrolactone; and a lactone-containing polycyclic group, such as a group in which one hydrogen atom has been removed from a bicycloalkane, tricycloalkane or tetracycloalkane containing a lactone ring.

In the latter example, as the substituent, the same substituent groups as those for the aforementioned linear or branched alkyl group, or an alkyl group of 1 to 5 carbon atoms can be used.

Alternatively, R⁶′, R⁷′ and R⁸′ may be a combination of a linear or branched alkyl group and a cyclic alkyl group.

Examples of the combination of a linear or branched alkyl group with a cyclic alkyl group include groups in which a cyclic alkyl group as a substituent is bonded to a linear or branched alkyl group, and groups in which a linear or branched alkyl group as a substituent is bonded to a cyclic alkyl group.

Examples of the linear aliphatic unsaturated hydrocarbon group for R⁶′, R⁷′ and R⁸′ include a vinyl group, a propenyl group (an allyl group) and a butynyl group.

Examples of the branched aliphatic unsaturated hydrocarbon group for R⁶′, R⁷′ and R⁸′ include a 1-methylpropenyl group and a 2-methylpropenyl group.

The aforementioned linear or branched, aliphatic unsaturated hydrocarbon group may have a substituent. Examples of substituents include the same substituents as those which the aforementioned linear or branched alkyl group may have.

Among the aforementioned examples, as R⁷′ and R⁸′, in terms of improvement in lithography properties and shape of the resist pattern, a linear or branched, saturated hydrocarbon group of 1 to 15 carbon atoms or a cyclic saturated hydrocarbon group of 3 to 20 carbon atoms is preferable.

The aliphatic cyclic group for X may be either a polycyclic group or a monocyclic group. The ring may be saturated or unsaturated.

In the aliphatic cyclic group, part of the carbon atoms constituting the aliphatic cyclic group may be substituted with a substituent group containing a hetero atom, or part or all of the hydrogen atoms constituting the aliphatic cyclic group may be substituted with a substituent.

With respect to the substituent containing a hetero atom for substituting part of the carbon atom constituting the aliphatic cyclic group, a hetero atom is an atom other than carbon and hydrogen, and examples thereof include an oxygen atom, a nitrogen atom, a sulfur atom and a halogen atom. Examples of the halogen atom include a fluorine atom, a chlorine atom, an iodine atom and a bromine atom.

The substituent group containing a hetero atom may be a group consisting of a hetero atom, or may be a group containing a group or atom other than a hetero atom.

Specific examples of the substituent group for substituting part of the carbon atoms constituting the aliphatic cyclic group, include —O—, —C(═O)—O—, —C(═O)—, —O—C(═O)—O—, —C(═O)—NH—, —NH— (wherein the H may be substituted with a substituent such as an alkyl group or an acyl group), —S—, —S(═O)₂— and —S(═O)₂—O—.

Specific examples of the substituent for substituting part of the hydrogen atom constituting the aliphatic cyclic group, include an alkoxy group, a halogen atom, a halogenated alkyl group, a hydroxy group, an oxo group (═O), a cyano group, an aryl group, an alkoxyalkyloxy group, an alkoxycarbonylalkyloxy group, a carboxy group, —C(═O)—O—R⁶′, —O—C(═O)—R⁷′ and —O—R⁸′. Each of R⁶′, R⁷′ and R⁸′ independently represents a linear or branched saturated hydrocarbon group of 1 to 25 atoms, a cyclic saturated hydrocarbon group of 3 to 20 carbon atoms or a linear or branched, aliphatic unsaturated hydrocarbon group of 2 to 5 carbon atoms. When the aliphatic hydrocarbon group is cyclic, the aliphatic hydrocarbon group may have an alkyl group as a substituent. As these substituents, the same groups as those described above for the substituent of the aforementioned aromatic hydrocarbon groups can be mentioned.

The aliphatic cyclic group for X is preferably a cyclic alkyl group.

The number of carbon atoms within the cyclic alkyl group is 3 to 30, preferably 5 to 20, and more preferably 5 to 10. The cyclic alkyl group may be either a polycyclic group or a monocyclic group.

Examples of the aliphatic monocyclic groups include groups in which one or more hydrogen atoms have been removed from a monocycloalkane. The monocycloalkane preferably has 5 to 6 carbon atoms, and specific examples thereof include cyclopentane and cyclohexane.

As an example of an polycyclic alkyl group, a group in which one or more hydrogen atoms have been removed from a polycycloalkane such as a bicycloalkane, tricycloalkane or tetracycloalkane can be given. The polycycloalkane preferably has 7 to 12 carbon atoms, and examples thereof include adamantane, norbornane, isobornane, tricyclodecane and tetracyclododecane.

In the cyclic alkyl group, part or all of the hydrogen atoms bonded to the carbon atoms constituting the ring structure may be substituted with a substituent. Examples of the substituent include the same substituents as those described above for substituting part or all of the hydrogen atoms constituting the aliphatic cyclic group.

Further, part of the carbon atoms constituting the cyclic alkyl group may be substituted with a substituent containing a hetero atom. Examples of the substituent include the same substituents containing a hetero atom as those described above for substituting part of the carbon atoms constituting the aliphatic cyclic group. Among these, —O—, —C(═O)—O—, —S—, —S(═O)₂— and —S(═O)₂—O— are preferable.

Preferable examples of cyclic alkyl groups in which part of the carbon atoms has been substituted with a substituent containing a hetero atom include cyclic groups represented by formulas (L1) to (L7) and (S1) to (S4) shown below.

In the formulas, Q″ represents an alkylene group of 1 to 5 carbon atoms, —O—, —S—, —O—R^(94′)— or —S—R^(95′)—, and R^(94′) and R^(95′) each independently represent an alkylene group of 1 to 5 carbon atoms; and m represents an integer of 0 or 1.

In the formulas, the alkylene group for Q″, R^(94′) or R^(95′) is preferably a linear or branched alkylene group, and preferably has 1 to 12 carbon atoms, more preferably 1 to 5, and still more preferably 1 to 3.

Specific examples of the alkylene group include a methylene group [—CH₂—]; alkylmethylene groups such as —CH(CH₃)—, —CH(CH₂CH₃)—, —C(CH₃)₂—, —C(CH₃)(CH₂CH₃)—, —C(CH₃)(CH₂CH₂CH₃)— and —C(CH₂CH₃)₂—; an ethylene group [—CH₂CH₂—]; alkylethylene groups such as —CH(CH₃)CH₂—, —CH(CH₃)CH(CH₃)—, —C(CH₃)₂CH₂— and —CH(CH₂CH₃)CH₂—; a trimethylene group (n-propylene group) [—CH₂CH₂CH₂—]; alkyltrimethylene groups such as —CH(CH₃)CH₂CH₂— and —CH₂CH(CH₃)CH₂—; a tetramethylene group [—CH₂CH₂CH₂CH₂—]; alkyltetramethylene groups such as —CH(CH₃)CH₂CH₂CH₂— and —CH₂CH(CH₃)CH₂CH₂—; and a pentamethylene group [—CH₂CH₂CH₂CH₂CH₂—]. Among these examples, a methylene group or an alkylmethylene group is preferable, and a methylene group is particularly desirable.

In these cyclic groups, part of the hydrogen atoms bonded to the carbon atoms constituting the ring structure may be substituted with a substituent. Examples of the substituent include the same substituents as those described above for substituting part or all of the hydrogen atoms bonded to the carbon atom constituting the ring structure within the cyclic alkyl group.

Among these, as X, a cyclic alkyl group of 3 to 20 carbon atoms which may have a substituent or an aromatic hydrocarbon group of 5 to 20 carbon atoms which may have a substituent is preferable; a cyclic alkyl group or 3 to 20 carbon atoms which may have a substituent is more preferable; groups in which one or more hydrogen atoms have been removed from monocycloalkane or polycycloalkane in which part of the hydrogen atoms bonded to the carbon atoms constituting the ring structure may be substituted with a substituent or cyclic groups represented by formulas (L1) to (L7) and (S1) to (S4) shown below is particularly preferable.

In formula (c1), R¹ represents a divalent linking group. The divalent linking group for R¹ is not particularly limited, and preferable examples thereof include a divalent hydrocarbon group which may have a substituent and a divalent linking group containing a hetero atom. As examples of the divalent hydrocarbon group which may have a substituent and the divalent linking group containing a hetero atom, the same groups as those described above for the divalent hydrocarbon group which may have a substituent and the divalent linking group containing a hetero atom in relation to Y² in formula (a1-0-2) can be given.

Among these, as for R¹, a divalent linking group containing a hetero atom is preferable, and a linear group containing an oxygen atom as a heteroatom is more preferable, and —C(═O)—, —Y²¹—O— and —Y²¹—C(═O)—O— are particularly desirable.

In the groups —Y²¹—O— and —Y²¹—O—Y²²—, when Y²¹ represents —CH₂— or —C(R^(1′))(R^(2′))—O— [wherein R^(1′) and R^(2′) are the same as those defined above in the formula (p1)] and Y²² represents a linear alkylene group of 0 to 3, —Y²¹—O— and X forms an acetal-type acid dissociable group capable of exhibiting changed polarity by the action of acid, which is preferable.

Furthermore, in the present invention, it is preferable that a cyclic group for X bonds to a specific R¹ to form an acid dissociable group. As described above, an “acid dissociable group” is a group in which at least the bond between the acid dissociable group and the terminal atom of the adjacent R¹ bonded to X is cleaved by the action of acid generated upon exposure. Since the acid dissociable group is a group which exhibits a lower polarity than the polar group generated by the dissociation of the acid dissociable group, the acid dissociable group is dissociated by the action of acid, thereby increasing the polarity. When the polarity of at least the cation moiety of the component (C1) is increased, the solubility in a developing solution is relatively changed. When the developing solution is an alkali developing solution, the solubility is increased. On the other hand, when the developing solution is a developing solution containing an organic solvent (that is, organic developing solution), the solubility is decreased.

The acid dissociable group is not particularly limited, and any of the groups that have been conventionally proposed as acid dissociable groups for the base resins of chemically amplified resists can be used. Specific examples includes groups which forms a cyclic tertiary alkyl ester with a carbonyloxy group (—C(═O)—O—) at the terminal of R¹ bonded to X (i.e., tertiary alkyl ester-type acid dissociable groups). Examples of tertiary alkyl esters and tertiary alkyl ester-type acid dissociable groups include the same groups as those exemplified above in relation to a structural unit (a1). Among these, groups represented by the general formulas (1-1) to (1-9) in which R¹ contains —Y²¹—C(═O)—O— at the terminal thereof bonded to X (the oxygen atom bonded to the carbon atom is bonded to X) are preferable.

In formula (c1), R² represents an arylene group which may have a substituent.

Examples of the arylene group for R² which may have a substituent include an unsubstituted arylene group of 6 to 20 carbon atoms, a substituted arylene group in which part or all of hydrogen atoms of the unsubstituted arylene group have been substituted with a substituent.

The unsubstituted arylene group is preferably an arylene group of 6 to 10 carbon atoms because it can be synthesized at a low cost. Specific examples thereof include a phenylene group and a naphthylene group.

Specific examples of the substituent for substituting arylene group include an alkyl group, an alkoxy group, a halogen atom, a halogenated alkyl group, a hydroxy group, an oxo group (═O), a cyano group, an aryl group, an alkoxyalkyloxy group, an alkoxycarbonylalkyloxy group, a carboxy group, —C(═O)—O—R⁶′, —O—C(═O)—R⁷′ and —O—R⁸′ (wherein R⁶′, R⁷′ and R⁸′ are the same as those defined above) which are explained as substituents for substituting the hydrogen atom in the aromatic cyclic group for X.

In the formula (c1), each of R³ and R⁴ independently represents an aryl group which may have a substituent, and for example, an unsubstituted aryl group of 6 to 20 carbon atoms which may have a substituent; and a substituted aryl group in which part or all of hydrogen atoms of the unsubstituted alkyl group have been substituted with a substituent can be mentioned.

The unsubstituted aryl group is preferably an aryl group having 6 to 10 carbon atoms because it can be synthesized at a low cost. Specific examples thereof include a phenyl group and a naphthyl group.

Examples of the substituents of substituted aryl groups include the same groups as those described above for substituents which the substituted arylene group may have.

In formula (c1), R³ and R⁴ may be mutually bonded to form a ring with the sulfur atom.

As the ring to be formed, the ring containing the sulfur atom in the skeleton thereof is preferably a 3 to 10-membered ring, and particularly preferably a 5 to 7-membered ring.

The ring may have a hetero atom as an atom constituting the ring skeleton other than the sulfur atom having R³ and R⁴ bonded thereto. Examples of hetero atoms include an oxygen atom, a nitrogen atom, and a sulfur atom.

Specific examples of the rings to be formed include a a thianthrene ring, a dibenzothiophene ring, a 9H-thioxanthene ring, a thioxanthone ring and a phenoxathiin ring.

Specific examples of the cation moiety of the component (C1) are shown below.

Anion Moiety

In the formula (c1), R⁵ represents a hydroxy group, a halogen atom, an alkyl group of 1 to 5 carbon atoms, an alkoxy group or a fluorinated alkyl group.

Examples of the halogen atom include a fluorine atom, a chlorine atom, a bromine atom and an iodine atom.

Specific examples of the alkyl group of 1 to 5 carbon atoms include a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group, an n-pentyl group, a cyclopentyl group, a hexyl group, a cyclohexyl group, a nonyl group and a decyl group.

The alkoxy group of 1 to 5 carbon atoms is more preferably a linear or branched alkoxy group, and particularly preferably a methoxy group or an ethoxy group.

Further, the fluorination ratio of the fluorinated alkyl group of 1 to 5 carbon atoms is preferably from 10 to 100%, more preferably from 50 to 100%, and it is particularly preferable that all hydrogen atoms are substituted with fluorine atoms because the acid strength increases.

Specific examples of the fluorinated alkyl group include a trifluoromethyl group, a heptafluoro-n-propyl group and a nonafluoro-n-butyl group.

In the formula (c1), p represents an integer of 0 to 2; and q represents an integer of 0 to 3. When p is 2, the plurality of R⁵ may be the same or different from each other. In the present specification, p is preferably 0 or 1. Further, q is preferably 0 or 1.

As the anion moiety of the component (C1), an anion moiety represented by any one of general formulas (an-1) to (an-3) shown below is preferable.

In the formulas, R⁵ represents a hydroxy group, a halogen atom, an alkyl group of 1 to 5 carbon atoms, an alkoxy group or a fluorinated alkyl group; and p represents an integer of 0 to 2; q represents an integer of 0 to 3; and q′ represents an integer of 1 to 3.

In the formulas (an-1) to (an-3), the explanations relation to R⁵, p and q are respectively the same those as describe above for R⁵, p and q in the formula (c1). q′ is preferably 1.

Specific examples of the anion moiety of the component (C1) are shown below.

As the component (C1), one type of compound may be used, or two or more types of compounds may be used in combination.

The amount of the component (C1) within the component (C) is preferably 80% by weight or more, and may be even 100% by weight.

The component (C1) can be produced by a conventional method.

For example, the component (C1) can be obtained by a salt-exchange reaction of the acid corresponding to the anion moiety of the component (C1) (a compound in which —COO⁻ at the terminal thereof has been converted into —COOH) with a salt having a predetermined cation moiety.

In the resist composition of the present invention, a photoreactive quencher other than the component (C1) (hereafter, referred to as “component (C2)”) may further be added.

The component (C2) is not particularly limited as long as it acts as a photoreactive quencher, and for example, any of the known photoreactive quencher used in conventional resist compositions can be used.

In the resist composition, the amount of the component (C) relative to 100 parts by weight of the component (A) is preferably within a range from 0.5 to 10.0 parts by weight, more preferably from 0.5 to 8.0 parts by weight, still more preferably from 1.0 to 8.0 parts by weight, and particularly preferably from 1.5 to 5.5 parts by weight. When the amount of the component (C) is at least as large as the lower limit of the above-mentioned range, various lithography properties such as resolution, roughness and exposure latitude are improved. Further, a resist pattern having an excellent shape can be obtained. On the other hand, when the amount of the component (C) is no more than the upper limit of the above-mentioned range, sensitivity can be maintained at a satisfactory level, and throughput becomes excellent.

<Component (B)>

The component (B) is an acid generator component which generates acid upon exposure.

As the component (B), there is no particular limitation, and any of the known acid generators used in conventional chemically amplified resist compositions can be used. Examples of these acid generators are numerous, and include onium salt acid generators such as iodonium salts and sulfonium salts; oxime sulfonate acid generators; diazomethane acid generators such as bisalkyl or bisaryl sulfonyl diazomethanes and poly(bis-sulfonyl)diazomethanes; nitrobenzylsulfonate acid generators; iminosulfonate acid generators; and disulfone acid generators.

As an onium salt acid generator, a compound represented by general formula (b-1) or (b-2) shown below can be used.

In the formulas, each of R¹″ to R³″, and R⁵″ to R⁶″ independently represents an aryl group, alkyl group or alkenyl group which may have a substituent; In formula (b-1), two of R¹″ to R³″ may be bonded to each other to form a ring with the sulfur atom; and R⁴″ represents an alkyl group, a halogenated alkyl group, an aryl group or an alkenyl group which may have a substituent.

In the formula (b-1), examples of the aryl group which may have a substituent for R¹″ to R³″ include an unsubstituted aryl group of 6 to 20 carbon atoms, a substituted aryl group in which part or all of hydrogen atoms of the unsubstituted aryl group have been substituted with a substituent.

As the unsubstituted aryl group, an aryl groups of 6 to 10 carbon atoms is preferable. Specific examples thereof include a phenyl group and a naphthyl group.

Examples of the substituent of the substituted alkyl group include an alkyl group, an alkoxy group, a halogen atom, a halogenated alkyl group, a hydroxy group an oxo group (═O), a cyano group, an aryl group, an alkoxyalkyloxy group, an alkoxycarbonylalkyloxy group, —C(═O)—O—R⁶′, —O—C(═O)—R⁷′, —O—R⁸′, —O—R⁹′, halogenated alkylsulfonyloxy group and —O-Q¹-[O—R¹¹″—S⁺(R²¹″)(R³¹″)]_(x). Each of R⁶′, R⁷′ and R⁸′ independently represents a linear or branched saturated hydrocarbon group of 1 to 25 atoms, a cyclic saturated hydrocarbon group of 3 to 20 carbon atoms or a linear or branched, aliphatic unsaturated hydrocarbon group of 2 to 5 carbon atoms. R¹¹″ represents an arylene group, an alkylene group or an alkenylene which may have a substituent. Each of R²¹″ and R³¹″ independently represents an aryl group, an alkyl group or an alkenylene group which may have a substituent, and R²¹″ and R³¹″ may be mutually bonded with the sulfur atom to form a ring. x represents 1 or 2, and Q¹ represents a (x+1)-valent linking group.

Among these, as the alkyl group, alkoxy group, halogen atom, halogenated alkyl group, aryl group, alkoxyalkyloxy group, alkoxycarbonylalkyloxy group, —C(═O)—O—R⁶′, —O—C(═O)—R⁷′ and —O—R⁸′, the same groups as those described above as a substituent for substituting the hydrogen atom bonded to the ring in the aromatic cyclic group for X in the general formula (c1) may be substituted, can be mentioned.

As the nitrogen-containing hydrocarbon group for R⁹′, a group in which part of the carbon atom in the aromatic hydrocarbon group or aliphatic hydrocarbon group has been substituted with a nitrogen atom. Preferable examples thereof include a mono- or di-alkylaminoalkyl group in which one or two hydrogen atoms bonded to the nitrogen atom in the linear or branched aminoalkyl group of 1 to 10 carbon atoms have been substituted with alkyl groups of 1 to 10 carbon atoms.

Examples of the halogenated alkyl group in the halogenated alkylsulfonyloxy group include the same halogenated alkyl group as those described above as a substituent, and a trifluoromethyl group is particularly preferable.

With respect to —O-Q¹-(O—R¹¹″—S⁺(R²¹″)(R³¹″))_(x), as the arylene group, alkylene group or alkenylene group which may have a substituent for R¹¹″, a group in which one hydrogen atom has been removed from the aryl group, alkyl group or alkenyl group which may have a substituent for R¹″ can be mentioned.

As examples of R²¹″ and R³¹″, the same groups as those described above for R²″ and R³″ in the formula (b-1) can be given, respectively.

x represents 1 or 2.

Q¹ represents a (x+1)-valent linking group, that is, divalent or trivalent linking group.

Examples of the divalent linking group for Q¹ include the same divalent linking groups as those described above for Y². The divalent linking group may be linear, branched or cyclic, but is preferably cyclic. Among these, an arylene group having two carbonyl groups, each bonded to the terminal thereof is preferable. Specific examples of the arylene groups include a phenylene group and a naphthylene group. Of these, a phenylene group is particularly desirable.

Examples of the trivalent linking group for Q¹ include a group in which one hydrogen atom has been removed from the divalent linking group, or a group in which one divalent linking group has been bonded to another divalent linking group. Examples of the divalent linking group include the same divalent linking groups as those described above for Y². The trivalent linking group for Q¹ is preferably an arylene group combined with three carbonyl groups.

When the aryl group has a group represented by the formula —O-Q¹-[O—R″—S⁺(R²¹″)(R³¹″)]_(x) as a substituent, it is preferable that one of R¹″ to R³″ has one group represented by formula —O-Q¹-[O—R¹¹″—S⁺(R²¹″)(R³¹″)]_(x) in total.

Specific examples of the cation moiety having a group represented by formula —O-Q¹-[O—R¹¹″—S⁺(R²¹″)(R³¹″)]_(x) as a substituent include the cation moiety represented by general formula (ca-0) shown below.

In the formula, R¹¹″ represents an arylene group, an alkylene group or an alkenylene group which may have a substituent; each of R²¹″ and R³¹″ independently represents an aryl group, an alkyl group or an alkenyl group which may have a substituent, and R²¹″ and R³¹″ may be mutually bonded with the sulfur atom to form a ring; x represents 1 or 2; and Q¹ represents a (x+1)-valent linking group.

Examples of the alkyl group which may have a substituent for R¹″ to R³″ include an unsubstituted alkyl group, and a substituted alkyl group in which part or all of hydrogen atoms of the unsubstituted alkyl group have been substituted with a substituent.

The unsubstituted alkyl group may be any of linear, branched or cyclic. In terms of achieving excellent resolution, an alkyl group of 1 to 10 carbon atoms is preferable, and an alkyl group of 1 to 5 carbon atoms is more preferable. Specific examples include a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group, an n-pentyl group, a cyclopentyl group, a hexyl group, a cyclohexyl group, a nonyl group and a decyl group.

Examples of the substituent of the substituted alkyl group include an alkoxy group, a halogen atom, a halogenated alkyl group, a hydroxy group, an oxo group (═O), a cyano group, an aryl group, an alkoxyalkyloxy group, an alkoxycarbonylalkyloxy group, —C(═O)—O—R⁶′, —O—C(═O)—R⁷′, —O—R⁸′, —O—R⁹′, a halogenated alkylsulfonyloxy group and —O-Q′-[O—R¹¹″—S⁺(R²¹″)(R³¹″)]_(x).

Examples of these substituents include an alkoxy group, a halogen atom, a halogenated alkyl group, a hydroxy group, an oxo group (═O), a cyano group, an aryl group, an alkoxyalkyloxy group, an alkoxycarbonylalkyloxy group, —C(═O)—O—R⁶′, —O—C(═O)—R⁷′, —O—R⁸′, —O—R⁹′, a halogenated alkylsulfonyloxy group and —O-Q¹-[O—R¹¹″—S⁺(R²¹″)(R³¹″)]_(x) which are the same substituents as those described above in relation to the substituted aryl group for R¹″ to R³″.

Examples of the alkenyl group which may have a substituent for substituting R¹″ to R³″ include an unsubstituted alkenyl group and a substituted alkenyl group in which part or all of hydrogen atoms of the unsubstituted alkenyl group have been substituted with a substituent.

The unsubstituted alkylene group is preferably linear or branched. Further, the unsubstituted alkylene group preferably has 2 to 10 carbon atoms, more preferably 2 to 5, and still more preferably 2 to 4. Specific examples thereof include a vinyl group, a propenyl group (an allyl group), a butynyl group, a 1-methylpropenyl group and a 2-methylpropenyl group.

Examples of the substituent for the substituted alkenyl group include the same groups as those described above for substituent which the substituted alkyl group represented by R¹″ to R³″ may have.

In the formula (b-1), preferable examples of the cation moiety represented by formula (S⁺(R¹″)(R²″)(R³″)) in which each of R¹″ to R³″ independently represents an aryl group, an alkyl group or an alkenyl group which may have a substituent include cation moieties described above in relation to the component (C1) and cation moieties represented by formulas (ca1-1) to (ca-1-26) shown below.

In the formulas, g1, g2 and g3 represent recurring numbers, wherein g1 is an integer of 1 to 5, g2 is an integer of 0 to 20, and g3 is an integer of 0 to 20.

In formula (b-1), two of R¹″ to R³″ may be bonded to each other to form a ring with the sulfur atom. The ring may be saturated or unsaturated. Further, the ring may be monocyclic or polycyclic. For example, in the case where either one or both of the two of R¹″ to R³ represent a cyclic group (i.e., a cyclic alkyl group or an aryl group), when the two groups are bonded a polycyclic ring (fused ring) is formed.

As the ring to be formed, the ring containing the sulfur atom in the skeleton thereof is preferably a 3 to 10-membered ring, and particularly preferably a 5 to 7-membered ring.

The ring may have a hetero atom as an atom constituting the ring skeleton other than the sulfur atom having R¹″ to R³″ bonded thereto. Examples of hetero atoms include an oxygen atom, a nitrogen atom, and a sulfur atom.

Specific examples of the rings to be formed include a thiophene ring, a thiazole ring, a benzothiophene ring, a thianthrene ring, a benzothiophene ring, a dibenzothiophene ring, a 9H-thioxanthene ring, a thioxanthone ring, a thianthrene ring, a phenoxathiin ring, a tetrahydrothiophenium ring and a tetrahydrothiopyranium ring.

In the formula (b-1), preferable examples of the cation moiety represented by formula (S⁺(R¹″)(R²″)(R³″)) in which two of R¹″ to R³″ are mutually bonded with the sulfur atom to form a ring include cation moieties represented by formula (ca-12) to (ca-15) shown below.

In the formulas, Q² represents a single bond, a methylene group, a sulfur atom, an oxygen atom, a nitrogen atom, a carbonyl group, —SO—, —SO₂—, —SO₃—, —COO—, —CONH— or —N(R_(N))— (wherein R_(N) represents an alkyl group of 1 to 5 carbon atoms); each of R⁸¹ to R⁸⁶ independently represents an alkyl group, an acetyl group, an alkoxy group, a carboxy group, a hydroxy group or a hydroxyalkyl group; each of n₁ to n₅ independently represents an integer of 0 to 3; and n₆ represents an integer of 0 to 2.

In the formulas, u represents an integer of 1 to 3; R⁹ represents a phenyl group, a naphthyl group or an alkyl group which may have a substituent; R¹⁰ represents a hydroxy group, a phenyl group, a naphthyl group, an alkyl group or an alkoxy group which may have a substituent; and R⁴′ represents an alkylene group which may have a substituent.

In the formulas (ca-12) and (ca-13), the alkyl group for R⁸¹ to R⁸⁶ is preferably an alkyl group of 1 to 5 carbon atoms, more preferably a linear or branched alkyl group, and particularly preferably a methyl group, an ethyl group, a propyl group, an isopropyl group, an n-butyl group or a tert-butyl group.

The alkoxy group is preferably an alkoxy group of 1 to 5 carbon atoms, more preferably a linear or branched alkoxy group, and particularly preferably a methoxy group or an ethoxy group.

The hydroxyalkyl group is preferably a group in which one or more hydrogen atoms in the aforementioned alkyl group have been substituted with hydroxy groups, and examples thereof include a hydroxymethyl group, a hydroxyethyl group and a hydroxypropyl group.

If there are two or more of an individual R⁸¹ to R⁸⁶ group, as indicated by the corresponding value of n₁ to n₆, the two or more of the individual R⁸¹ to R⁸⁶ group may be the same or different from each other.

n₁ is preferably 0 to 2, more preferably 0 or 1, and still more preferably 0.

It is preferable that each of n₂ and n₃ independently represent 0 or 1, and more preferably 0.

n₄ is preferably 0 to 2, and more preferably 0 or 1.

n₅ is preferably 0 or 1, and more preferably 0.

n₆ is preferably 0 or 1, and more preferably 1.

Preferable examples of the cation represented by the formula (ca-12) or (ca-13) are shown below.

In the formulas (a1-0-14) and (ca-15), u is an integer of 1 to 3, and most preferably 1 or 2.

R⁹ represents a phenyl group, a naphthyl group or an alkyl group which may have a substituent.

Further, examples of the substituent for the phenyl group or naphthyl group represented by R⁹ include the same groups as those described above for substituents which the substituted aryl group represented by R¹″ to R³″ may have. Specific examples thereof include an alkyl group, an alkoxy group, a halogen atom, a halogenated alkyl group, a hydroxy group, an oxo group (═O), a cyano group, an aryl group, an alkoxyalkyloxy group, an alkoxycarbonylalkyloxy group, —C(═O)—O—R⁶′, —O—C(═O)—R⁷′, —O—R⁸′, —O—R′, a halogenated alkylsulfonyoxy group and —O-Q′-[O—R¹¹″—S⁺(R²¹″)(R³¹″)]_(x).

As the alkyl group which may have a substituent for R⁹, the same alkyl group which may have a substituent as those described above for R¹″ to R³″ can be mentioned.

R¹⁰ represents a hydroxy group, a phenyl group, a naphthyl group, an alkyl group and an alkoxy group which may have a substituent.

Examples of the substituent which the phenyl group or naphthyl group represented by R¹⁰ may have include the same groups as those described above for a substituent which the phenyl group or naphthyl group represented by R⁹ may have.

As the alkyl group in the alkyl group and alkoxy group which may have a substituent for R¹⁰, the same alkyl group as those described above for R¹″ to R³″ can be mentioned.

As the alkylene group for R⁴′, a linear or branched alkylene group is preferable. The alkylene group preferably has 1 to 12 carbon atoms, more preferably 1 to 5 carbon atoms, still more preferably 1 to 3 carbon atoms and particularly preferably 1 or 2 carbon atoms.

Further, examples of the substituent which the alkylene group represented by R⁴′ may have include the same groups as those described above for substituent which the substituted alkyl group represented by R¹″ to R³″ may have. Specific examples thereof include an alkoxy group, a halogen atom, a halogenated alkyl group, a hydroxy group, an oxo group (═O), a cyano group, an aryl group, an alkoxyalkyloxy group, an alkoxycarbonylalkyloxy group, —C(═O)—O—R⁶′, —O—C(═O)—R⁷′, —O—R⁸′, —O—R⁹′, a halogenated alkylsulfonyoxy group and —O-Q′-[O—R¹¹″—S⁺(R²¹″)(R³¹″)]_(x).

Preferable examples of the cation represented by the formula (ca-14) or (ca-15) are shown below.

In formula (ca-14-1), R^(d) represents a substituent. Examples of substituents include the same groups as those described above for substituents which the phenyl group or naphthyl group for R⁹ may have. Specific examples thereof include an alkyl group, an alkoxy group, a halogen atom, a halogenated alkyl group, a hydroxy group, an oxo group (═O), a cyano group, an aryl group, an alkoxyalkyloxy group, an alkoxycarbonylalkyloxy group, —C(═O)—O—R⁶′, —O—C(═O)—R⁷′, —O—R⁸′, —O—R⁹′, a halogenated alkylsulfonyoxy group and —O-Q¹-[O—R¹¹″—S⁺(R²¹″)(R³¹″)]_(x). Each of R⁷″, R⁸″, and R⁹″ independently represents a hydrogen atom or a hydrocarbon group.

As the aryl group, alkyl group or alkenyl group which may have a substituent for R⁵″ and R⁶″ in the formula (b-2), the same aryl group, alkyl group or alkenyl group which may have a substituent as those described above for R¹″ to R³″ can be mentioned.

It is preferable that at least one of R⁵″ and R⁶″ represents an aryl group which may have a substituent, and it is more preferable that both of R⁵″ and R⁶″ represent an aryl group which may have a substituent.

Specific examples of the cation moiety (I⁺(R⁵″)(R⁶″)) in the formula (b-2) include diphenyliodonium and bis(4-tert-butylphenyl)iodonium.

In formulas (b-1) and (b-2), R⁴″ represents an alkyl group, a halogenated alkyl group, an aryl group or an alkenyl group which may have a substituent.

The alkyl group for R⁴″ may be any of linear, branched or cyclic.

The linear or branched alkyl group for R⁴″ preferably has 1 to 10 carbon atoms, more preferably 1 to 8 carbon atoms, and most preferably 1 to 4 carbon atoms.

The cyclic alkyl group for R⁴″ preferably has 4 to 15 carbon atoms, more preferably 4 to 10, and most preferably 6 to 10.

When R⁴″ represents an alkyl group, examples of “R⁴¹SO₃ ⁻” includes alkylsulfonates such as methanesulfonate, n-propanesulfonate, n-butanesulfonate, n-octanesulfonate, 1-adamantanesulfonate, 2-norbornanesulfonate, d-camphor-10-sulfonate.

The halogenated alkyl group for R⁴″ is a group in which part of all of the hydrogen atoms in the alkyl group have been substituted with a halogen atom. As the alkyl group, an alkyl group of 1 to 5 carbon atoms is preferred. Among these, a linear or branched alkyl group is more preferable, and a methyl group, an ethyl group, a propyl group, an isopropyl group, an n-butyl group, a tert-butyl group, a tert-pentyl group or an isopentyl group is still more preferable. Examples of the halogen atom which substitutes the hydrogen atoms include a fluorine atom, a chlorine atom, an iodine atom and a bromine atom. With respect to the halogenated alkyl group, 50 to 100% of the hydrogen atoms in the alkyl group (alkyl group before halogenation) are preferably substituted with the halogen atoms, and all of the hydrogen atoms are more preferably substituted with the halogen atoms.

As the halogenated alkyl group, a fluorinated alkyl group is desirable. The fluorinated alkyl group preferably has 1 to 10 carbon atoms, more preferably 1 to 8 carbon atoms, and most preferably 1 to 4 carbon atoms.

Further, the fluorination ratio of the fluorinated alkyl group is preferably from 10 to 100%, more preferably from 50 to 100%, and it is particularly preferable that all hydrogen atoms are substituted with fluorine atoms because the acid strength increases.

Specific examples of the fluorinated alkyl group include a trifluoromethyl group, a heptafluoro-n-propyl group and a nonafluoro-n-butyl group.

As examples of the aryl group for R⁴″, the same aryl groups as those described above for R¹″ to R³″, R⁵″ and R⁶″ can be used. Among these, an aryl group of 6 to 20 carbon atoms is preferable.

As examples of the alkenyl group for R⁴″, the same alkenyl groups as those described above for R¹″ to R³″, R⁵″ and R⁶″ can be used. Among these, an alkenyl group of 2 to 10 carbon atoms is preferable.

The alkyl group, halogenated alkyl group, aryl group or alkenyl group for R⁴″ may have a substituent.

The expression “may have a substituent” means that part of or all of the hydrogen atoms within the aforementioned linear, branched or cyclic alkyl group, halogenated alkyl group, aryl group or alkenyl group may be substituted with substituents (atoms other than hydrogen atoms, or groups).

R⁴″ may have one substituent, or two or more substituents.

Examples of the substituent include a halogen atom, a hetero atom, an alkyl group, and a group represented by the formula X³-Q′- (in the formula, Q′ represents a divalent linking group containing an oxygen atom; and X³ represents a hydrocarbon group of 1 to 30 carbon atoms which may have a substituent).

Examples of halogen atoms and alkyl groups include the same halogen atoms and alkyl groups as those described above with respect to the halogenated alkyl group for R⁴″.

Examples of hetero atoms include an oxygen atom, a nitrogen atom, and a sulfur atom.

In the group represented by formula X³-Q′-, Q′ represents a divalent linking group containing an oxygen atom.

Q′ may contain an atom other than an oxygen atom. Examples of atoms other than oxygen include a carbon atom, a hydrogen atom, a sulfur atom and a nitrogen atom.

Examples of divalent linkage groups containing an oxygen atom include non-hydrocarbon, oxygen atom-containing linkage groups such as an oxygen atom (an ether bond; —O—), an ester bond (—C(═O)—O—), an amido bond (—C(═O)—NH—), a carbonyl group (—C(═O)—) and a carbonate bond (—O—C(═O)—O—); and a combination of any of the aforementioned non-hydrocarbon, oxygen atom-containing linkage groups with an alkylene group. To the combination, a sulfonyl group (—SO₂—) may further be linked.

Specific examples of the combinations of the aforementioned non-hydrocarbon, oxygen atom-containing linkage groups with anlkylene groups include —R⁹¹—O—, —R⁹²—O—C(═O)—, —C(═O)—O—R⁹³—O—C(═O)—, —SO₂—O—R⁹⁴—O—C(═O)— and —R⁹⁵—SO₂—O—R⁹⁴—O—C(═O)-(in the formulas, R⁹¹ to R⁹⁵ each independently represent an alkylene group.)

The alkylene group for R⁹¹ to R⁹⁵ is preferably a linear or branched alkylene group, and preferably has 1 to 12 carbon atoms, more preferably 1 to 5, and particularly preferably 1 to 3.

Specific examples of the alkylene group include a methylene group [—CH₂—]; alkylmethylene groups such as —CH(CH₃)—, —CH(CH₂CH₃)—, —C(CH₃)₂—, —C(CH₃)(CH₂CH₃)—, —C(CH₃)(CH₂CH₂CH₃)— and —C(CH₂CH₃)₂—; an ethylene group [—CH₂CH₂—]; alkylethylene groups such as —CH(CH₃)CH₂—, —CH(CH₃)CH(CH₃)—, —C(CH₃)₂CH₂— and —CH(CH₂CH₃)CH₂—; a trimethylene group (n-propylene group) [—CH₂CH₂CH₂—]; alkyltrimethylene groups such as —CH(CH₃)CH₂CH₂— and —CH₂CH(CH₃)CH₂—; a tetramethylene group [—CH₂CH₂CH₂CH₂—]; alkyltetramethylene groups such as —CH(CH₃)CH₂CH₂CH₂— and —CH₂CH(CH₃)CH₂CH₂—; and a pentamethylene group [—CH₂CH₂CH₂CH₂CH₂—].

Q′ is preferably a divalent linking group containing an ester bond or ether bond, and more preferably a group of —R⁹¹—O—, —R⁹²—O—C(═O)— or —C(═O)—O—R⁹³—O—C(═O)—.

In the group represented by the formula X³-Q′-, X³ represents a hydrocarbon group of 1 to 30 carbon atoms which may have a substituent.

The hydrocarbon group for X³ may be either an aromatic hydrocarbon group or an aliphatic hydrocarbon group.

The aromatic hydrocarbon group is a hydrocarbon group having an aromatic ring. The aromatic hydrocarbon group preferably has 5 to 30 carbon atoms, more preferably 5 to 20, still more preferably 6 to 15, and most preferably 6 to 12. Here, the number of carbon atoms within a substituent(s) is not included in the number of carbon atoms of the aromatic ring.

Specific examples of aromatic hydrocarbon groups include an aryl group which is an aromatic hydrocarbon ring having one hydrogen atom removed therefrom, such as a phenyl group, a biphenyl group, a fluorenyl group, a naphthyl group, an anthryl group or a phenanthryl group; and an alkylaryl group such as a benzyl group, a phenethyl group, a 1-naphthylmethyl group, a 2-naphthylmethyl group, a 1-naphthylethyl group, or a 2-naphthylethyl group. The alkyl chain within the arylalkyl group preferably has 1 to 4 carbon atom, more preferably 1 or 3, and particularly preferably 1 or 2.

The aromatic hydrocarbon group may have a substituent. For example, part of the carbon atoms constituting the aromatic ring within the aromatic hydrocarbon group may be substituted with a hetero atom, or a hydrogen atom bonded to the aromatic ring within the aromatic hydrocarbon group may be substituted with a substituent.

In the former example, a heteroaryl group in which part of the carbon atoms constituting the ring within the aforementioned aryl group has been substituted with a hetero atom such as an oxygen atom, a sulfur atom or a nitrogen atom, and a heteroarylalkyl group in which part of the carbon atoms constituting the aromatic hydrocarbon ring within the aforementioned arylalkyl group has been substituted with the aforementioned heteroatom can be used.

In the latter example, as the substituent for the aromatic hydrocarbon group, an alkyl group, an alkoxy group, a halogen atom, a halogenated alkyl group, a hydroxy group, an oxygen atom (═O) or the like can be used.

The alkyl group as a substituent for the aromatic hydrocarbon group is preferably an alkyl group of 1 to 5 carbon atoms, and a methyl group, an ethyl group, a propyl group, an n-butyl group or a tert-butyl group is most desirable.

The alkoxy group as a substituent for the aromatic hydrocarbon group is preferably an alkoxy group having 1 to 5 carbon atoms, more preferably a methoxy group, an ethoxy group, an n-propoxy group, an iso-propoxy group, an n-butoxy group or a tert-butoxy group, and most preferably a methoxy group or an ethoxy group.

Examples of the halogen atom as a substituent for the aromatic hydrocarbon group include a fluorine atom, a chlorine atom, a bromine atom and an iodine atom, and a fluorine atom is preferable.

Example of the aforementioned halogenated alkyl group as the substituent for the aromatic hydrocarbon group includes a group in which a part or all of the hydrogen atoms within an alkyl group of 1 to 5 carbon atoms (e.g., a methyl group, an ethyl group, a propyl group, an n-butyl group or a tert-butyl group) have been substituted with the aforementioned halogen atoms.

The aliphatic hydrocarbon group may be either a saturated aliphatic hydrocarbon group, or an unsaturated aliphatic hydrocarbon group. Further, the aliphatic hydrocarbon group may be linear, branched or cyclic.

In the aliphatic hydrocarbon group, part of the carbon atoms constituting the aliphatic hydrocarbon group may be substituted with a substituent group containing a hetero atom, or part or all of the hydrogen atoms constituting the aliphatic hydrocarbon group may be substituted with a substituent group containing a hetero atom.

As the “hetero atom”, there is no particular limitation as long as it is an atom other than carbon atom and hydrogen atom, and examples thereof include a halogen atom, an oxygen atom, a sulfur atom and a nitrogen atom. Examples of the halogen atom include a fluorine atom, a chlorine atom, an iodine atom and a bromine atom.

The substituent group containing a hetero atom may be a group consisting of a hetero atom, or may be a group containing a group or atom other than a hetero atom.

Specific examples of the substituent group for substituting a part of the carbon atoms include —O—, —C(═O)—O—, —C(═O)—, —O—C(═O)—O—, —C(═O)—NH—, —NH— (wherein the H may be substituted with a substituent such as an alkyl group or an acyl group), —S—, —S(═O)₂— and —S(═O)₂—O—. When the aliphatic hydrocarbon group is cyclic, the aliphatic hydrocarbon group may contain any of these substituent groups in the ring structure.

Examples of the substituent group for substituting part or all of the hydrogen atoms include an alkoxy group, a halogen atom, a halogenated alkyl group, a hydroxy group, an oxygen atom (═O) and a cyano group.

The aforementioned alkoxy group is preferably an alkoxy group having 1 to 5 carbon atoms, more preferably a methoxy group, an ethoxy group, an n-propoxy group, an iso-propoxy group, an n-butoxy group or a tert-butoxy group, and most preferably a methoxy group or an ethoxy group.

Examples of the aforementioned halogen atom include a fluorine atom, a chlorine atom, a bromine atom and an iodine atom, and a fluorine atom is preferable.

Example of the aforementioned halogenated alkyl group includes a group in which a part or all of the hydrogen atoms within an alkyl group of 1 to 5 carbon atoms (e.g., a methyl group, an ethyl group, a propyl group, an n-butyl group or a tert-butyl group) have been substituted with the aforementioned halogen atoms.

As the aliphatic hydrocarbon group, a linear or branched saturated hydrocarbon group, a linear or branched monovalent unsaturated hydrocarbon group, or a cyclic aliphatic hydrocarbon group (aliphatic cyclic group) is preferable.

The linear saturated hydrocarbon group (alkyl group) preferably has 1 to 20 carbon atoms, more preferably 1 to 15, and most preferably 1 to 10. Specific examples include a methyl group, an ethyl group, a propyl group, a butyl group, a pentyl group, a hexyl group, a heptyl group, an octyl group, a nonyl group, a decanyl group, an undecyl group, a dodecyl group, a tridecyl group, an isotridecyl group, a tetradecyl group, a pentadecyl group, a hexadecyl group, an isohexadecyl group, a heptadecyl group, an octadecyl group, a nonadecyl group, an icosyl group, a henicosyl group and a docosyl group.

The branched saturated hydrocarbon group (alkyl group) preferably has 3 to 20 carbon atoms, more preferably 3 to 15, and most preferably 3 to 10. Specific examples include a 1-methylethyl group, a 1-methylpropyl group, a 2-methylpropyl group, a 1-methylbutyl group, a 2-methylbutyl group, a 3-methylbutyl group, a 1-ethylbutyl group, a 2-ethylbutyl group, a 1-methylpentyl group, a 2-methylpentyl group, a 3-methylpentyl group and a 4-methylpentyl group.

The unsaturated hydrocarbon group preferably has 2 to 10 carbon atoms, more preferably 2 to 5, still more preferably 2 to 4, and particularly preferably 3. Examples of linear monovalent unsaturated hydrocarbon groups include a vinyl group, a propenyl group (an allyl group) and a butynyl group. Examples of branched monovalent unsaturated hydrocarbon groups include a 1-methylpropenyl group and a 2-methylpropenyl group.

Among the above-mentioned examples, as the unsaturated hydrocarbon group, a propenyl group is particularly desirable.

The cyclic aliphatic hydrocarbon group (aliphatic cyclic group) represents an aliphatic cyclic group of 3 to 30 carbon atom which may have a substituent.

The aliphatic cyclic group may be either a monocyclic group or a polycyclic group. The aliphatic cyclic group has 3 to 30 carbon atoms, preferably 5 to 30, more preferably 5 to 20, still more preferably 6 to 15, and particularly preferably 6 to 12.

As the aliphatic cyclic group, a group in which one or more hydrogen atoms have been removed from a monocycloalkane or a polycycloalkane such as a bicycloalkane, tricycloalkane or tetracycloalkane can be used. Specific examples include groups in which one or more hydrogen atoms have been removed from a monocycloalkane such as cyclopentane or cyclohexane; and groups in which one or more hydrogen atoms have been removed from a polycycloalkane such as adamantane, norbornane, isobornane, tricyclodecane or tetracyclododecane.

When the aliphatic cyclic group does not contain a hetero atom-containing substituent group in the ring structure thereof, the aliphatic cyclic group is preferably a polycyclic group, more preferably a group in which one or more hydrogen atoms have been removed from a polycycloalkane, and a group in which one or more hydrogen atoms have been removed from adamantane is most desirable.

When the aliphatic cyclic group contains a hetero atom-containing substituent group in the ring structure thereof, the hetero atom-containing substituent group is preferably —O—, —C(═O)—O—, —S—, —S(═O)₂— or —S(═O)₂—O—. Specific examples of such aliphatic cyclic groups include groups represented by formulas (L1) to (L7) and (S1) to (S4) shown below.

Among the above, as R⁴″, a halogenated alkyl group or a group having X³-Q′- as a substituent is preferable.

When the R⁴″ group has X³-Q′- as a substituent, as R⁴″, a group represented by the formula: X³-Q′-Y⁵— (in the formula, Q′ and X³ are the same as defined above, and Y⁵ represents an alkylene group of 1 to 4 carbon atoms which may have a substituent or a fluorinated alkylene group of 1 to 4 carbon atoms which may have a substituent is preferable.

In the group represented by the formula X³-Q′-Y^(S)—, as the alkylene group for Y⁵, the same alkylene group as those described above for Q′ in which the number of carbon atoms is 1 to 4 can be used.

As the fluorinated alkylene group, the aforementioned alkylene group in which part or all of the hydrogen atoms has been substituted with fluorine atoms can be used.

Specific examples of Y⁵ include —CF₂—, —CF₂CF₂—, —CF₂CF₂CF₂—, —CF(CF₃)CF₂—, —CF(CF₂CF₃)—, —C(CF₃)₂—, —CF₂CF₂CF₂CF₂—, —CF(CF₃)CF₂CF₂—, —CF₂CF(CF₃)CF₂—, —CF(CF₃)CF(CF₃)—, —C(CF₃)₂CF₂—, —CF(CF₂CF₃)CF₂—, —CF(CF₂CF₂CF₃)—, —C(CF₃)(CF₂CF₃)—; —CHF—, —CH₂CF₂—, —CH₂CH₂CF₂—, —CH₂CF₂CF₂—, —CH(CF₃)CH₂—, —CH(CF₂CF₃)—, —C(CH₃)(CF₃)—, —CH₂CH₂CH₂CF₂—, —CH₂CH₂CF₂CF₂—, —CH(CF₃)CH₂CH₂—, —CH₂CH(CF₃)CH₂—, —CH(CF₃)CH(CF₃)—, —C(CF₃)₂CH₂—; —CH₂—, —CH₂CH₂—, —CH₂CH₂CH₂—, —CH(CH₃)CH₂—, —CH(CH₂CH₃)—, —C(CH₃)₂—, —CH₂CH₂CH₂CH₂—, —CH(CH₃)CH₂CH₂—, —CH₂CH(CH₃)CH₂—, —CH(CH₃)CH(CH₃)—, —C(CH₃)₂CH₂—, —CH(CH₂CH₃)CH₂—, —CH(CH₂CH₂CH₃)— and —C(CH₃)(CH₂CH₃)—.

As Y⁵, a fluorinated alkylene group is preferable, and a fluorinated alkylene group in which the carbon atom bonded to the adjacent sulfur atom is fluorinated is particularly desirable. Examples of such fluorinated alkylene groups include —CF₂—, —CF₂CF₂—, —CF₂CF₂CF₂—, —CF(CF₃)CF₂—, —CF₂CF₂CF₂CF₂—, —CF(CF₃)CF₂CF₂—, —CF₂CF(CF₃)CF₂—, —CF(CF₃)CF(CF₃)—, —C(CF₃)₂CF₂—, —CF(CF₂CF₃)CF₂—, —CH₂CF₂—, —CH₂CH₂CF₂—, —CH₂CF₂CF₂—, —CH₂CH₂CH₂CF₂—, —CH₂CH₂CF₂CF₂— and —CH₂CF₂CF₂CF₂—.

Of these, —CF₂—, —CF₂CF₂—, —CF₂CF₂CF₂— or CH₂CF₂CF₂— is preferable, —CF₂—, —CF₂CF₂— or —CF₂CF₂CF₂— is more preferable, and —CF₂— is particularly desirable.

The alkylene group or fluorinated alkylene group may have a substituent. The alkylene group or fluorinated alkylene group “has a substituent” means that part or all of the hydrogen atoms or fluorine atoms in the alkylene group or fluorinated alkylene group has been substituted with groups or atoms other than hydrogen atoms and fluorine atoms.

Examples of substituents which the alkylene group or fluorinated alkylene group may have include an alkyl group of 1 to 4 carbon atoms, an alkoxy group of 1 to 4 carbon atoms, and a hydroxy group.

Specific examples of groups represented by formula R⁴¹SO₃— in which R⁴″ represents X³-Q′-Y⁵— include anions represented by the following formulae (b1) to (b9).

In the formulas, each of q1 and q2 independently represents an integer of 1 to 5; q3 represents an integer of 1 to 12; t3 represents an integer of 1 to 3; each of r1 and r2 independently represents an integer of 0 to 3; g represents an integer of 1 to 20; R⁷ represents a substituent; each of n1 to n6 independently represents 0 or 1; each of v0 to v6 independently represents an integer of 0 to 3; each of w1 to w6 independently represents an integer of 0 to 3; and Q″ is the same as defined above.

Examples of the substituent for R⁷ include the same substituents as those described above for substituting a hydrogen atom bonded to the aromatic ring in the explanation for X in the general formula (c1).

If there are two or more of the R⁷ group, as indicated by the values r1, r2, and w1 to w6, then the two or more of the R⁷ groups may be the same or different from each other.

Further, onium salt-based acid generators in which the anion moiety (R⁴″SO₃ ⁻) in the general formula (b-1) or (b-2) is replaced by an anion moiety represented by the general formula (b-3) or (b-4) (the cation moiety is the same as that of (b-1) or (b-2)) may be used.

In the formulas, X″ represents an alkylene group of 2 to 6 carbon atoms in which at least one hydrogen atom has been substituted with a fluorine atom; and Y″ and Z″ each independently represents an alkyl group of 1 to 10 carbon atoms in which at least one hydrogen atom has been substituted with a fluorine atom.

In the formula (b-3), X″ represents a linear or branched alkylene group in which at least one hydrogen atom has been substituted with a fluorine atom, and the alkylene group has 2 to 6 carbon atoms, preferably 3 to 5 carbon atoms, and most preferably 3 carbon atoms.

In the formula (b-4), each of Y″ and Z″ independently represents a linear or branched alkyl group in which at least one hydrogen atom has been substituted with a fluorine atom, and the alkyl group has 1 to 10 carbon atoms, preferably 1 to 7 carbon atoms, and most preferably 1 to 3 carbon atoms.

The smaller the number of carbon atoms of the alkylene group for X″ or those of the alkyl group for Y″ and Z″ within the above-mentioned range of the number of carbon atoms, the more the solubility in a resist solvent is improved.

Further, in the alkylene group for X″ or the alkyl group for Y″ and Z″, it is preferable that the number of hydrogen atoms substituted with fluorine atoms is as large as possible because the acid strength increases and the transparency to high energy radiation of 200 nm or less or electron beam is improved.

The amount of fluorine atoms within the alkylene group or alkyl group, i.e., fluorination ratio, is preferably from 70 to 100%, more preferably from 90 to 100%, and it is most desirable that the alkylene group or alkyl group be a perfluoroalkylene or perfluoroalkyl group in which all hydrogen atoms are substituted with fluorine atoms.

As the component (B), one type of these acid generators may be used alone, or two or more types may be used in combination.

In the present invention, in terms of improving lithography properties such as MEF, CDU and circularity, the component (B) preferably contains a cation moiety having the same substituent (X—R¹—O—) as those which the component (C) has. When two or more types of components (B) are used in combination, in terms of improving lithography properties such as MEF, CDU and circularity, the components (B) having the same anion moieties are preferably used.

In the resist composition, the amount of the component (B), relative to 100 parts by weight of the component (A) is preferably from 0.5 to 60 parts by weight, more preferably from 1 to 50 parts by weight, and still more preferably from 1 to 40 parts by weight. When the amount of the component (B) is within the above-mentioned range, formation of a resist pattern can be satisfactorily performed. Further, when these components of the resist composition are dissolved in the organic solvent, a uniform solution can be obtained and the storage stability can be improved.

<Other Optional Components> [Component (D)]

The resist composition of the present invention may also contain a basic compound which does not fall under the definition of the aforementioned component (C) (hereafter, referred to as “component (D)”) as a arbitrary component.

The component (D) is not particularly limited, as long as it is a compound which is basic relative to the component (B), so as to function as an acid diffusion inhibitor, that is, a quencher which traps acid generated from the component (A) or (B) upon exposure, and does not fall under the definition of the component (C). As the component (D), any of the conventionally known compounds may be selected for use. Examples thereof include an aliphatic amine and an aromatic amine. Among these, an aliphatic amine is preferable, and a secondary aliphatic amine or tertiary aliphatic amine is particularly desirable.

An aliphatic amine is an amine having one or more aliphatic groups, and the aliphatic groups preferably have 1 to 12 carbon atoms.

Examples of these aliphatic amines include amines in which at least one hydrogen atom of ammonia (NH₃) has been substituted with an alkyl group or hydroxyalkyl group of no more than 20 carbon atoms (i.e., alkylamines or alkylalcoholamines), cyclic amines and other aliphatic amines.

The alkyl group in the alkylamine may be any of linear, branched or cyclic.

When the alkyl group is linear or branched, the number of carbon atoms thereof is preferably 2 to 20, and more preferably 2 to 8.

When the alkyl group is cyclic (i.e., a cycloalkyl group), the number of carbon atoms is preferably 3 to 30, more preferably 3 to 20, still more preferably 3 to 15, particularly preferably 4 to 12, and most preferably 5 to 10. The alkyl group may be monocyclic or polycyclic. Examples thereof include groups in which one or more of the hydrogen atoms have been removed from a monocycloalkane; and groups in which one or more of the hydrogen atoms have been removed from a polycycloalkane such as a bicycloalkane, a tricycloalkane, or a tetracycloalkane. Specific examples of the monocycloalkane include cyclopentane and cyclohexane. Specific examples of the polycycloalkane include adamantane, norbornane, isobornane, tricyclodecane and tetracyclododecane.

As the alkyl group in the hydroxyalkyl group in the alkylalcoholamine, the same alkyl group as those in the aforementioned alkylamine can be mentioned.

Specific examples of the alkylamines include monoalkylamines such as n-hexylamine, n-heptylamine, n-octylamine, n-nonylamine, and n-decylamine; dialkylamines such as diethylamine, di-n-propylamine, di-n-heptylamine, di-n-octylamine, and dicyclohexylamine; and trialkylamines such as trimethylamine, triethylamine, tri-n-propylamine, tri-n-butylamine, tri-n-hexylamine, tri-n-pentylamine, tri-n-heptylamine, tri-n-octylamine, tri-n-nonylamine, tri-n-decanylamine, and tri-n-dodecylamine.

Specific examples of alkylalcoholamines include diethanolamine, triethanolamine, diisopropanolamine, triisopropanolamine, di-n-octanolamine, tri-n-octanolamine, stearyldiethanolamine and lauryldiethanolamine.

Among these, trialkylamines of 5 to 10 carbon atoms are preferable, and tri-n-pentylamine and tri-n-octylamine are particularly desirable.

Examples of the cyclic amine include heterocyclic compounds containing a nitrogen atom as a hetero atom. The heterocyclic compound may be a monocyclic compound (aliphatic monocyclic amine), or a polycyclic compound (aliphatic polycyclic amine) can be used.

Specific examples of the aliphatic monocyclic amine include piperidine, and piperazine.

The aliphatic polycyclic amine preferably has 6 to 10 carbon atoms, and specific examples thereof include 1,5-diazabicyclo[4.3.0]-5-nonene, 1,8-diazabicyclo[5.4.0]-7-undecene, hexamethylenetetramine, and 1,4-diazabicyclo[2.2.2]octane.

Examples of other aliphatic amines include tris(2-methoxymethoxyethyl)amine, tris {2-(2-methoxyethoxy)ethyl}amine, tris {2-(2-methoxyethoxymethoxy)ethyl}amine, tris {2-(1-methoxyethoxy)ethyl}amine, tris {2-(1-ethoxyethoxy)ethyl}amine, tris {2-(1-ethoxypropoxy)ethyl}amine, tris[2-{2-(2-hydroxyethoxy)ethoxy}ethyl]amine and triethanolamine triacetate.

Examples of aromatic amines include aniline, pyridine, 4-dimethylaminopyridine, pyrrole, indole, pyrazole, imidazole and derivatives thereof, diphenylamine, triphenylamine, tribenzylamine, 2,6-diisopropylaniline and N-tert-butoxycarbonylpyrrolidine.

As the component (D), one type of may be used alone, or two or more types may be used in combination.

When the resist composition of the present invention includes the component (D), the component (D) is used in an amount within a range from 0.01 to 5.0 parts by weight, relative to 100 parts by weight of the component (A). When the amount of the component (D) is within the above-mentioned range, the shape of the resist pattern and the post exposure stability of the latent image formed by the pattern-wise exposure of the resist layer are improved.

[Component (E)]

Furthermore, in the resist composition according to the present invention, for preventing any deterioration in sensitivity, and improving the resist pattern shape and the post exposure stability of the latent image formed by the pattern-wise exposure of the resist layer, at least one compound (E) (hereafter referred to as “component (E)”) selected from the group consisting of organic carboxylic acids, and phosphorus oxo acids and derivatives thereof can be added.

Examples of suitable organic carboxylic acids include acetic acid, malonic acid, citric acid, malic acid, succinic acid, benzoic acid, and salicylic acid.

Examples of phosphorus oxo acids include phosphoric acid, phosphonic acid and phosphinic acid. Among these, phosphonic acid is particularly desirable.

Examples of phosphorous oxo acid derivatives include esters in which a hydrogen atom within the above-mentioned phosphorous oxo acids is substituted with a hydrocarbon group. Examples of the hydrocarbon group include an alkyl group of 1 to 5 carbon atoms and an aryl group of 6 to 15 carbon atoms.

Examples of phosphoric acid derivatives include phosphoric acid esters such as di-n-butyl phosphate and diphenyl phosphate.

Examples of phosphonic acid derivatives include phosphonic acid esters such as dimethyl phosphonate, di-n-butyl phosphonate, phenyl phosphonate, diphenyl phosphonate and dibenzyl phosphonate.

Examples of phosphinic acid derivatives include phenylphosphinic acid and phosphinic acid esters.

As the component (E), one type may be used alone, or two or more types may be used in combination.

The component (E) is typically used in an amount within a range from 0.01 to 5.0 parts by weight, relative to 100 parts by weight of the component (A).

If desired, other miscible additives can also be added to the resist composition of the present invention. Examples of such miscible additives include additive resins for improving the performance of the resist film, surfactants for improving the applicability, dissolution inhibitors, plasticizers, stabilizers, colorants, halation prevention agents, and dyes.

[Component (F)]

The resist composition may further include a fluorine additive (hereafter, referred to as “component (F)”) for imparting water repellency to the resist film. As the component (F), for example, a fluorine-containing polymeric compound described in Japanese Unexamined Patent Application, First Publication No. 2010-002870 can be given.

As the component (F), a polymer having a structural unit (f1) represented by general formula (f1-1) shown below can be used. The polymer is preferably a polymer (homopolymer) consisting of a structural unit (f1); a copolymer of a structural unit represented by formula (f1-1) shown below and the aforementioned structural unit (a1); or a copolymer of a structural unit represented by formula (f1-1) shown below, a structural unit derived from acrylic acid or methacrylic acid and the aforementioned structural unit (a1). As the structural unit (a1) to be copolymerized with a structural unit represented by the formula (f1-1) shown below, the structural unit (a11) is preferable, the structural unit represented by the formula (a1-1) is more preferable, and the structural unit represented by the formula (a1-0-02) is particularly preferable.

In the formula, R is the same as defined above; each of R⁴¹ and R⁴² independently represents a hydrogen atom, a halogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms, provided that the plurality of R⁴¹ to R⁴² may be the same or different from each other; a1 represents an integer of 1 to 5; and R⁷″ represents an organic group containing a fluorine atom.

In formula (f1-1), R is the same as defined above. As R, a hydrogen atom or a methyl group is preferable.

In formula (f1-1), examples of the halogen atom for R⁴¹ and R⁴² include a fluorine atom, a chlorine atom, a bromine atom and an iodine atom, and a fluorine atom is particularly desirable. Examples of the alkyl group of 1 to 5 carbon atoms for R⁴¹ and R⁴² include the same alkyl group of 1 to 5 carbon atoms as those defined above for R defined above, and a methyl group or an ethyl group is preferable. Specific examples of the halogenated alkyl group of 1 to 5 carbon atoms represented by R⁴¹ or R⁴² include groups in which part or all of the hydrogen atoms of the aforementioned alkyl groups of 1 to 5 carbon atoms have been substituted with halogen atoms. Examples of the halogen atom include a fluorine atom, a chlorine atom, a bromine atom and an iodine atom, and a fluorine atom is particularly preferred. Among these, R⁴¹ and R⁴² are preferably a hydrogen atom, a fluorine atom or an alkyl group of 1 to 5 carbon atoms, and more preferably a hydrogen atom, a fluorine atom, a methyl group or an ethyl group.

In formula (f1-1), a1 represents an integer of 1 to 5, preferably an integer of 1 to 3, and more preferably 1 or 2.

In formula (f1-1), R⁷″ represents an organic group containing a fluorine atom, and is preferably a hydrocarbon group containing a fluorine atom.

The hydrocarbon group containing a fluorine atom may be linear, branched or cyclic, and preferably has 1 to 20 carbon atoms, more preferably 1 to 15 carbon atoms, and particularly preferably 1 to 10 carbon atoms.

The hydrocarbon group having a fluorine atom preferably has 25% or more of the hydrogen atoms within the hydrocarbon group fluorinated, more preferably 50% or more, and particularly preferably 60% or more, because the hydrophobicity of the resist film during immersion exposure is enhanced.

As R⁷″, a fluorinated hydrocarbon group of 1 to 5 carbon atoms is particularly preferable, and most preferably methyl group, —CH₂—CF₃, —CH₂—CF₂—CF₃, —CH(CF₃)₂, —CH₂—CH₂—CF₃ and —CH₂—CH₂—CF₂—CF₂—CF₂—CF₃.

The weight average molecular weight (Mw) (the polystyrene equivalent value determined by gel permeation chromatography) of the component (F) is preferably 1,000 to 50,000, more preferably 5,000 to 40,000, and most preferably 10,000 to 30,000. When the weight average molecular weight of the component (F) is no more than the upper limit of the above-mentioned range, the resist composition exhibits a satisfactory solubility in a resist solvent. On the other hand, when the weight average molecular weight is at least as large as the lower limit of the above-mentioned range, the dry etching resistance and the cross-sectional shape of the resist pattern becomes satisfactory.

Further, the dispersity (Mw/Mn) of the component (F) is preferably 1.0 to 5.0, more preferably 1.0 to 3.0, and most preferably 1.2 to 2.5.

The component (F) can be produced by a conventional radical polymerization or the like of the monomers corresponding with each of the structural units, using a radical polymerization initiator such as dimethyl 2,2′-azobis(isobutyrate) (V-601) or azobisisobutyronitrile (AIBN). By using a chain transfer agent such as HS—CH₂—CH₂—CH₂—C(CF₃)₂—OH, a —C(CF₃)₂—OH group can be introduced at the terminals. Such a copolymer having introduced a hydroxyalkyl group in which some of the hydrogen atoms of the alkyl group are substituted with fluorine atoms is effective in reducing defects and LER (line edge roughness: unevenness of the side walls of a line pattern).

As the monomers which yield the corresponding structural units, commercially available monomers may be used, or the monomers may be synthesized by a conventional method.

As the component (F), one type may be used alone, or two or more types may be used in combination.

When the resist composition of the present invention includes the component (F), the component (F) is used in an amount within a range from 0.5 to 10 parts by weight, relative to 100 parts by weight of the component (A).

If desired, other miscible additives can also be added to the resist composition of the present invention. Examples of such miscible additives include additive resins for improving the performance of the resist film, surfactants for improving the applicability, dissolution inhibitors, plasticizers, stabilizers, colorants, halation prevention agents, and dyes.

The resist composition according to the present invention can be prepared by dissolving the materials for the resist composition in an organic solvent (hereafter, frequently referred to as “component (S)”).

The component (S) may be any organic solvent which can dissolve the respective components to give a uniform solution, and one or more kinds of any organic solvent can be appropriately selected from those which have been conventionally known as solvents for a chemically amplified resist.

Examples thereof include lactones such as γ-butyrolactone;

ketones such as acetone, methyl ethyl ketone, cyclohexanone, methyl-n-pentyl ketone, methyl isopentyl ketone, and 2-heptanone;

polyhydric alcohols, such as ethylene glycol, diethylene glycol, propylene glycol and dipropylene glycol;

compounds having an ester bond, such as ethylene glycol monoacetate, diethylene glycol monoacetate, propylene glycol monoacetate, and dipropylene glycol monoacetate; polyhydric alcohol derivatives including compounds having an ether bond, such as a monoalkylether (e.g., monomethylether, monoethylether, monopropylether or monobutylether) or monophenylether of any of these polyhydric alcohols or compounds having an ester bond (among these, propylene glycol monomethyl ether acetate (PGMEA) and propylene glycol monomethyl ether (PGME) are preferable);

cyclic ethers such as dioxane; esters such as methyl lactate, ethyl lactate (EL), methyl acetate, ethyl acetate, butyl acetate, methyl pyruvate, ethyl pyruvate, methyl methoxypropionate, and ethyl ethoxypropionate;

and aromatic organic solvents such as anisole, ethylbenzylether, cresylmethylether, diphenylether, dibenzylether, phenetole, butylphenylether, ethylbenzene, diethylbenzene, pentylbenzene, isopropylbenzene, toluene, xylene, cymene and mesitylene.

These solvents can be used individually, or in combination as a mixed solvent.

Among these, propylene glycol monomethyl ether acetate (PGMEA), propylene glycol monomethyl ether (PGME) and ethyl lactate (EL) are preferable.

Further, among the mixed solvents, a mixed solvent obtained by mixing PGMEA with a polar solvent is preferable. The mixing ratio (weight ratio) of the mixed solvent can be appropriately determined, taking into consideration the compatibility of the PGMEA with the polar solvent, but is preferably in the range of 1:9 to 9:1, more preferably from 2:8 to 8:2. For example, when EL is mixed as the polar solvent, the PGMEA:EL weight ratio is preferably from 1:9 to 9:1, and more preferably from 2:8 to 8:2. Alternatively, when PGME is mixed as the polar solvent, the PGMEA:PGME is preferably from 1:9 to 9:1, more preferably from 2:8 to 8:2, and still more preferably 3:7 to 7:3. Alternatively, when PGME and cyclohexanone is mixed as the polar solvent, the PGMEA:(PGME+cyclohexanone) weight ratio is preferably from 1:9 to 9:1, more preferably from 2:8 to 8:2, and still more preferably 3:7 to 7:3.

Further, as the component (S), a mixed solvent of PGMEA, EL, or PGMEA with a polar solvent and a mixed solvent of PGMEA, EL, or PGMEA with γ-butyrolactone are also preferable. The mixing ratio (former:latter) of such a mixed solvent is preferably from 70:30 to 95:5.

The amount of the organic solvent is not particularly limited, and is appropriately adjusted to a concentration which enables coating of a coating solution to a substrate, depending on the thickness of the coating film. In general, the organic solvent is used in an amount such that the solid content of the resist composition becomes within the range from 1 to 20% by weight, and preferably from 2 to 15% by weight.

Since the resist composition according to the present invention contains a component (C) as a photoreactive quencher, various lithography properties such as resolution, depth of focus, mask reproducibility, in-plane uniformity of the pattern dimensions, pattern shape (e.g., rectangularity of the cross-sectional shape and circularity of hole patterns) and the like can be improved.

Further, the resist composition according to the present invention contains a component (C1) having an anion moiety which has a specific structure as a component (C) is superior to the conventional resist composition in terms of storage stability, and less likely to deteriorate in the properties thereof due to the change in a storage temperature and a storage period. Furthermore, deterioration of lithography properties after storage can be suppressed.

The component (C1) of the present invention contains a cation moiety having a specific structure. It is presumed that since the cation moiety has a cyclic group X having a bulky structure at the terminal of the cation moiety, the solubility in a developing solution can be controlled, thereby improving lithography properties.

<<Method of Forming a Resist Pattern>>

The method of forming a resist pattern according to the present invention includes: forming a resist film on a substrate using a resist composition of the present invention; conducting exposure of the resist film; and developing the resist film to form a resist pattern.

The method for forming a resist pattern according to the present invention can be performed, for example, as follows.

Firstly, a resist composition of the present invention is applied to a substrate using a spinner or the like, and a bake treatment (post applied bake (PAB)) is conducted at a temperature of 80 to 150° C. for 40 to 120 seconds, preferably 60 to 90 seconds, to form a resist film.

Following selective exposure of the thus formed resist film, either by exposure through a mask having a predetermined pattern formed thereon (mask pattern) using an exposure apparatus such as an ArF exposure apparatus, a KrF exposure apparatus, an electron beam lithography apparatus or an EUV exposure apparatus, or by patterning via direct irradiation with an electron beam without using a mask pattern, baking treatment (post exposure baking (PEB)) is conducted under temperature conditions of 80 to 150° C. for 40 to 120 seconds, and preferably 60 to 90 seconds.

Next, the resist film is subjected to a developing treatment.

The developing treatment is conducted using an alkali developing solution in the case of an alkali developing process, whereas the developing treatment is conducted using a developing solution containing an organic solvent (organic developing solution) in the case of a solvent developing process.

After the developing treatment, it is preferable to conduct a rinse treatment. The rinse treatment is preferably conducted using pure water in the case of an alkali developing process, whereas the rinse treatment is preferably conducted using a rinse solution containing an organic solvent in the case of a solvent developing process.

In the case of a solvent developing process, after the developing treatment or the rinsing, the developing solution or the rinse liquid remaining on the pattern can be removed by a treatment using a supercritical fluid.

After the developing treatment or the rinse treatment, drying is conducted. If desired, bake treatment (post bake) can be conducted following the developing. In this manner, a resist pattern can be obtained.

The substrate is not specifically limited and a conventionally known substrate can be used. For example, substrates for electronic components, and such substrates having wiring patterns formed thereon can be used. Specific examples of the material of the substrate include metals such as silicon wafer, copper, chromium, iron and aluminum; and glass. Suitable materials for the wiring pattern include copper, aluminum, nickel, and gold.

Further, as the substrate, any one of the above-mentioned substrates provided with an inorganic and/or organic film on the surface thereof may be used. As the inorganic film, an inorganic antireflection film (inorganic BARC) can be used. As the organic film, an organic antireflection film (organic BARC) and an organic film such as a lower-layer organic film used in a multilayer resist method can be used.

Here, a “multilayer resist method” is method in which at least one layer of an organic film (lower-layer organic film) and at least one layer of a resist film (upper resist film) are provided on a substrate, and a resist pattern formed on the upper resist film is used as a mask to conduct patterning of the lower-layer organic film. This method is considered as being capable of forming a pattern with a high aspect ratio. More specifically, in the multilayer resist method, a desired thickness can be ensured by the lower-layer organic film, and as a result, the thickness of the resist film can be reduced, and an extremely fine pattern with a high aspect ratio can be formed.

The multilayer resist method is broadly classified into a method in which a double-layer structure consisting of an upper-layer resist film and a lower-layer organic film is formed (double-layer resist method), and a method in which a multilayer structure having at least three layers consisting of an upper-layer resist film, a lower-layer organic film and at least one intermediate layer (thin metal film or the like) provided between the upper-layer resist film and the lower-layer organic film (triple-layer resist method).

The wavelength to be used for exposure is not particularly limited and the exposure can be conducted using radiations such as ArF excimer laser, KrF excimer laser, F₂ excimer laser, extreme ultraviolet rays (EUV), vacuum ultraviolet rays (VUV), electron beam (EB), X-rays, and soft X-rays. The resist composition of the present invention is effective to KrF excimer laser, ArF excimer laser, EB and EUV.

The exposure of the resist film can be either a general exposure (dry exposure) conducted in air or an inert gas such as nitrogen, or immersion exposure (liquid immersion lithography).

In immersion lithography, the region between the resist film and the lens at the lowermost point of the exposure apparatus is pre-filled with a solvent (immersion medium) that has a larger refractive index than the refractive index of air, and the exposure (immersion exposure) is conducted in this state.

The immersion medium preferably exhibits a refractive index larger than the refractive index of air but smaller than the refractive index of the resist film to be exposed. The refractive index of the immersion medium is not particularly limited as long at it satisfies the above-mentioned requirements.

Examples of this immersion medium which exhibits a refractive index that is larger than the refractive index of air but smaller than the refractive index of the resist film include water, fluorine-based inert liquids, silicon-based solvents and hydrocarbon-based solvents.

Specific examples of the fluorine-based inert liquids include liquids containing a fluorine-based compound such as C₃HCl₂F₅, C₄F₉OCH₃, C₄F₉OC₂H₅ or C₅H₃F₇ as the main component, which have a boiling point within a range from 70 to 180° C. and preferably from 80 to 160° C. A fluorine-based inert liquid having a boiling point within the above-mentioned range is advantageous in that the removal of the immersion medium after the exposure can be conducted by a simple method.

As a fluorine-based inert liquid, a perfluoroalkyl compound in which all of the hydrogen atoms of the alkyl group are substituted with fluorine atoms is particularly desirable. Examples of these perfluoroalkyl compounds include perfluoroalkylether compounds and perfluoroalkylamine compounds.

Specifically, one example of a suitable perfluoroalkylether compound is perfluoro(2-butyl-tetrahydrofuran) (boiling point 102° C.), and an example of a suitable perfluoroalkylamine compound is perfluorotributylamine (boiling point 174° C.).

As the immersion medium, water is preferable in terms of cost, safety, environment and versatility.

As an example of the alkali developing solution used in an alkali developing process, a 0.1 to 10% by weight aqueous solution of tetramethylammonium hydroxide (TMAH) can be given.

As the organic solvent contained in the organic developing solution used in a solvent developing process, any of the conventional organic solvents can be used which are capable of dissolving the component (A) (prior to exposure). Specific examples of the organic solvent include polar solvents such as ketone-based solvents, ester-based solvents, alcohol-based solvents, amide-based solvents and ether-based solvents, and hydrocarbon solvents.

If desired, the organic developing solution may have a conventional additive blended. Examples of the additive include surfactants. The surfactant is not particularly limited, and for example, an ionic or non-ionic fluorine surfactant and/or silicon surfactant can be used.

When a surfactant is added, the amount thereof based on the total amount of the organic developing solution is generally 0.001 to 5% by weight, preferably 0.005 to 2% by weight, and more preferably 0.01 to 0.5% by weight.

The developing treatment can be performed by a conventional developing method. Examples thereof include a method in which the substrate is immersed in the developing solution for a predetermined time (a dip method), a method in which the developing solution is cast up on the surface of the substrate by surface tension and maintained for a predetermined period (a puddle method), a method in which the developing solution is sprayed onto the surface of the substrate (spray method), and a method in which the developing solution is continuously ejected from a developing solution ejecting nozzle while scanning at a constant rate to apply the developing solution to the substrate while rotating the substrate at a constant rate (dynamic dispense method).

As the organic solvent contained in the rinse liquid used in the rinse treatment after the developing treatment in the case of a solvent developing process, any of the aforementioned organic solvents contained in the organic developing solution can be used which hardly dissolves the resist pattern. In general, at least one solvent selected from the group consisting of hydrocarbon solvents, ketone-based solvents, ester-based solvents, alcohol-based solvents, amide-based solvents and ether-based solvents is used. Among these, at least one solvent selected from the group consisting of hydrocarbon-based solvents, ketone-based solvents, ester-based solvents, alcohol-based solvents and amide-based solvents is preferable, more preferably at least one solvent selected from the group consisting of alcohol-based solvents and ester-based solvents, and an alcohol-based solvent is particularly desirable.

The rinse treatment (washing treatment) using the rinse liquid can be performed by a conventional rinse method. Examples thereof include a method in which the rinse liquid is continuously applied to the substrate while rotating it at a constant rate (rotational coating method), a method in which the substrate is immersed in the rinse liquid for a predetermined time (dip method), and a method in which the rinse liquid is sprayed onto the surface of the substrate (spray method).

EXAMPLES

As follows is a description of examples of the present invention, although the scope of the present invention is by no way limited by these examples.

Test Example 1, Test Comparative Examples 1 and 2

Each of components (C) ((C)-1 to (C)-3) indicated in Table 1 was dissolved in the solvent indicated in Table 1 to prepare a solution having a solid content of 10% by weight, and then, the solution was stored for 1 month at a temperature indicated in Table 1. Then, the amount of decomposed compounds (ppm) relative to the amount of the component (C) which had been measured prior to storage, was measured by a high performance liquid chromatography. The results ((C)-1, (C)-2) are shown in Table 1. Here, with respect to the result of Test Comparative Example 2 ((C)-3), the amount of decomposed compounds was measured, and then the percentage of the decomposed compounds relative to the amount of the component (C) prior to storage was calculated, and the calculated results are shown in Table 1. The results in which decomposed compounds have not been detected are indicated as “ND”.

TABLE 1 PGME PGMEA Cyclohexanone Test Example 1: (C)-1 −20° C. ND ND ND room ND ND ND temperature  40° C. 120 151.2150 110 Comparative Test Example 1: (C)-2 −20° C. 210 180 210 room 2350 2500 2000 temperature  40° C. 4900 7200 6200 Comparative Test Example 2: (C)-3 −20° C. 23% 34% 46% room all of the all of the all of the temperature compound (C)-3 compound (C)-3 compound (C)-3 was decomposed was decomposed was decomposed  40° C. all of the all of the all of the compound (C)-3 compound (C)-3 compound (C)-3 was decomposed was decomposed was decomposed

In Table 1, (C)-1 to (C)-3 are compounds represented by chemical formulas (C)-1 to (C)-3 shown below.

From the results shown in Table 1, it was confirmed that the compound of Test Example 1 was superior to the compounds of Comparative Test Examples 1 and 2 in that they exhibited excellent storage stability.

Examples 1 to 9, Comparative Examples 1 to 9

The components shown in Table 1 were mixed together and dissolved to obtain resist compositions.

TABLE 2 Component Component Component Component Component (A) (B) (C) (F) (S) Comparative (A)-1 (B)-1 (B)-2 (C)-4 (F)-1 (S)-1 (S)-2 Example 1 [100] [8.26] [1.34] [2.59] [2.5] [10.0] [3000] Comparative (A)-1 (B)-1 (B)-2 (C)-5 (F)-1 (S)-1 (S)-2 Example 2 [100] [8.26] [1.34] [1.98] [2.5] [10.0] [3000] Comparative (A)-1 (B)-3 (B)-4 (C)-4 (F)-1 (S)-1 (S)-2 Example 3 [100] [11.00] [1.91] [2.59] [2.5] [10.0] [3000] Comparative (A)-1 (B)-3 (B)-4 (C)-5 (F)-1 (S)-1 (S)-2 Example 4 [100] [11.00] [1.91] [1.98] [2.5] [10.0] [3000] Comparative (A)-1 (B)-5 (B)-6 (C)-4 (F)-1 (S)-1 (S)-2 Example 5 [100] [11.50] [1.90] [2.59] [2.5] [10.0] [3000] Comparative (A)-1 (B)-5 (B)-6 (C)-5 (F)-1 (S)-1 (S)-2 Example 6 [100] [11.50] [1.90] [1.98] [2.5] [10.0] [3000] Comparative (A)-1 (B)-5 (B)-6 (C)-2 (F)-1 (S)-1 (S)-2 Example 7 [100] [11.50] [1.90] [3.61] [2.5] [10.0] [3000] Comparative (A)-1 (B)-5 (B)-6 (C)-6 (F)-1 (S)-1 (S)-2 Example 8 [100] [11.50] [1.90] [3.21] [2.5] [10.0] [3000] Comparative (A)-1 (B)-5 (B)-6 (C)-7 (F)-1 (S)-1 (S)-2 Example 9 [100] [11.50] [1.90] [2.61] [2.5] [10.0] [3000] Example 1 (A)-1 (B)-1 (B)-2 (C)-1 (F)-1 (S)-1 (S)-2 [100] [8.26] [1.34] [3.00] [2.5] [10.0] [3000] Example 2 (A)-1 (B)-1 (B)-2 (C)-8 (F)-1 (S)-1 (S)-2 [100] [8.26] [1.34] [2.96] [2.5] [10.0] [3000] Example 3 (A)-1 (B)-1 (B)-2 (C)-9 (F)-1 (S)-1 (S)-2 [100] [8.26] [1.34] [3.21] [2.5] [10.0] [3000] Example 4 (A)-1 (B)-3 (B)-4 (C)-1 (F)-1 (S)-1 (S)-2 [100] [11.00] [1.91] [3.00] [2.5] [10.0] [3000] Example 5 (A)-1 (B)-3 (B)-4 (C)-8 (F)-1 (S)-1 (S)-2 [100] [11.00] [1.91] [2.96] [2.5] [10.0] [3000] Example 6 (A)-1 (B)-3 (B)-4 (C)-9 (F)-1 (S)-1 (S)-2 [100] [11.00] [1.91] [3.21] [2.5] [10.0] [3000] Example 7 (A)-1 (B)5 (B)-6 (C)-1 (F)-1 (S)-1 (S)-2 [100] [11.50] [1.90] [3.00] [2.5] [10.0] [3000] Example 8 (A)-1 (B)-5 (B)-6 (C)-8 (F)-1 (S)-1 (S)-2 [100] [11.50] [1.90] [2.96] [2.5] [10.0] [3000] Example 9 (A)-1 (B)-5 (B)-6 (C)-9 (F)-1 (S)-1 (S)-2 [100] [11.50] [1.90] [3.21] [2.5] [10.0] [3000] Example 10 (A)-1 (B)-1 (B)-2 (C)-10 (F)-1 (S)-1 (S)-2 [100] [8.26] [1.34] [3.25] [2.5] [10.0] [3000] Example 11 (A)-1 (B)-1 (B)-2 (C)-11 (F)-1 (S)-1 (S)-2 [100] [8.26] [1.34] [3.25] [2.5] [10.0] [3000] Example 12 (A)-1 (B)-1 (B)-2 (C)-12 (F)-1 (S)-1 (S)-2 [100] [8.26] [1.34] [3.08] [2.5] [10.0] [3000] Example 13 (A)-1 (B)-1 (B)-2 (C)-13 (F)-1 (S)-1 (S)-2 [100] [8.26] [1.34] [3.08] [2.5] [10.0] [3000] In Table 2, the values in brackets [ ]indicate the amount (in terms of parts by weight) of the component added, and the reference characters indicate the following. (A)-1: a polymeric compound represented by chemical formula (A)-1 shown below [Mw = 5,500, Mw/Mn = 1.42, compositional ratio (molar ratio): 1/m/n/o = 45/40/5/10] (B)-1 to (B)-6: compounds represented by chemical formulas (B)-1 to (B)-6 shown below (C)-1 and (C)-2: compounds as described above (C)-4 to (C)-13: compounds represented by chemical formulas (C)-4 to (C)-13 shown below (F)-1: a polymeric compound represented by chemical formula (F)-1 shown below [Mw = 24,000, Mw/Mn = 1.38, compositional ratio (molar ratio): 1 = 100] (S)-1: γ-butyrolactone (S)-2: a mixed solvent of PGMEA/PGME = 6/4 (weight ratio)

[Formation of Resist Pattern]

An organic anti-reflection film composition (product name: ARC29A, manufactured by Brewer Science Ltd.) was applied to an 12-inch silicon wafer using a spinner, and the composition was then baked at 205° C. for 60 seconds on a hotplate and dried, thereby forming an organic anti-reflection film having a film thickness of 89 nm.

Then, each resist composition was applied to the anti-reflection film using a spinner, and was then prebaked (PAB) on a hotplate at 80° C. for 60 seconds and dried, thereby forming a resist film having a film thickness of 100 nm.

Subsequently, the resist film was selectively irradiated with an ArF excimer laser (193 nm) through a photomask (binary), using an ArF exposure apparatus for immersion lithography (product name: NSR-S609B, manufactured by Nikon Corporation; NA lithography (product name: NSR-5609B, manufactured by Nikon Corporation; NA (numerical aperture)=1.07, Annular(out-0.97/In-0.78)w/XY-Pol., immersion medium: water).

Next, a post exposure bake (PEB) treatment was conducted at 80° C. for 60 seconds, followed by development for 20 seconds at 23° C. in a 2.38% by weight aqueous solution of tetramethylammonium hydroxide (TMAH) (product name: NMD-W; manufactured by Tokyo Ohka Kogyo Co., Ltd.). Then, the resist film was rinsed for 30 seconds with pure water, followed by drying by shaking. Further, a post bake was conducted at 100° C. for 45 seconds on the hot plate.

As a result, in every examples, a contact hole pattern in which holes having a hole diameter of 65 nm and a pitch of 114 nm were equally spaced was formed (hereafter, this contact hole pattern is referred to as “CH pattern”).

The optimum exposure dose Eop (mJ/cm²) with which the CH pattern was formed was determined. The results are shown in Table 3.

[Evaluation of Mask Error Factor (MEF)]

With the above-mentioned Eop, CH patterns were formed in the same manner as in the aforementioned [Formation of resist pattern], except that a photomask having a different target size was used. Here, in the target size of the photomask, a hole diameter was changed within the range of 70 nm±5 nm at intervals of 1 nm while a pitch was fixed at 114 nm.

With respect to obtained 11 CH patterns, the hole diameter (nm) of the each of the holes was plotted on the vertical axis, and the hole diameter (nm) of the each of the target sizes was plotted on the horizontal axis. The gradient of the linear graph was determined as “MEF”. The results are shown in Table 3.

A MEF value smaller indicates that a resist pattern faithful to the mask pattern was formed.

[Evaluation of In-Plane Uniformity (CDU) of Pattern Size]

With respect to each of the contact hole patterns having the target sizes obtained in the aforementioned [Formation of resist pattern], the hole diameter (nm) of 100 holes within the CH pattern were observed from above and measured by using a measuring scanning electron microscope (SEM) (product name: S-9380, manufactured by Hitachi High-Technologies Corporation, accelerating voltage: 300V). From the results, the value of 3 times the standard deviation σ (i.e., 3σ) was calculated. The results are indicated under “CDU” in Table 3.

The smaller this 30 value is, the higher the level of the uniformity (CD uniformity) of size of the plurality of holes formed in the resist film.

[Evaluation of Circularity of Holes]

With respect to each of the contact hole patterns having the target sizes obtained in the aforementioned [Formation of resist pattern], 25 holes within the CH pattern were selected, and the distance from the center to the outer periphery in 24 directions of each hole was observed from above and measured by using a measuring scanning electron microscope (SEM) (product name: S-9380, manufactured by Hitachi High-Technologies Corporation, accelerating voltage: 300V). From the results, the value of 3 times the standard deviation σ (i.e., 30) was calculated. The results are shown in Table 3.

The smaller this 3σ value is, the higher the level of circularity of the holes.

[Evaluation of Depth of Focus]

With the above-mentioned Eop, CH patterns were formed in the same manner as in the aforementioned [Formation of resist pattern], except that focus was appropriately shifted up and down. The depth of focus (unit: μm) with which a contact hole pattern was formed within the range where the hole diameter (CD) was the target size (i.e., 65 nm)+5% was determined. The results are indicated under “DOF” in Table 3.

TABLE 3 Eop CDU Circularity DOF [mJ/cm²] MEF [3σ] [3σ] [μm] Comparative 23.5 4.56 6.41 3.43 0.48 Example 1 Comparative 23.9 4.58 6.39 3.47 0.47 Example 2 Comparative 26.5 4.19 6.25 3.20 0.47 Example 3 Comparative 25.6 4.23 6.29 3.21 0.46 Example 4 Comparative 27.2 4.05 6.01 3.11 0.48 Example 5 Comparative 27.5 4.09 6.02 3.13 0.48 Example 6 Comparative 29.7 3.59 6.07 2.99 0.21 Example 7 Comparative 25.5 3.79 6.80 3.66 0.43 Example 8 Comparative 28.0 3.65 5.92 3.01 0.43 Example 9 Example 1 23.7 4.32 6.32 3.25 0.47 Example 2 24.0 4.36 6.31 3.28 0.45 Example 3 23.5 4.38 6.33 3.24 0.44 Example 4 27.3 4.01 6.12 3.16 0.46 Example 5 27.5 3.98 6.08 3.14 0.47 Example 6 27.2 3.99 6.07 3.14 0.45 Example 7 29.9 3.51 5.72 2.95 0.46 Example 8 30.1 3.50 5.71 2.96 0.45 Example 9 29.7 3.49 5.72 2.98 0.46 Example 23.7 4.22 6.15 3.12 0.46 10 Example 24.0 4.36 6.31 3.28 0.47 11 Example 23.5 4.38 6.33 3.24 0.49 12 Example 27.3 4.01 6.12 3.16 0.48 13

From the results shown above, it was confirmed that the resist compositions of Examples 1 to 13 exhibited excellent lithography properties such as MEF, CDU, circularity and DOF, as compared to the resist compositions of Comparative Examples 1 to 6.

While preferred embodiments of the invention have been described and illustrated above, it should be understood that these are exemplary of the invention and are not to be considered as limiting. Additions, omissions, substitutions, and other modifications can be made without departing from the spirit or scope of the present invention. Accordingly, the invention is not to be considered as being limited by the foregoing description, and is only limited by the scope of the appended claims. 

What is claimed is:
 1. A resist composition comprising: a base component (A) that exhibits changed solubility in a developing solution by the action of acid; a photoreactive quencher (C); and an acid generator component (B) that generates acid upon exposure, wherein the photoreactive quencher (C) contains a compound (C1) represented by general formula (c1) shown below:

wherein X represents a cyclic group of 3 to 30 carbon atoms which may have a substituent; R¹ represents a divalent linking group; R² represents an arylene group which may have a substituent, and each of R³ and R⁴ independently represents an aryl group which may have a substituent; R³ and R⁴ may be mutually bonded with the sulfur atom to form a ring; R⁵ represents a hydroxy group, a halogen atom, an alkyl group of 1 to 5 carbon atoms, an alkoxy group or a fluorinated alkyl group; p represents an integer of 0 to 2; and q represents an integer of 0 to
 3. 2. The resist composition according to claim 1, wherein the base component (A) is a base component (A0) that exhibits increased polarity by the action of acid.
 3. A method of forming a resist pattern, comprising: forming a resist film on a substrate using a resist composition of claim 1; conducting exposure of the resist film; and developing the resist film to form a resist pattern. 